chemical vapor deposition method 中文意思是什麼

chemical vapor deposition method 解釋
化學氣相淀積工藝
  • chemical : adj 化學的，化學作用的；應用化學的，用化學方法獲得的。n 〈常 pl 〉化學製品；藥品。 fine chemicals...
  • vapor : n. 〈美國〉＝ vapour.
  • deposition : n. 1. 免職，罷免；廢位。2. 淤積[沉積]（物，作用）。3. 耶穌從十字架上放下（的畫、雕刻）。4. 寄存，委託；委託物。5. 【法律】口供，證言；口供書。
  • method : n 1 方法，方式；順序。2 （思想、言談上的）條理，規律，秩序。3 【生物學】分類法。4 〈M 〉【戲劇】...
  1. In this paper, the gas phase dissociation process during the diamond film growth from electron - assisted chemical vapor deposition ( eacvd ) by considering ch4 / h2 mixture gas as source gas had been studied by using monte - carlo computer simulation method. the eacvd gas phase dynamics model was built firstly and the low temperature deposition process was also discussed

    本工作採用蒙特卡羅（ monte - carlo ）計算機模擬的方法，對以ch _ 4 h _ 2為源氣體的電子助進化學氣相沉積（ eacvd ）金剛石薄膜中的氣相分解過程進行了研究，初步建立了eacvd氣相動力學模型，並討論了eacvd中的低溫沉積過程。
  2. The influence of substrate materials on properies of primary diamond like carbon films prepared by direct photo chemical vapor deposition method

    襯底材料對直接光化學汽相淀積類金剛石碳膜成膜初期的影響
  3. Traditional methods of manufacturing oxide films include thermal oxidation, chemical vapor phase deposition, metal - organic chemical vapor phase deposition, sol - gel method and so on

    傳統制備氧化物薄膜的方法包括熱氧化、化學汽相淀積、金屬有機物化學汽相淀積、溶膠凝膠法等等。
  4. In this paper, the preparation and the purification of the carbon nanotubes was investigated. using the co catalysts produced by chemical co - deposition, the carbon nanotubes were synthesized by the catalytic chemical vapor decomposition method

    採用催化劑裂解化學氣相沉積的方法，用化學共沉澱法制備的co催化劑，高產率的制備了多壁碳納米管。
  5. However, the limitation of large - scale production and the high cost have restrained the development of the research on their application. comparing to arc discharge and laser ablation, chemical vapor deposition ( cvd ) is the most possible method with large - scale, low - cost and high - yield advantage to fabricate swnts

    相對電弧法與激光蒸發法，化學氣相沉積法（ cvd ）是最有望實現大批量、低成本、高產率制備swnts的方法，因此已成為其制備方法研究領域的熱點。
  6. The applications field of fgm include aerospace, electron, chemistry, biology and medicine fields ; the composition change also from metal / ceramic to metal / metal, metal / alloy, non - metal / non - metal and non - metal / ceramic. moreover, various methods including powder metallurgy, self - propagating high - temperature synthesis ( shs ), chemical and physical vapor deposition ( cvd and pvd ), electrodeposition, laser cladding method, plasma sputtering and sol - gel method have been studed. metal organic chemical vapor deposition ( mocvd ), using chemical vapor deposition of metal organic compounds, is an effective method for acquiring special function materials and membrane

    功能梯度材料是21世紀最有發展前景的新型材料之一，其用途已由原來的宇航工業，擴大到核能源、電子、化學、生物醫學等領域；其組成也由金屬?陶瓷發展成為金屬?金屬、金屬?合金、非金屬?非金屬、非金屬?陶瓷等多種組合；其制備方法主要包括粉末冶金法，自蔓延高溫合成法（ shs ） 、氣相沉積法（ cvd和pvd ） 、電沉積法，激光熔覆法，溶膠?凝膠法（ sol - gel ）等。
  7. In this thesis, the history, structure. preparation method and basic properties of nano - composite materials and photoluminescence of nanocrystalline silicon have been summarized. research of the novel antireflecting energy saving coating glass has also been presented. the si / sic composite films are prepared with siht and ? 2 ^ 4 as the source gas by atmosphere pressure chemical vapor deposition ( apcvd )

