glow discharge 中文意思是什麼

glow discharge 解釋
輝光放電。

  • glow : vi 1 灼熱；發白熱光；燃燒 〈cf blaze〉; 放光，發熱。2 （運動后）身體發熱；（面色等）發紅；（眼）...
  • discharge : vt 1 發射（炮等），打（槍），射（箭）。2 起，卸（貨）。3 排泄，排出，放出（水等）。4 釋放；解除，...
  1. The simplest discharge to produce is the glow discharge.

    最簡單的放電產生方法是輝光放電。
  2. Methods of measurement for glow discharge display tubes

    輝光放電顯示管測試方法
  3. Application of arc - added glow discharge ion titanizing to graphite anode

    在石墨電極上的應用
  4. Abnormal glow discharge

    反常輝光放電
  5. Factors influencing disinfection efficacy of atmospheric pressure glow discharge plasma

    大氣壓輝光放電等離子體消毒效果影響因素
  6. Wear resistance of q235 steel surface mo - cr alloy layer by double glow discharge technology

    235鋼表面雙層輝光離子強化層摩擦磨損性能
  7. Surface chemical analysis - glow discharge optical emission spectrometry gd - ose - introduction to use

    表面化學分析-輝光放電發射光譜方法通則
  8. Degradation of p - chloronitrobenzene in aqueous solution by contact glow discharge electrolysis

    接觸輝光放電等離子體降解水體中的對氯硝基苯
  9. Surface chemical analysis - glow discharge optical emission spectrometry gd - oes - introduction to use

    表面化學分析.輝光放電發射光譜.使用介紹
  10. Gd - oes. surface chemical analysis - glow discharge optical emission spectrometry gd - oes - introduction to use

    表面化學分析.輝光放電發射光譜測定法
  11. Standard test method for trace metallic impurities in electronic grade titanium by high mass - resolution glow discharge mass spectrometer

    使用高解析度發光質譜儀測試電子級鈦中痕量金屬雜質的標準試驗方法
  12. Analysis of cast iron by glow - discharge atomic emission spectrometry

    輝光放電原子發射光譜法快速分析生鑄鐵
  13. Glow - discharge lamp

    輝光放電管
  14. The results show that as the voltage rises, the tubes ’ discharge mechanism changes from glow discharge to arc discharge, the current rises suddenly and the voltage drops a lot

    結果表明，隨著電壓的升高，六硼化鑭放電管的放電機理由輝光放電轉變為弧光放電，放電電流突然迅速升高，管壓降大幅下降。
  15. Based on the theory of glow discharge, the angle distribution of electron and the recombination process are simulated by adopting monte carlo method. the doping process of n - type diamond film is investigated by this method for the first time. the results indicate : 1 ) the scattering angle of electrons near the substrate is mainly lange - angle, which is helpful to grow diamond film over a large area when glow discharge is kept ; 2 ) after considering the recombination process, the number of particles distribution is provided

    主要結果如下： （ 1 ）研究了電子在雪崩碰撞和分解電離后的角分佈情況，結果表明基片附近電子的散射以大角散射為主，在維持輝光放電的條件下，較高的偏壓和工作氣壓對金剛石的橫向連續成膜是有益的； （ 2 ）考慮了低溫合成金剛石薄膜過程中電子與各種碎片粒子的復合過程，給出了不同的復合系數情況下的粒子數分佈，結果顯示各種碎片粒子的分佈隨復合系數的變化會出現粒子數分佈的漲落現象。
  16. Dlc and a - sic : h films were prepared by the rf glow discharge and the reactive sputtering method respectively. there were two reasons that we chose y rays, ultraviolet ( uv ) photons, and neutrons as radiation sources. one is that y rays, uv photons and neutrons irradiation are serious at outer space and / or nucleus irradiation enviromentthe other is that the study on y rays irradiation on the films is a new and an important directioaotherwisejirnited reports have been made of the investigation on the uv photonsjieutrons irradiation influences on these films

    本文分別採用射頻（ 13 . 56mhz ）等離子體cvd及射頻反應濺射方法制得了dlc及a - sic ： h薄膜。文中主要選擇y射線、紫外光及中子作為輻照源有兩方面的原因：一方面，在外層空間， y射線及紫外光輻射十分嚴重，而在核輻射環境下y射線及中子輻射也不可忽視；另一方面， y射線輻照這兩種薄膜完全是一項開創性的工作，同時國內外對紫外光子、中子與這兩種薄膜作用的研究也很少。
  17. Standard test method for trace metallic impurities in high purity copper by high - mass - resolution glow discharge mass spectrometer

    使用高質量解析度輝光放電質譜儀測量高純度銅中痕量金屬雜質的標準試驗方法
  18. Standard test method for trace metallic impurities in electronic grade aluminum - copper, aluminum - silicon, and aluminum - copper - silicon alloys by high - mass - reduction glow discharge mass spectrometer

    用高質量減少輝光放電質譜儀測量電子級鋁銅鋁硅和鋁銅硅中微量金屬雜質的標準試驗方法
  19. The organic electroluminsecence devices : ito / tpd / alq3 / al were fabracated by reactive evaporating deposition and dc glow discharge plasma enhanced reactive evaporating ways. the effects of the organic film thickness on the electronic and optical property have been investigated

    使用真空蒸發沉積技術和直流輝光等離子體輔助反應蒸發沉積技術制備了四層結構的有機電致發光器件： ito / tpd / alq _ 3 / al ，對制得的器件進行了電學和光學性能的測試。
  20. No matter how different the discharge scheme is, low pressure discharge plasmas take a common characteristic of bright glow and is generally entitled as low temperature glow discharge. glow discharge plasma has been selected as a most suitable system for plasma diagnostics in laboratory and for application technology development because of its good stability and reproducibility

    利用n _ 2輝光放電中n _ 2 ~ +的發射光譜研究了放電空間的溫度分佈的變化規律，發現了直流放電的一些重要特性，如阻礙輝光與正常輝光的光譜差別。
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