heat treatment and coating 中文意思是什麼
heat treatment and coating
解釋
熱處理-
That is the premise of the bg / ha electrophoresis codeposition. the laws of the electrophoresis deposition of the bg and ha partic les were found by the study on each of their deposition under the different conditions. the electrophoresis codeposition of the bg and ha particles had been studied and the bg / ha graded coating, which is compact in the bottom layer and porous near the surface layer, had been prepared on the surface of the dental implant after the low temperature heat treatment ( about 740 ) and fast firing ( 50 - 80 / min, heat preservation time was 5 - 8min. )
以bg微粉和ha微粉作為塗層原料，通過研究bg和ha微粉在非水介質中的分散情況和帶電特性，選擇冰醋酸為介質，使分散在其中的bg顆粒和ha顆粒表面均帶上正電荷，為電泳共沉積提供前提條件；通過對不同條件下bg 、 ha各自電泳沉積的研究，探索出了兩者電泳沉積的規律；通過對bg和ha在冰醋酸中電泳共沉積以及后續低溫（ 740左右）快燒（ 50 ? 80 min ，保溫5 ? 8min ）熱處理的研究，在鈦合金牙根種植體基體上成功制備出了底層緻密而表層多孔的bg ha梯度塗層。 -
In this paper, the al3 + - doped zno thin films were prepared on na - ca - si glass substrate ( microscope slides ) by sol - gel process from 2 - methoxyethanol solution prepared by zinc acetate as premonitor, monoethanolamine as stabilizator and aluminum chloride reaction. homogenous, transparent, polycrystalline zno thin film was formed finally by diping coating conducted for film - plate on substrate, drying, pre - heat - treatment, anealing
所用的溶膠是以乙二醇甲醚為溶劑，醋酸鋅為前驅體，乙醇胺為穩定劑反應制得，用浸漬提拉法在基體上鍍膜，經烘烤、預燒、退火，最後形成均勻、透明的多晶zno薄膜。 -
Among various fabrication techniques of thin film, the sol - gel process has gained much interest for the preparation of pzt thin film, due to ihe advantages of good homogeneity, easy control of composition, low in - ill i reaving temperature, easy formation of large area thin films pb ( zrxti : - k ) 0 :, ( pzt ) films were prepared on the ito coated glass plates and low resistor silicon wafer in sol - gel dip - coating process associated wi di heat treatment : at different temperatures and characterized by x - ray diffraction ( xrd ) and transmission electron microscopy ( tem ). lt is shown that the pzt ferroelectric thin films with ( 110 ) preferred orientation and well - crystallized perovskite structure can be obtained after annealing at 680 ? for 30 minutes on ito substrate and at 800 " c for lornin on silicon substrate
Pzt的制備方法有很多，其中溶膠?凝膠（ sol - gel ）方法可以和集成電路（ ic ）光刻工藝相互兼容，處理溫度低，有大面積塗敷性能，能精確地控制組分，無需復雜的真空設備，成本低廉，所以對于集成鐵電薄膜電容的應用這種方法有很廣闊的前景。本文利用sol - gel技術在摻錫的in _ 2o _ 3透明導電薄膜（ ito ）襯底和低阻硅襯底上成功地制備了pzt鐵電薄膜。運用了x射線衍射， sawyer - tower電路和lcr電橋分別對薄膜的晶化溫度，結構和電學性能進行了測試。 -
The result shows that with the addition of rare earth elements, ultrasonic irradiation and magnetic field, the chemical component, surface configuration, microstructure and properties of electroless co - ni - b and co - fe - b alloy changes remarkably. such kind of change can be described as the followings. firstly the depositing speed of electroless alloy bath is raised while the polarizability and cathodic overpotential are reduced ; secondly the surface quality of the alloy coating and adhesion of the coating and matrix are improved ; thirdly in the coatings the content of the elements in the transient group increases, but the content of cobalt decreased ; fourthly the amorphous structure is transformed to microcrystal structure and polycrystal structure ; fifthly the microhardness and wear resistance of the coating are enhanced ; sixthly coercitive force is reduced, and magnetoconductivity of the coating is increased ; lastly the magnetic intensity of the coating increases with the addition of energy and light rare earth elements such as ce, la and decreases with the addition of heavy rare earth elements such as y. on the other side, when the alloy coatings passes through the heat treatment under the temperature of 250 or 500, their properties will change
結果顯示化學沉積co - ni - b 、 co - fe - b工藝在稀土元素（ ce 、 la 、 y 、 dy ） 、能量（超聲波、磁場）介入后，沉積過程、合金成分、鍍層形貌結構和性能都有顯著變化，表現在：鍍液的陰極極化過電位和極化度降低，沉積速度提高；鍍層的結合力、表面質量改善；鍍層中過渡族元素的含量增加，輕元素硼的含量降低，同時證實了稀土元素與過渡族元素共沉積的可能性；鍍層的顯微結構由非晶態向微晶和多晶態轉變；鍍層的顯微硬度與耐磨性提高，力學性能優化；鍍層的矯頑力降低；磁導率提高；鍍層的磁化強度在能量（超聲波、磁場）和輕稀土元素ce 、 la介入后提高，重稀土元素y介入后降低。 -
Moreover, the two - step heat treatment method was utilized in the preparation of the films, the films prepared by the first coating with 550 ? heat - treatment and the second coating with of with 500 ? heat - treatment ( b type films ) were highly c - axis oriented with smooth, dense and uniform surface morphology
此外，結合高溫和低溫熱處理方法優點的兩步熱處理法得到的b型薄膜同時具有較好的c軸擇優取向性和更為平整均勻的表面形貌。另外，在硅基板上也制備出了良好的c軸擇優取向性的摻雜氧化鋅薄膜。 -