    本論文全面介紹了納米材料，特別是納米鑲嵌復合材料的發展概況、特性、常用的制備方法、常見的幾種硅系納米材料以及有關納米硅材料的發光，並對新型無光污染節能鍍膜玻璃的研製和發展作了概述。
  8. ( 2 ) diamond - like carbon films could be fabricated by plasma enhanced chemical vapor deposition method too, the surface morphology of the films was good, but the films had very big internal stress, which could be decreased by adding proper nitrogen gas in work chamber

    （ 2 ）用等離子體增強化學氣象沉積技術也能制備類金剛石膜。優點是用這種方法制備的薄膜表面形貌得到了一定的改善，但內應力較大，通過加入適量的氮氣可以改善一些。
  9. The main contents in this paper were as follows : 1. cnts were synthesized by chemical vapor deposition ( cvd ) method, the mechanism of cnts growth was analyzed

    主要內容為以下幾個方面: 1 .本文通過化學氣相沉積法制備了碳納米管，分析了碳納米管的生長機理。
  10. In order to study these questions, we researched three topics in this paper mainly : 1. we prepared zno nanowires using chemical vapor deposition ( cvd ) method based vapor - liquid - solid ( vls ) mechanism. our object was getting arrayed and controllable growth of zno nanowires through integrating the controllable ability of vls mechanism and merits of cvd and controlling the technique conditions of preparation

    針對以上存在的問題，本文主要在以下三個方面進行了初步的探索: 1 .採用基於氣-液-固（ vls ）生長機理的化學氣相沉積（ cvd ）法制備zno納米線，結合vls機理對生長過程的控製作用以及cvd方法的優點，通過對催化劑、源溫度、生長溫度和反應氣氛等工藝條件的控制，得到納米線的陣列化生長。
  11. Microwave plasma chemical vapor deposition ( mpcvd ), a kind of chemical vapor deposition method with low temperature ， low intensity of pressure and clearance ， is commonly used for the growth of diamond thin films

    微波等離子體增強化學氣相沉積法（ mpcvd法）是眾多低氣壓下激活cvd工藝方法的一種，也是目前在國內外比較流行的制備金剛石薄膜的工藝方法之一。
  12. Carbon nanofibers, well - aligned carbon nanorods and alignend carbon nanotubes could be synthesized on the porous aao template with catalysts by chemical vapor deposition method. the morphology of co and fe - co alloys deposited in the template and the microstructure of the carbon nanostructures synthesized on the template were systematically investigated by means of sem, tem, eds and raman spectrum

    採用掃描電子顯微鏡（ sem ） 、透射電子顯微鏡（ tem ） 、能譜儀（ eds ）和喇曼光譜（ raman ）等對在多孔aao模板上電沉積得到的co和fe ? co合金催化劑的表面形貌以及在多孔aao模板上制備得到的碳納米結構進行了系統的觀察分析。
  13. For the liquid phase method, it is discovered that the optimal encapsulation is obtained at stalling ph equal 8. 5 by the analysis of the influence of ph on the compactness. for the atmospheric chemical vapor deposition, the optimal experimental condition of coating is determined by the analysis of the influence of different reaction temperature and different flow rate of o2 and different reaction time on the compactness of the coating and the luminescent performance of the phosphor in the experimental scope

    對于液相包膜，通過分析陳化ph值對膜層緻密性能的影響，發現在ph值為8 . 5陳化能夠得到最佳的包覆；對于化學氣相沉積法，通過分析不同溫度、不同氧流速、不同時間對包覆膜層緻密性能和zns ： cu材料的發光性能的影響，找到了該實驗范圍內包覆的最佳條件。
  14. The paper put forward an aim to deposit n - doped titanium dioxide film on glass substrate by the atmospheric pressure chemical vapor deposition ( apcvd ) method. using ticl4 and oa as precursors, titanium dioxide thin films had been deposited by apcvd method. nitrogen had also been doped in the film when n2o gas was added as the dopant

    在實驗室條件下以ticl _ 4和o _ 2為先驅體，採用常壓化學氣相沉積法（ apcvd ）制備得到具有一定光催化性和親水性的tio _ 2薄膜，並且以n _ 2o作為摻雜劑，對薄膜進行了n的摻雜，在一定程度上提高了薄膜可見光照射下的光催化性和親水性。
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