double exposure 中文意思是什麼

double exposure 解釋
【攝影】兩次曝光的。

  • double : adj 1 兩倍的，加倍的。2 雙的，二重的，雙重的；對，雙，兩，復。3 雙人用的；折疊式的。4 （意義）雙...
  • exposure : n. 1. 曝露；曝曬；揭發。2. 【攝影】曝光；膠卷[軟片]張數；曝光時間。3. （房屋的）朝向，方位。4. 商品的陳列。5. 【歷史】（嬰兒的）曝棄。
  1. Double exposure holography

    雙重曝光全息照相術
  2. His works includes three collections of poetry, double exposure of a writing hand pilgrim and selected poems of gu gang

    著有詩集《正在寫作的一隻手的正反面曝光》 、 《朝聖者》 、 《古岡短詩選》 。
  3. This calibration is usually carried out by employing a double exposure technique in which the diffraction pattern and electron image of a crystal of molybdenum trioxide are successively exposed

    這個標準通常利用使得衍射模型和一個三氧化鉬的結晶體的電子成像成功展現的雙投照技術來執行。
  4. This inversion will lead to an additional 1800 relative rotation between the diffraction pattern and micrograph that would not be detectable in the double exposure technique illustrated in fig. l. 3

    圖表1 . 3所示的雙曝光技術中對于衍射模型和顯微圖並沒有表示出來，這個倒置，就在衍射模型和顯微圖之間形成了一個額外的1800相關旋轉。
  5. It should be noted that there could be double counting in the amount of direct exposure and contingent liabilities where itics have issued guarantees to the banks to support the banks lending to their subsidiaries

    應注意一點，就是由於國際信託投資公司為協助附屬公司取得銀行貸款而向銀行簽發擔保書，這樣有可能造成直接貸款額和或有債務金額的重覆計算。
  6. Standard test method for measuring optical angular deviation of transparent parts using the double - exposure method

    用雙重曝光法測量透明部件的光學角偏差的標準試驗方法
  7. Exponential phase cultures of the dr rl strain survive exposure to gamma radiation at doses as high as 5, 000 gy without loss of viability or evidence of dna damage induced mutation. 6000 gy of irradiation will induce approximately 200 dna double - strand breaks in dr chromosomes, but it is still able to reconstruct a functional genome from chromosomal fragments without any mutation

    指數生長期的r1菌株即使在5kgy劑量的-射線照射后，其生長能力也未受影響， 6kgy -射線照射后染色體基因組產生約200個的雙鏈斷裂碎片，但是其基因組dna經修復后沒有引起任何的突變。
  8. Mathematical and physical models for multi - beam and multiple - exposure techniques including single exposure with double - beam, double - exposure with double - beam, single exposure with tri - beam, double - exposure with tri - beam, four - beam and five - beam interference are established. simulation software is programmed, large numbers of computer simulation research have been carried out and a lot of useful results have been obtained

    建立了多光束、多曝光技術，包括雙光束單曝光、雙光束雙曝光、三光束單曝光、三光束雙曝光、四光束和五光束干涉的數學物理模型，編制了模擬軟體並進行了大量的計算模擬研究，得到很多有用的結果。
  9. Sitting upstairs on a double - decker can reduce exposure

    坐在雙層公車的上層也會減少接觸污染的空氣。
  10. An experimental double - beam and double - exposure interference photolithographic system has been established

    建立了雙光束雙曝光干涉光刻實驗系統。
  11. In addition, from the point of view of practicality, we make a study of experiment and application for double - exposure digital holographic interferometry, namely measuring gradn and grad / i of plane optical flat and measuring phase modulation characteristic of a kind of liquid crystal spatial light modulator ( lc - slm ) - liquid crystal television ( lctv )

    另外，本文還從實用的角度出發對二次曝光數字全息干涉術進行了實驗及應用的研究，具體就是平面平晶gradn和gradh的測量以及液晶空間光調制器（ lc - slm ）中液晶電視（ lctv ）的相位特性的測量。
  12. In this paper, aimed at the problems existed in theoretical analysis and application of ftm, the discrete fourier transform method is applied to analyze the traditional ftm ( tftm ). and computer simulation is applied. the main propose is to solve the problem, such as frequency shifting, selection of carrier frequency big or small and selection of filter window size. considering the feature of double - exposure holographic interferometry, we propose a modified ftm ( mftm )

    針對二次曝光數字全息干涉術中ftm存在的理論缺陷和具體應用到二次曝光全息干涉計量中存在的問題，本文從離散傅立葉變換的角度對傳統的傅立葉變換法（ tftm ）進行了理論分析和計算機模擬計算，並重點致力於解決ftm中的移頻問題、載頻大小的選擇以及濾波窗口大小的選擇等關鍵問題，結合二次曝光全息干涉的特點提出了改進的傅立葉變換法（ mftm ） 。
  13. The thesis also explores the application of numerical reconstruction in the process of double - exposure holography

    文章中還討論了數字重現技術在二次曝光過程中的應用。
  14. The study of stress field by double - exposure holographic interomentry

    二次曝光全息干涉計量技術研究應力場
  15. Standard practice for optical distortion and deviation of transparent parts using the double - exposure method

    用雙曝光法測定透明部件的光學畸變和偏差的標準實施規范
  16. In this paper, we apply the fourier transform method ( ftm ) of the phase analysis method to double - exposure holographic interferometry and propose double - exposure digital holographic interferometry

    本文將相位分析技術中的傅立葉變換法（ ftm ）引入二次曝光全息干涉計量中，提出了二次曝光數字全息干涉術。
  17. In this paper, we design an optical system for double - exposure digital holographic interferometry. the comparison of the other measured result and experimental result proves the feasibility and validity of double - exposure digital holographic interferometry

    在具體的實驗測量中，本文提出了適合二次曝光數字全息干涉術的光學系統，而其它方法的測量結果對本文測量結果的佐證，則證明了二次曝光數字全息干涉術的可行性和有效性。
  18. Moreover, automatic aperture size selection ( single frame or double frame ), frame indexing, single corner positioning, and auto exposure control, individual functions that work together to improve productivity and image quality. automatic reduction and focus ensures sharp, correctly sized images every time

    另備有自動孔徑尺寸選擇（單菲林格或雙菲林格） 、菲林格索引、單角度定位及自動曝光調校等獨立功能，能同時運作來改進影像質素及生產力。
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