deposition coefficient 中文意思是什麼

deposition coefficient 解釋
熔敷系數
  • deposition : n. 1. 免職，罷免；廢位。2. 淤積[沉積]（物，作用）。3. 耶穌從十字架上放下（的畫、雕刻）。4. 寄存，委託；委託物。5. 【法律】口供，證言；口供書。
  • coefficient : adj. 共同作用的。n. 1. 共同作用；協同因素。2. 【數，物】系數，率；程度。
  1. Abstract : molecular deposition ( md ) film, a nano film, is assembled by the interaction of static charge between cationic and anionic compounds. the micro - friction properties of an md film on silica has been studied with atomic force microscope ( afm ). it has been found that the md film has lower coefficient of friction as compared with the original surface of silica. moreover, based on the analyses of the surface force versus distance curves, photographic image, friction force image, and modulated force image, it is concluded that the friction reduction effect of md film on silica is attributed to the surface adhesion reduction and surface micro - modification

    文摘:利用原子力顯微鏡對石英巖表面單層分子沉積膜的微觀摩擦特性進行了研究，發現該分子沉積膜具有一定的減摩性.通過對其表面力-位移曲線、表面形貌像、調制力像和摩擦力像的進一步分析表明，石英巖表面分子沉積膜具有減摩作用的原因在於它能夠降低表面的粘著力並對表面具有微觀修飾作用
  2. Either the boron nitride ( bn ) thin films with different cubic phase content were deposited on n - type si ( 111 ) and fused silica substrates by radio frequency ( rf ) sputtering using two - stage deposition process. the films were characterized by fourier transform infrared ( ftir ) spectroscopy. the transmittance te ( ) and reflectance re ( ) were obtained as a function of incident photo wavelengths and the thickness of films was measured by alpha - step. the absorption coefficient was calculated from te ( ) and re ( ). the optical band gap ( eg ) of the films was determined by effective medium form of formula containing eg

    本文還研究了立方相含量與光學帶隙的關系，在n型si （ 111 ）片和熔融石英片上沉積出不同體積分數的立方氮化硼薄膜，薄膜的成分由傅立葉紅外吸收譜標識；用紫外-可見分光光度計測量了沉積在石英片上的bn薄膜的透射光譜te （ ）和反射光譜re （ ） ，薄膜的厚度用臺階儀測得。
  3. Covered electrodes. determination of the efficiency, metal recovery and deposition coefficient

    藥皮焊條.效率金屬回復系數和熔敷系數的測定
  4. The variation of the film composition can be monitored by using the method of spectrum analysis during the film deposition ( for the intensity of the persistent line is proportional to the particle density of the element in the vacuum chamber ). the measurement of the transmission spectrum of the film on a transparent substrate can be used to calculate the film parameters, such as refractive index, extinction coefficient and the thickness of the film. therefore, the combination of the two methods would be helpful to on line monitoring the film constituents and the optical paramenters in the preparation of thin films

    在制備薄膜的過程中，利用光譜分析的方法，以放電光譜特徵譜線強度的變化來反映相應物質成分的變化，以連續光譜光源發出的光透射過薄膜的透射率的變化，來反映薄膜的厚度、折射率、吸收系數等光學參數的變化，從而達到在制膜過程中，對薄膜的成分、厚度等參數進行在線監控的目的
  5. It is found that the microstructure and properties of as - deposited dlc films is seriously dependent on the substrate temperature used in deposition processes. with the increase of substrate temperature, sp 3c content in the deposited dlc film decreases, surface roughness and friction coefficient of deposited dlc films increase. at the same time, microhardness, residual stress and optical band gap became lower

    研究發現，基片溫度對dlc薄膜的結構和性能影響最明顯，隨著薄膜沉積過程中基片溫度的增加， dlc薄膜中的sp ~ 3c含量減少， dlc薄膜的表面粗糙度增加， dlc薄膜的顯微硬度降低， dlc薄膜的摩擦系數增大， dlc薄膜的殘余應力都是減小的，光學帶隙eg變窄。
  6. Covered electrodes - determination of the efficiency, metal recovery and deposition coefficient

    塗料焊條效率金屬回收率和熔敷系數的測定
  7. Iso 2401 covered electrodes ; determination of the efficiency, metal recovery and deposition coefficient iso 2401 : 1972 ; german version en 22401 : 1994

    塗敷焊條.效率金屬回收和熔敷系數的測定
  8. 5. manganin thin films with low temperature coefficient of resistance were prepared by magnetron sputtering. the changes of tcr under difference deposition and heat treatment conditions were studied

    首次採用磁控濺射法沉積了低電阻溫度系數的錳銅薄膜，研究了在不同電子科技大學博士學位論文沉積及熱處理條件下薄膜tcr的變化。
  9. Thermal coefficient of resistance of vanadium oxide film formed by lon - beam - enhanced deposition

    離子束增強沉積氧化釩薄膜的溫度系數
  10. The shimadzu uv - 3101 spectrophotometer was employed to get the uv - visible transmission and reflection spectra. both of the absorption coefficient ( a ) and optical band gap ( eg ) were calculated from the transmission and reflection spectra of the films. it was observed that eg decreased with an increase in the deposition pressure

    採用紫外-可見光分光光度計測定了納米- sic薄膜透射光譜和反射光譜，並通過樣品的透射光譜和反射光譜計算了納米- sic薄膜吸收吸收系數和光學帶隙eto實驗結果表明，增大工作氣壓導致納米- sic薄膜的光學帶隙的減小。
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