high gas rate well 中文意思是什麼

high gas rate well 解釋
高產氣井
  • high : adj 1 高的〈指物,形容人的身高用 tall〉;高處的;高地的。2 高級的,高等的,高位的,重要的。3 高尚...
  • gas : n (pl gases )1 氣,氣體,氣態 〈cf fluid; solid〉 2 可燃氣,煤氣,沼氣;【礦物】瓦斯。3 【軍事...
  • rate : n 1 比率,率;速度,進度;程度;(鐘的快慢)差率。2 價格;行市,行情;估價,評價;費,費用,運費...
  • well : n 1 井。2 泉水;源頭,來源。3 坑,穴,凹處;【礦物】礦井,豎坑;【軍事】(地雷的)井坑;【建築】...
  1. The civil well log company get the suit rate of artificial interpretation for oil - gas bed is though very high, it mainly depended on the rich experience of the log engineers, and it is very disadvantageous for the popularization of the oil - gas - water bed interpretation

    國內測井公司人工解釋油氣層的符合率雖然很高,但主要是依賴測井解釋工程師豐富的實際經驗,這對油氣層解釋工作的推廣極為不利。
  2. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積,得到了含氮量為21at的cn薄膜;研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響,給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因;引入脈沖輝光放電等離子體增強pld的氣相反應,給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑;應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ,得到了含n量為56at的晶態cn薄膜;探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系,證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果;採用光學發射譜技術對cn薄膜生長過程進行了實時診斷,得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律,給出了cn薄膜沉積的主要反應前驅物,揭示了cn薄膜特性和等離子體內反應過程之間的聯系;採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性,揭示了si原子對薄膜生長過程的影響,給出了si基表面碳氮薄膜的生長模式;在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積,證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性,並可顯著提高晶態碳氮材料的生長速率。
  3. Research on sand control technique after fracturing in high pressure and high gas rate well in west sichuan

    川西高壓高產氣井壓後防砂技術研究
  4. On the basis of comparing various productivity calculation formulas, the authors put forward the productivity calculation method for the horizontal well of condensate gas reservoir, which proves a high accurate rate in the cases

    在比較了適合於油藏水平井產能計算公式的基礎上,提出了凝析氣藏水平井產能計算方法,通過實例計算,正確率較高。
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