mirror optics 中文意思是什麼

mirror optics 解釋
反射鏡光學
  • mirror : n. 1. 鏡;反射鏡。2. 反映;借鑒;榜樣。vt. 映,反射;反映。
  • optics : n. 〈作單數用〉光學。
  1. In this paper, we brought forward an innovative idea : according to the characteristics of easy deformation of ultra - thin mirror, we employ a sphere mirror, which is easier to fabricate and test, to replace the aspherical mirror, then the sphere mirror is deformed into an aspherical one by active optics technology. on this purpose, we need to study the mechanism and method of shaping a spherical mirror into an aspherical one

    由於非球面鏡的加工和檢測都比較困難,因此本文提出了一個大膽的設想:利用超薄鏡易於變形的特點,以加工和檢測難度遠低於非球面的球面來代替非球面,運用鏡面的主動控制技術將球面反射鏡變形成所需精度的非球面反射鏡。
  2. Supplies optical filters for laser mirror, fiber optics and many of the latest thin film applications

    -生產光學低通濾波器紅外截止濾光片光學讀取頭用分光片
  3. In this paper, the scheme of mirror - protection circuit is introduced ; the mathematics model is built and confirmed ; and the protective network ' s influence on the stabilization of adaptive optics system is analyzed

    文章介紹了保護網路的方案,建立數學模型並進行了模擬驗證,分析了保護網路對自適應光學系統穩定性的影響。
  4. The sg - iii prototype facility is a experiment facility that is applied for the inertial confinement fusion ( icf ). the electrical control reflective mirror is the last adjust equipment when the laser enter the final optics module. so the adjust precision of the reflective mirror directly affects the shooting quality

    神光-原型裝置為我國用於慣性約束核聚變( inertialconfinementfusion , icf )研究的試驗裝置,電控反射鏡架為入射激光進入終端光學組件的最後一套調整裝置,該裝置調整精度的高低直接影響激光打靶的質量。
  5. At last, by use of finite analysis software, the compensation of 61 - element deformable mirror is discussed after we apply the protective network to the adaptive optics system

    最後應用有限元分析軟體,討論加入保護網路后, 61單元變形鏡擬合象差的能力變化。
  6. Manufacturing of large aspherical primary mirror is one of the key technologies for optics

    大口徑非球面主鏡的加工是光學製造里的關鍵技術之一。
  7. The projection optics with aspherical mirror of sub - nanometer accuracy are required to get a resolution of less than 0. 1 m m and wide exposure area simultaneously. the precision of polishing and testing for such ashperical surface is fairly high and it has not been achieved yet in our current state

    Euvl微縮投影物鏡為了同時實現大的曝光視場和0 . 1 m以下的成像解析度,微縮投影光學系統需採用面形精度達亞納米量級的非球面,但我們現階段的光學加工和檢測技術距此要求尚有一定的差距。
  8. The primary and secondary mirrors of the schwarzschild optics were fabricated in our institute and measured using zygo mark iv interferometer. figure errors were observed in both primary and secondary mirror of 5nm ( rms ). these magnitudes are very small at visible wavelength but sufficient to cause significant degradation in the wave - front quality of the schwarzschild optics in extreme ultraviolet ( euv ) wavelength

    利用zygomark干涉儀檢測的schwarzschild微縮投影物鏡主、次鏡面形精度表明,對可見光工作波段已具有足夠高的面形精度,均為5nm ( rms ) ,但在euv ( extremeultraviolet )波段,將給schwarzschild微縮投影物鏡帶來嚴重的波面誤差。
  9. It might preferable, however, to use shperical mirror for the first step studies of euvl in a series investigation of system design, component fabrication, assembly technique and experimental process. along this thought, the author designed a schwarzschild optics using spherical mirrors with 10 : 1 reduction projection optics

    作為研究的第一步,出於進行euvl原理及系統設計、光學元件的制備、系統集成、掩模曝光實驗等相關技術研究目的,採用球面schwarzschild微縮投影物鏡是比較切實可行的技術方案。
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