etching material 中文意思是什麼
etching material
解釋
蝕刻材料-
Because the cross - section of the oversized rib waveguide we fabricated by wet - etching was trapeziform, we analyzed the transmission of oversized rib waveguide by combining effective refractive - index method. the influence of some factors on the optical transmission loss, such as material structure, the height of rib waveguide, and the thickness and refractive index of waveguide layer and up - layer of polymer material, was analyzed
因為濕法腐蝕工藝製作的反脊波導橫截面是梯形狀的，因此論文中採用了一種簡單有效的方法，即有效折射率法，對梯形反脊波導的光傳輸損耗特性進行了分析，同時考慮金屬電極產生熱場對脊波導傳播特性的影響。 -
This paper mainly aims at the strategic demands for large - aperture lightweight mirror proposed by high - tech development. its main research contents are : select material blank for lightweight mirror according to physical and chemical properties of optical glass ; analyze and calculate the deformation quantity of the mirror with finite element method ; design and optimize mirror body structure of 400 lightweight plane mirror and 450 lightweight spherical mirror, analyze glass cutting principle, design specisl - use grinding wheel structure, select reasonable technological parameters to implement the processing of weight reduction holes on 400 plane mirror ; analyze etching mechanism of hydrofluoric acid, look for the technological parameters such as the optimal acid concentration and etching time etc. ; eliminate the stress of weight reduction holes and micro - cracks on 400 lightweight plane mirror ; discuss the processing principle and
本論文的研究主要是瞄準國家高技術對大口徑輕型鏡的戰略需求而開展的。主要研究內容是：根據光學玻璃的物理與化學性能，選擇輕型鏡坯材料；用有限元法對鏡子的變形進行分析、計算，找出變形規律，優化設計400mm輕型平面鏡、 450mm輕型球面鏡鏡體結構；分析玻璃切削原理，設計專用磨輪結構，選擇合理工藝技術參數，完成400mm平面鏡輕量化減重孔的加工；分析氫氟酸腐蝕光學玻璃機理，尋找最佳酸濃度、腐蝕作用時間等工藝參數，實現400mm平面鏡減重孔應力與微裂紋的消除；討論分離器加工原理和工藝技術特點，完成400mm平面輕型鏡面形加工。 -
As the isotropic etching being related to the resistivity of the si material and combining the practical need of the solar cell production, the paper emphasis on the etching of the multicrystal si with resistivity of about 1. cm. the results : ( 1 ) reflectance characteristics the appropriate etching solutions has led to a reduction of the total integrated reflectance to 5. 7 %, which is quite comparable with conventionally pretextured si surface covered by a double layer arc
由於以hf + hno _ 3 + h _ 2o為溶液各向同性腐蝕與矽片的摻雜濃度有關，結合生產太陽電池的實際需要，本文重點研究了電阻率1 . cm左右的多晶硅的腐蝕情況，結果如下： （ 1 ）反射特性在適當的hf + hno _ 3 + h _ 2o溶液中制備的多晶硅電池的絨面，其反射率降到了5 . 7 。 -
A large number of attempt and painstaking experiment have been done in this paper according to existing project. we also do lots of chemical and electrochemical etching research in material of lab6, and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen, wet process etching and electrochemical etching. through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode, molybdenum field emitting cold cathode, tungsten field emitting cold cathode, tungsten rhenium field emitting cold cathode, molybdenum covered with lab6 film field emitting cold cathode
而且，目前可借鑒的參考文獻較少，圍繞著前人做過的方案，本文做了大量工作，在已有文獻介紹的基礎上，結合原有的理論和實踐基礎，摸索出了包括高溫氧作用反應離子（ rie ）刻蝕法、濕法腐蝕法和電化學腐蝕法在內的三種制備工藝，運用電化學腐蝕工藝成功制備了單尖的六硼化鑭場發射冷陰極尖錐、鉬場發射冷陰極尖錐、鎢場發射冷陰極尖錐、鎢錸合金場發射冷陰極尖錐以及有六硼化鑭薄膜覆蓋的鉬場發射冷陰極尖錐。 -
Due to great advantage of the excimer laser in photoelectron material, photoelectron technology research, so in this thesis, a xecl excimer laser is designed in order to solve some problem in semiconductor film, cmr film, quartz film and other kind of film application, optical etching field, interaction between laser and material, material plasma study. the parameters of the excimer laser is e also measured and analyzed
因此本文以氣相沉積、外延生長、巨磁薄膜、金剛石及其它薄膜制備及后續的光刻，激光與物質的相互作用，等離子體研究為目的，研製獲得了激光脈寬18ns ，單脈沖能量150mj ，矩形光斑大小2cm 1cm ，束散角3mrad ，最高重復頻率5hz的xecl準分子激光器。 -
We ' ve known the product ' s surface requirement ( etching, shine - sided, mirror - sided, oil - spraying, electroplating, transparence, etc. ), material, quantity ratio ( quantity of the same part in a product ) and output from customer
我們從客戶那知道產品的表面要求（蝕紋，亮面，鏡面，噴油，電鍍透明等） ，材質，用量比（同一個零件在一個產品中的數量） ，產量。 -
Lab6, as one kind of better material, is so perfect that it is important to research its chemical etching in the arts and crafts to be used in the preparation of emitting cathode, we simply state the chemical etching technical research in material of lab6 and have gainded graphics surface of lab6
而對六硼化鑭的化學腐蝕在以其為陰極的陰極發射體制備工藝中起著至關重要的作用，本文簡述了對材料的化學腐蝕工藝的初步研究，並得到了圖形化的六硼化鑭表面。 -
Material quality of aluminum decides etching sand plane effectiveness and shape of aluminum parts decides blasting sand plane effectiveness
，採用純鋁而蝕刻粗沙面或多或少顯現出鋁件的擠壓紋路
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