proximity exposure 中文意思是什麼
proximity exposure
解釋
接近式曝光-
Abstract : a new method for determining proximity parameters, and in electron - beam lithography is introduced on the assumption that the point exposure spread function is composed of two gaussians. a single line is used as test pattern to determine proximity effect parameters and the normalization approach is adopted in experimental data transaction in order to eliminate the need of measuring exposure clearing dose of the resist. furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron - beam lithography on the same experimental conditions
文摘:在電子散射能量沉積為雙高斯分佈的前提下，提出了一種提取電子束光刻中電子散射參數，和的新方法.該方法使用單線條作為測試圖形.為了避免測定光刻膠的顯影閾值，在實驗數據處理中使用歸一化方法.此外，用此方法提取的電子散射參數被成功地用於相同實驗條件下的電子束臨近效應校正 -
Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。 -
Issues of spatial extent and resolution, the selection of environmental burdens to analyze, data and methodological limitations, and different approaches to delineating exposure are discussed in the context of the asthma study, which, through proximity analysis, found that people living near ( within specified distance buffers ) noxious land uses were up to 66 percent more likely to be hospitalized for asthma, and were 30 percent more likely to be poor and 13 percent more likely to be a minority than those outside the buffers
本研究考慮空間與?圍、環境分析的資料、所收集資料與不同應用方法的限制及運用不同方法去說明該研究族群之暴露情形，透過趨近分析，發現以該地空氣污染濃度劃分結果，相較于污染較低之區域，居住于污染物濃度較高之區域，有高於66 %以上的機率會因氣喘而住院治療，有33 %是機率因為貧窮， 13 %以上的機率可能是未成年者。 -
300 mhz 3 ghz human exposure to radio frequency fields from hand - held and body - mounted wireless communication devices - human models, instrumentation, and procedures - part 1 : procedure to determine the specific absorption rate for hand - held devices used in close proximity to the ear frequency range of 300 mhz to 3 ghz
人暴露于手持和車載無線通信設備產生的射頻場.人體模型儀器和規程.第1部分:緊貼耳朵使用的手持設備 -
In view of the monument s close proximity to the sea and long - time exposure to the sun, hard and durable granite from the same ore vein with a stable and uniform dark colour is used for both the pedestal and the pillar. different surface treatments are however adopted to produce diverse textures
紀念碑臨海，四周空曠，日照時間長，因此基石和柱身採用同一礦脈、石質堅實和色澤均勻穩定的深色麻石，但經不同表面處理，質感各異。
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