deposition chamber 中文意思是什麼

deposition chamber 解釋
沉降室
  • deposition : n. 1. 免職，罷免；廢位。2. 淤積[沉積]（物，作用）。3. 耶穌從十字架上放下（的畫、雕刻）。4. 寄存，委託；委託物。5. 【法律】口供，證言；口供書。
  • chamber : n 1 〈古、詩〉室，房間；寢室，臥室；〈pl 〉套房；〈pl 〉律師[法官]辦公室。2 會議室，會場；議會，...
  1. By the design of microwave electric field mode and microwave mode converter ( mmc ), the thesis participated in equipping an domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel resonant chamber in 2450mhz / 5 kw, introduced the basic machineries and functions of the sub - systems, including microwave system, gas - route system, vacuum system, detecting system and safeguard system

    論文通過微波場型和模式轉換器的設計，參與建立了一套2 . 45ghz 5kw帶有石英玻璃窗、水冷卻不銹鋼諧振腔的微波等離子體化學氣相沉積（ mpcvd ）系統（ mpcvd - 4型） 。論述了包括微波系統、氣路系統、真空系統、檢測系統和保障系統等結構的組成及基本功能。
  2. The variation of the film composition can be monitored by using the method of spectrum analysis during the film deposition ( for the intensity of the persistent line is proportional to the particle density of the element in the vacuum chamber ). the measurement of the transmission spectrum of the film on a transparent substrate can be used to calculate the film parameters, such as refractive index, extinction coefficient and the thickness of the film. therefore, the combination of the two methods would be helpful to on line monitoring the film constituents and the optical paramenters in the preparation of thin films

    在制備薄膜的過程中，利用光譜分析的方法，以放電光譜特徵譜線強度的變化來反映相應物質成分的變化，以連續光譜光源發出的光透射過薄膜的透射率的變化，來反映薄膜的厚度、折射率、吸收系數等光學參數的變化，從而達到在制膜過程中，對薄膜的成分、厚度等參數進行在線監控的目的
  3. In this paper, plasma - enhanced chemical vapor deposition ( pecvd ) technique was used to deposit the dielectric p - sio2 films and p - sion films on the silicon wafer under the conditions of low temperature and low pressure with teos organic sourse. this research was focused on the evaluation of film growth, hardness, stress, resistance and refractive index, by changing the experimental parameters including rf power, substrate temperature, chamber pressure, and the flow rates of teos, o2, n2. the results showed that the p - sio2 film was smooth, dense, and structurally amorphous

    實驗結果顯示，用pecvd法淀積的p - sio _ 2膜是一表面平坦且緻密的非晶質結構的薄膜，與矽片襯底之間有良好的附著性；在中心條件時生長速率可控制在2600a / min左右；在基板溫度410時有最大的硬度可達16gpa ；其應力為壓縮應力，可達- 75mpa ；薄膜的臨界荷重為46 . 5un 。
  4. The ci ~ - c : h film was prepared by the means of plasma assistance chemical vapor deposition with hydrocarbon n - butylamine ( ch3ch2ch2ch2nh2 ) as carbon source. the material of carbon source was carried into chemical vapor deposition chamber under pure hydrogen

    採用等離子體輔助化學氣相沉積方法，以碳氫化合物正丁胺（ ch _ 3ch _ 2ch _ 2ch _ 2nh _ 2 ）作為碳源物質，用高純氫氣作為載氣，將碳源物質攜帶進入反應室。
  5. The implementation of fluorine generation technology for chemical vapor deposition ( cvd ) chamber cleaning applications poses significant new challenges with regard to safety, reliability, purity and overall cost of ownership

    摘要對于將氟氣應用在化學氣相沉積器清洗的應用而言，其安全性、穩定性、純度和價格，在應用上是一個新的挑戰。
  6. ( 2 ) diamond - like carbon films could be fabricated by plasma enhanced chemical vapor deposition method too, the surface morphology of the films was good, but the films had very big internal stress, which could be decreased by adding proper nitrogen gas in work chamber

    （ 2 ）用等離子體增強化學氣象沉積技術也能制備類金剛石膜。優點是用這種方法制備的薄膜表面形貌得到了一定的改善，但內應力較大，通過加入適量的氮氣可以改善一些。
  7. The thin film material was prepared in a multi - chamber pecvd deposition system

    最後我們在柔性襯底上制備出了理想的薄膜材料。
  8. The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and watercooled stainless steel reaction chamber in 2450mhz / 5 kw

    詳細介紹了自行研製的2450mhz 5kw帶有石英玻璃窗、水冷卻不銹鋼腔體微波等離子體化學氣相沉積（ mpcvd ）裝置。
  9. The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel reaction chamber in 2450mhz / 5 kw

    本文詳細介紹了自行研製的2450mhz 5kw帶有石英玻璃窗、水冷卻不銹鋼腔體微波等離子體化學氣相沉積（ mpcvd ）裝置。
  10. The best process for high quality tio _ ( 2 ) thin film deposited on k9 glass by reb is studied by using orthogonal test method, the se results indicate that the best process for tio _ ( 2 ) thin film deposition is the substrate temperature of 300, the total gas press in the chamber of 2 x 10 ~ 2pa and the deposition rate of 0. 2 nm - s - 1, of which the substrate temperature has influence on the optical properties of the deposited films notably

    文中首先以tio _ 2薄膜的折射率和消光系數為研究對象，採用l9正交試驗法研究了在k9玻璃上制備高光學質量tio _ 2薄膜的最佳工藝條件。橢圓偏振儀的測試結果表明，制備tio _ 2薄膜的最佳工藝條件為：基片溫度300 ，工作真空2 10 ~ （ - 2 ） pa ，沉積速率0 . 2nm ? s ~ （ - 1 ） ，其中基片溫度對薄膜光學常數的影響最大，該結果具有較好的可重現性。
  11. By means of modifying the vacuum chamber of aes, the research has realized the joint between aes and pld. that is, it has realized the in - situ deposition and in - situ analysis in cathode

    通過對aes進樣室的改造，實現了aes與pld的相連，也就實現了陰極薄膜的原位制備、原位分析。
  12. Abstract : the review presents the recent status and achievements on numerical simulation studies of solid rocket motor chamber internal flow field from three aspects, including numerical analysis of internal flow during the ignition transient period, fin - slot flows in solid rocket motor, and calculation of particle trajectories and slag deposition. it also puts forward the focal points of research on numerical simulation of solid rocket motor chamber internal flow field in our country

    文摘:從三個方面介紹了固體火箭發動機燃燒室內流場數值模擬研究的現狀及取得的成果，包括發動機點火傳播及起動過程的數值研究，翼環槽內流場研究和粒子軌跡、熔渣計算，並對我國開展此項研究的重點提出了建議。
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