After heat treatment, hardness of the coating is greatly improved because of precipitation of niap phase, while the difference of wear resistance between low - p coatings and high - p ones becomes little
鍍層經熱處理后，由於ni _ 3p的析出使鍍層硬度得以提高；低磷鍍層和高磷鍍層在熱處理后的耐磨性能燕山大學工學博士學位論文差別不大。 -
To make cds / k4nb6o17 powder on the base of the k4nb6o17 powder which by the courses of ion exchanging, amine intercalation, sulfuration etc. to obtain cds / k4nb6o17 thin film through the same course of making cds / k4nb6o17 powder on the base of k4nb3o17 thin film on the quartz which made by the spin coating and after heat treatment. to make experiments with additives ( na2so3, 0. 1mol / l ) of photocatalytically decomposing water into h2 and o2 to evaluate the photocatalytic activities of the catalyst knb6o17 powder, cds / k4nb6o17 powder, k4nb6o17 film, cds / k4nb6o17 film. the crystalline structures of the midst powder and film productions were investigated by using the x - ray diffraction ( xrd )
本課題的主要內容是：高溫固相反應合成具有層狀結構的k _ 4nb _ 6o _ （ 17 ）晶體材料，然後以此為母體材料，通過離子交換、層間胺插入、硫化處理等過程制備出cds / h _ 4nb _ 6o _ （ 17 ）粉末形式的光催化材料；通過旋轉塗覆法在石英玻璃基片上制備了k _ 4nb _ 6o _ （ 17 ）薄膜，採用一定的熱處理制度后對薄膜分別進行離子交換、層間胺插入、硫化處理等處理過程制備了cds / h _ 4nb _ 6o _ （ 17 ）薄膜形式的光催化材料。 -
Effects of heat treatment on hardness and corrosion resistance of ni - p electroless coating
基化學鍍層顯微硬度和耐蝕性的影響 -
The main results are : grinding is favorable to improve surface smooth degree, while nitrided and slow deposition makes sic granules fine ; the width of coatings gap increased in order of grinding, nitrided and vacuum heat treatment, but gap defects in multilayer coatings could be removed by slow deposition ; temperature of maximum weight loss could be decrease to 600 by grinding, vacuum heat treatment or slow deposition, but it will increased to 800 after nitrided ; oxidation kinetics curves all varied with the coating modifications
主要有：磨削改性有利於提高塗層表面平整度，氮化和慢沉積使塗層表面顆粒細化。塗層間隙寬度按磨削改性、高溫氮化、真空熱處理依次增大，而慢沉積可獲得無面缺陷的多層塗層。磨削改性、真空熱處理及慢沉積均使最大氧化失重溫度點提前至600 ，而高溫氮化則使最大失重點后移至800 。 -
Two coating approaches were adopted, one was to do next coating after 550 ? heat - treatment ( called a coating technique ) ; the other was to do next coating after 100 ? drying, the films coated by several times were heated at 550 ? ( calied b coating technique ). xrd, sem, tem and afm were used to characterize the crystallization behavior, orientation and surface morphology of the zno thin films
運用xrd 、 sem 、 tem以及afm等對所得的樣品進行了分析和研究，結果表明：採用不同的旋塗工藝得到不同的薄膜厚度，而採用每次塗膜形成氧化物膜后再進下一次塗膜的方式能更好的保持zno薄膜的c軸擇優取向生長。 -
Prepared technical parameters were optimized by l9 ( 34 ) experiment analysis. a unique method for cleaning and drying of substrate - cleaning used by scour, drying used by infrared light was fished out by large numbers of experiment. chemical mechnism of zno thin film prepared by sol - gel technique was discussed by dta for the first time. by the measurements of sem, xrd and uvs, the thin film was analysed. the result proved that the thin film with strongly preferred orientation of c - axis perpendicular to the substrate surface which surface was homogenous, dense and crackfree was the crystalline phase of hexagonal wurtzite. the thin film was composed of plentiful asteroidal crystal which crystal dimension approximately 10 30nm. the average transmittance of thin film in visible region was above 90 %. the results of measurements else also proved that the thickness of single dip - coating was 75 240nm, this films resistivity was found to be 3. 105 102 3. 96 105 ? cm. the thickness and resistivity of thin film influenced by dope - content, withdrawal speed, pre - heat - treatment, anealing were reseached respectively
利用xrd 、 sem以及uvs光譜儀等分析方法對薄膜進行了研究，結果顯示，所制備的薄膜為六方纖鋅礦型結構，具有高c軸擇優取向性；表面均勻、緻密，薄膜材料由許多星狀晶粒組成，晶粒尺寸大約為10 - 30nm左右；薄膜可見光透過率平均可達90 % ；對薄膜厚度以及電學性能進行了測定后發現：單次鍍膜厚度約為75 - 240nm ， al ~ （ 3 + ）離子摻雜型氧化鋅薄膜的電阻率在3 . 015 102 - 3 . 96 103 ? cm范圍內；分別研究了摻雜濃度、提拉速度、預燒溫度、退火溫度等工藝參數對薄膜厚度和電阻率的影響。 -
We also offer the subcontracted services of finishing operation, assembly operations, surface coating and heat treatment
我們的專業工程師技術精湛深熟精密五金零件的加工 -
Before heat treatment, the coating with low phosphorus content is harder than that with high phosphorus content and its abrasion - resistance is also better
在鍍態下，低磷鍍層較高磷的非晶鍍層具有更高的硬度，其耐磨性能也顯著高於高磷鍍層。 -
Bioactive hydroxypatite coating on carbon carbon composite prepared by sonoelectrodeposition and alkaline - heat treatment
堿熱處理復合工藝制備羥基磷灰石生物活性塗層研究
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