etching wafer 中文意思是什麼

etching wafer 解釋
剛蝕刻晶圓
  • etching : n. 1. 蝕刻法;蝕刻(銅)版畫;蝕鏤術。2. 蝕刻畫,蝕刻版,蝕刻版印刷品。
  • wafer : n 1 薄脆餅;薄餅一樣的東西;【物、無】圓片;薄片;晶片;【醫學】糯米紙〈包藥用的干糊片〉。2 (封...
  1. In this paper, the flow pattern defects ( fpds ) were revealed by secco etchant and their shape, distribution on wafer and tip structure were studied in details by optical microscope and atomic force microscope ( afm ). the relationship between etching time and the tip structure of fpds was also discussed. furthermore, by studying the effect of rapid thermal annealing ( rta ) on the density of fpds in ar, the annihilation mechanism of fpds was discussed in this paper

    本文將cz硅單晶片在secco腐蝕液中擇優腐蝕后,用光學顯微鏡和原子力顯微鏡對流動圖形缺陷( flowpatterndefects , fpds )在矽片中的形態、分佈及其端部的微觀結構進行了仔細地觀察和研究,並討論了腐蝕時間對fpds缺陷端部結構的影響;本文還通過研究ar氣氛下快速退火( rapidthermalannealing , rta )對fpds缺陷密度的影響,初步探討了fpds的消除機理。
  2. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件,本論文設計並試驗了器件的製作的全部工藝,包括波導薄膜的沉積,掩模的設計製作,光刻,濺射金屬薄膜,剝離法製作金屬掩模,干法深刻蝕,矽片切割,端面磨拋,波導對準和性能測試。
  3. Our company is one of professional manufactures in china of semiconductors and solar battery cleaning equipments, our main products includes quartz tube cleaning machine, silicon wafer washing equipment, semiconductor wafer etching machine, nitrogen cabinet, dryer and so on

    我們是中國從事半導體、太陽能電池清洗設備的一家設備廠商,主要產品有石英管清洗機、矽片清洗機、矽片腐蝕機、氮氣存儲櫃、甩干機等產品。
  4. To find out the effective slurry with suitable type of oxidizer and concentration, chemical etching experiment was applied to the litao3 wafer. the chemical etching effects were analysed by measuring etching rate and x - ray spectrum

    採用化學腐蝕實驗方法研究拋光液中氧化劑種類和濃度以及拋光液ph值對鉭酸鋰晶片化學去除的影響。
  5. ( 3 ) the free - standing porous silicon films with continuous porous structure were prepared on single crystal silicon wafer by the method of anodic oxidation and electrochemical etching - electropolishing, and firstly used as the anode materials for lithium ion secondary batteries. the capacities of lithium ions storage and the process of charge and discharge of this nano - silicon anode materials as well as the influence of the structure of ps on behavior of storing lithium ions were inspected at length. on the other hand, through the process of charge and discharge in cells, the lithium of light metal element could be electrochemically doped into ps at different doping levels

    胡勁松河北師死大學碩士學位論文( 3 )利用陽極氧化法在單晶硅基底上制備了多孔硅自支撐膜,並首次將這種具有連續多孔結構的硅材料用作了理離子電池的陽極材料,考察了這種納米級硅陽極的儲鉀性能和充放電過程,分析了材料結構對其儲理行為的影響;另一方面,利用這種電池充放電過程在多孔硅中電化學引入了不同點綴程度的輕金屬鉀元素,考察了鉀點綴對多孔硅自身結構,及至性質所帶來的影響,提供了一種通過電化學方法插入埋離子從而連續調整多孔硅發光性質的有效方法。
  6. By means of chemical etching, microscope observation, eelectron probe x - ray micro - analyzer ( epma ), the micro - distribution of c acceptor defect in lec si - gaas wafer is investigated, the results show that there is serious influence of the density and distribution of dislocations on the distribution of c impurity in wafer

    本文通過ab腐蝕、 koh腐蝕,金相顯微鏡觀察,透射電鏡能譜分析,電子探針x射線微區分析,研究了液封直拉法生長的非摻半絕緣砷化鎵( lec , si - gaas )單晶中碳的微區分佈。
  7. For the first time, an integrated waveguide turning mirror ( 1wtm ) in soi was put forward and realized. using anisotropic etching technology with koh solution, the mirror surface was very smooth with root square roughness only 5. 19nm, and the mirror was vertical to the wafer surface because of the crystalline relationship

    論文首次設計並製作了soi上集成波導式轉彎微鏡( iwtm ) ,利用硅的koh各向異性腐蝕特性製作出的微鏡表面非常光亮,均方根粗糙僅為5 . 19nm ,並且由於鏡面是腐蝕出的晶面,其與晶片表面非常垂直。
  8. Shortly followed, we successfully designed and assembled our complete " end to end " wafer production line including crystal growth, wire slicing, lapping, etching and polishing processes

    緊接著即建構好銜接完整的晶圓加工生產線(由長晶、線切、研磨、拋光到超凈包裝) 。
  9. Silicon grating is a period construction fabricated on the silicon wafer by micro fabrication techniques as ultraviolet lithography and anisotropic etching

    硅光柵是利用紫外光刻、各向異性腐蝕等硅微加工技術在矽片上製作的周期結構。
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