metal organic chemical vapor deposition 中文意思是什麼

metal organic chemical vapor deposition 解釋
金屬有機氣相沉積
  • metal : n 1 金屬；金屬製品；金屬合金。2 【化學】金屬元素；（opp alloy）；金屬性。3 【徽章】金色；銀色。4 ...
  • organic : adj 1 【醫學】器官的；器質性的；有機體的；【化學】有機的 （opp inorganic）。2 有組織的，有系統的...
  • chemical : adj 化學的，化學作用的；應用化學的，用化學方法獲得的。n 〈常 pl 〉化學製品；藥品。 fine chemicals...
  • vapor : n. 〈美國〉＝ vapour.
  • deposition : n. 1. 免職，罷免；廢位。2. 淤積[沉積]（物，作用）。3. 耶穌從十字架上放下（的畫、雕刻）。4. 寄存，委託；委託物。5. 【法律】口供，證言；口供書。
  1. Traditional methods of manufacturing oxide films include thermal oxidation, chemical vapor phase deposition, metal - organic chemical vapor phase deposition, sol - gel method and so on

    傳統制備氧化物薄膜的方法包括熱氧化、化學汽相淀積、金屬有機物化學汽相淀積、溶膠凝膠法等等。
  2. In the present thesis, znse, znte and their quantum well ( qw ) structures on si substrates with zno as buffer layer by low pressure metal - organic chemical vapor deposition ( lp - mocvd ) technique were prepared. zno is selected as the buffer layer for it has many similarities with the oxide layer on the surface of si wafer. all important experimental results and conclusions presented in this thesis are summarized as follows : 1

    本文中，我們利用zno與si襯底上氧化層? sio _ x有很好的浸潤性這一特點，採用zno作為緩沖層，用低壓-金屬有機物氣相沉積（ lp - mocvd ）設備在si襯底上生長znse和znte薄膜以及zncdse znse和zncdte znte量子阱結構，並對其發光特性進行了研究，獲得的主要研究結果如下： 1 、在si襯底上獲得了較高質量的zno薄膜。
  3. The applications field of fgm include aerospace, electron, chemistry, biology and medicine fields ; the composition change also from metal / ceramic to metal / metal, metal / alloy, non - metal / non - metal and non - metal / ceramic. moreover, various methods including powder metallurgy, self - propagating high - temperature synthesis ( shs ), chemical and physical vapor deposition ( cvd and pvd ), electrodeposition, laser cladding method, plasma sputtering and sol - gel method have been studed. metal organic chemical vapor deposition ( mocvd ), using chemical vapor deposition of metal organic compounds, is an effective method for acquiring special function materials and membrane

    功能梯度材料是21世紀最有發展前景的新型材料之一，其用途已由原來的宇航工業，擴大到核能源、電子、化學、生物醫學等領域；其組成也由金屬?陶瓷發展成為金屬?金屬、金屬?合金、非金屬?非金屬、非金屬?陶瓷等多種組合；其制備方法主要包括粉末冶金法，自蔓延高溫合成法（ shs ） 、氣相沉積法（ cvd和pvd ） 、電沉積法，激光熔覆法，溶膠?凝膠法（ sol - gel ）等。
  4. To study its properties and obtain high quality thin films, a variety of techniques have been used such as molecular beam epitaxy ( mbe ), metal organic chemical vapor deposition ( mocvd ), magnetron sputtering, pulsed laser deposition, to prepare zno thin films

    為了獲得高質量的氧化鋅薄膜材料，人們已採用分子束外延，有機化學汽相沉積，脈沖激光沉積，磁控濺射等各種技術來制備氧化鋅薄膜材料。
  5. The fabrication methods such as molecular - beam epitaxy and metal - organic chemical vapor deposition and experimental studies of their properties have been reported, and theoretical studies mainly concentrate on the impurity binding energy varying the size of the wire, the effect of the applied electric field or magnetic field, and photoionization of impurities

    在實驗上已經用分子束外延和金屬有機化學汽相淀積等技術對其物理性質進行了廣泛的研究，而理論上的研究主要集中於研究量子線的尺寸對雜質束縛能的影響、外加電場或磁場的作用及雜質的光致電離效應。
  6. ( 2 ) several samples of different structure parameters are grown by low - pressure metal - organic chemical vapor deposition ( lp - mocvd ). it is found that pl peak intensity, full width at half maximum ( fwhm ) and light output intensity are greatly dependent on number of wells. ratio of well / barrier width nearly has no effect on pl peak intensity and fwhm, but has little relation to light output intensity

    通過分析pls ，可以及時獲取材料生長和結構設計的數據，對質量控制有重要的指導意義； （ 2 ）對不同結構的gainp algainp多量子阱樣品進行了光致發光及出光強度的測量，發現mqw的周期數目n對pl峰強度、半峰寬和出光強度的影響最大；阱壘寬厚度比a對pl峰強度和半峰寬的影響較小，但對發光強度的影響較大。
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