optical balance 中文意思是什麼
optical balance
解釋
光學補償-
In wavelength conversion based on four - wave mixing ( fwm ) in soa, balance efficiency can be obtained in larger range when increasing saturation power of the optical amplifier and decreasing the saturation power of spectral hole burning and carrier heating
而在基於soa的四波混頻（ fwm ）波長轉換中，在提高光放大器飽和功率的同時減小光譜燒孔（ shb ）和載流子加熱（ ch ）飽和功率可有效提高較大頻率間隔處的轉換效率，並保持其在較大頻率失諧范圍內的效率均衡。 -
In this modulator, coplanar strips ( cps ) are used as electrodes for they support balance mode propagation of microwave, and this is a desired merit for common optical modulator. due to the miniaturized dimensions, the metallization thickness is in the order of skin depth and the conductor losses are not negligible
雖然由於金屬的趨膚效應，電場將集中在金屬表面，但在40g以上的頻率條件下，金屬的厚度和趨膚深度在一個量級，而且此時調制器帶寬受到限制的最大根源來源於金屬電極的微波損耗。 -
The theory of this novel gyroscope is analysed, the output optical power formulae is deduced. the balance - output or the single - port - output can be used in this novel gyroscope, and the signal measure methods of the sagnac interferometric optical fiber gyroscope can be used in it too
本文分析了其工作的基本原理，推導了輸出光功率表達式，指出可以採用平衡輸出或單端輸出兩種信號輸出方法，可以採用類似於sagnac干涉式光纖陀螺的信號檢測方式。 -
The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate
採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。 -
Further more, the double optical hard - limiters and balance receiver with fbgs based encoder / decoder is introduced into ocdmia system to reduce the ber of system
此外，為了進一步降低各類ocdma系統的ber ，我們還探討了在系統中引入雙光硬限幅器和平衡補償接收fbg編解碼器的可能性和可行性。 -
Two kinds of instruments, the commercially available nanoindenter and a custom designed optical balance, are utilized. two methods are employed to evaluate the mechanical properties using a nanoindenter
本論文利用納米壓入儀和改造的電光天平對微機械材料的力學特性進行了測量。
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