sputtering source 中文意思是什麼
sputtering source
解釋
濺射源- sputtering : 飛濺
- source : n 1 源頭，水源，源泉。2 根源，本源；來源。3 原因；出處；原始資料。4 提供消息的人。5 血統。vt 〈美...
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Magnetron sputtering target source and sputtering procedure
磁控濺射靶源設計及濺射工藝研究 -
Study of pressure distribution in sputtering chamber of multi - source roll coater
多靶連續卷繞鍍膜機濺射室布氣均勻性研究 -
Reactive sputtering source
反應濺射源 -
Keywords : gims, ion source, anode layer, sputtering, tin, ion plating ， medium frequency, pulsed dc
中文關鍵詞：氣離濺射、離子源、陽極層流、濺射、氮化鈦、離子鍍膜、中頻、脈沖直流。 -
Through optimization of excitation parameters of the glow - discharge source and calculation of the sputtering rate of the certified reference materials, a method for the quantitative surface analysis of nc - si : h film was established
方法應用於實際摻雜納米硅薄膜樣品的分析，並將分析深度、剖析結果與表面形貌儀的結果進行了對照。 -
According to euvl requirement, this paper also presents a multiplayer thickness distribution control method by use of a platter velocity profiling technique in which the platter revolution speed is varied as a function of its position relative to the sputtering source. the optimum velocity p
採用此方法，筆者在pl50mm完成了均勻euv多層膜的制備，膜厚空間分佈非均勻性由恆定公轉速度的7減小到1 ，達到了euvl的要求。
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