dopant gas 中文意思是什麼

dopant gas 解釋
摻雜劑氣體
  • dopant : n. 【物理學】摻雜劑，摻雜物。
  • gas : n （pl gases ）1 氣，氣體，氣態 〈cf fluid; solid〉 2 可燃氣，煤氣，沼氣；【礦物】瓦斯。3 【軍事...
  1. Testing of materials for semiconductor technology ; determination of impurities in carrier gases and dopant gases ; determination of c - c - hydrocarbons in nitrogen by gas - chromatography

    半導體工藝材料的檢驗.運載氣體和摻雜劑氣體中雜質的
  2. The paper put forward an aim to deposit n - doped titanium dioxide film on glass substrate by the atmospheric pressure chemical vapor deposition ( apcvd ) method. using ticl4 and oa as precursors, titanium dioxide thin films had been deposited by apcvd method. nitrogen had also been doped in the film when n2o gas was added as the dopant

    在實驗室條件下以ticl _ 4和o _ 2為先驅體，採用常壓化學氣相沉積法（ apcvd ）制備得到具有一定光催化性和親水性的tio _ 2薄膜，並且以n _ 2o作為摻雜劑，對薄膜進行了n的摻雜，在一定程度上提高了薄膜可見光照射下的光催化性和親水性。
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