atomic distance 中文意思是什麼

atomic distance 解釋
原子間距
  • atomic : adj. 1. 原子的。2. 極微的。3. 強大的。
  • distance : n 1 距離,路程。2 遠隔,遠離;遠處,遠方。3 (時間的)間隔,長遠,長久。4 懸殊。5 隔閡,疏遠。6 ...
  1. The anharmonic effect of atomic vibration taken into account and from the potential energy which reacts each other among atoms, boltzmann statistical principle used, the relation formula of temperature and the distance change between atoms and coefficient of linear expansion is derived

    摘要考慮原子振動的非簡諧效應,從原子間相互作用勢能入手,運用玻爾茲曼統計原理,推出了原子間距的變化與溫度的關系式,並導出了固體的線脹系數。
  2. Abstract : molecular deposition ( md ) film, a nano film, is assembled by the interaction of static charge between cationic and anionic compounds. the micro - friction properties of an md film on silica has been studied with atomic force microscope ( afm ). it has been found that the md film has lower coefficient of friction as compared with the original surface of silica. moreover, based on the analyses of the surface force versus distance curves, photographic image, friction force image, and modulated force image, it is concluded that the friction reduction effect of md film on silica is attributed to the surface adhesion reduction and surface micro - modification

    文摘:利用原子力顯微鏡對石英巖表面單層分子沉積膜的微觀摩擦特性進行了研究,發現該分子沉積膜具有一定的減摩性.通過對其表面力-位移曲線、表面形貌像、調制力像和摩擦力像的進一步分析表明,石英巖表面分子沉積膜具有減摩作用的原因在於它能夠降低表面的粘著力並對表面具有微觀修飾作用
  3. By increasing the h2 dilution ratio, it is found that atomic hydrogen can selectively etch amorphous phase and stabilize crystalline phase. from the study on the distance from substrate to catalyzer, choosing a proper distance can ensure the gas fully decomposed, while a relatively low substrate temperature can cause the nanocrystalline particles to lose mobility and keep their sizes. the pre - carbonization process can enhance the nucleation density and make the growth of high quality nanocrystalline p - sic films much easier

    實驗結果表明:隨著工作氣壓的減小,薄膜的晶粒尺寸有所減小;通過提高氫氣稀釋度,利用原子氫在成膜過程中起的刻蝕作用,可以穩定結晶相併去除雜相;選擇適當的熱絲距離能保證反應氣體充分分解,又使襯底具有較高的過冷度,是形成納米薄膜的重要條件;採用分步碳化法可以提高形核密度,有利於獲得高質量的納米- sic薄膜;襯底施加負偏壓可以明顯提高襯底表面的基團的活性,因負偏壓產生的離子轟擊還能造成高的表面缺陷密度,形成更多的形核位置。
  4. Discusses in detail the microscopic nature of various physical quantities characterizing the intrinsic attributes of hydrogen atom to prove that the hydrogen atom ' s quantum energy, the inner quantum orbital momentum of electron and the relative quantum distance between atomic nucleus and electron all relate to the quantum state of the atomic system

    摘要闡述了表徵氫原子內在屬性的各種物理量的微觀本質,證明氫原子系統的量子能量、系統內部電子的量子軌道動量及原子核和電子的量子相對距離均與原子系統所處的量子狀態有關。
  5. It looks like mushroom clouds takign shapes from an exposion of an atomic bombard when watching it from a distance

    從遠處望去,狀如原子彈爆炸后形成的蘑菇狀煙雲,十分獨特。
  6. Firstly, the relationship of atomic force and distance is studied. the scan type of samples and the working mode of probe is confirmed, then pzt is chosen as actuator for micro scan displacement, and optical deflexion method is used to detect the deflexion value of cantilever. after all these work, the system light path design is finished, and its mathematical model is completed

    首先,分析了原子力探針系統的中原子力?距離的關系,並確定探針系統的探針的工作模式和樣品的掃描模式,從而選擇壓電陶瓷作為掃描微位移驅動器;採用光學偏轉法檢測微懸臂偏轉量,並選用了psd作為傳感元件,並在此基礎上進行了系統光路設計及其數學模型的建立。
  7. The sto, ybco and sto / ybco thin films were deposited on laalo3 ( 001 ) ( lao ) substrate by pulsed laser deposition ( pld ). the effects of deposition parameters, such as the substrate temperature, the of target - substrate distance, laser energy density, on the properties of the thin fillms were systematically studied. the surface morphology of the thin films was investigated by atomic force microscopy ( afm ) and scanning electron microscopy ( sem )

    採用脈沖激光沉積技術在laalo3 ( 001 ) ( lao )基片上生長ybco 、 sto以及sto / ybco集成薄膜,系統研究了基片溫度、基片表面狀態、氧分壓、激光能量密度、脈沖重復頻率等工藝參數對薄膜表面性能、結晶情況的影響,優化了ybco 、 sto薄膜生長的工藝參數,運用afm 、 sem 、 xrd等分析手段表徵薄膜的微觀性能,分析結果表明:薄膜表面平整、結晶良好、 c軸織構。
  8. The properties of spontaneous emission depend not only on the relative position of the resonant frequency from the edge of the photonic band gap and the photonic mode density but also on the relative distance of the atomic space position from the sidebrand. and we study other property of spontaneous emission

    其性質除了依賴于原子上能級與光子頻率帶隙邊緣的相對位置或光子態密度,還依賴于原子的空間位置與側支距離。並對原子的自發輻射的其它特性進行了分析。
  9. The origin of the above shortcomings is in the structure of molecules themselves, where we have valence electrons which can interact at mutual distances of the order of the size of their wavepackets, which is a distance 108 times smaller than the atomic distances

    導致上述短處的根源來自其分子結構本身我們有能夠在其波包尺寸相互距離相互作用的原子價電子,該距離為原子之間的距離的1 108 。
  10. Calibrating force measurement coefficient of atomic force microscopy with force - distance curve

    距離曲線標定原子力顯微鏡力測量系數的研究
  11. The interaction mechanism of atomic force between tip and sample was unveiled more clearly with the analysis of the change regularity of force - distance curve. the theoretical research about the light pressure of laser and the gravity exerting on the micro - cantilever was first conducted in this paper : setting up the interacting model and formula of the light pressure, investigating the effects of these factors on the interaction mechanism of atomic force and the performance of afm, conceiving a method to remove these effects and so on. all of these were the theoretical foundation of developing the new atomic force microscopy and the new type of horizontal afm system

    本文在全面分析掃描探針顯微鏡( spm )技術,特別是afm技術的國內外發展歷史、現狀及存在的主要問題的基礎上,進一步揭示了afm的原子力作用機理,著重分析了力?距離曲線的變化規律;對作用在微懸臂上的光壓力和微懸臂本身的重力進行了系統的理論研究和計算分析,建立了激光束對afm微懸臂的光壓作用模型及計算公式,考察了這些因素對原子力作用機理及afm性能的影響;提出克服或消除這些影響的理論構想,為發展新的afm技術、研製新型afm系統提供了重要的理論依據。
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