step etching 中文意思是什麼
step etching
解釋
階段性蝕刻-
The selective etching of the evaporated or squeezed layers is a critical step in preserving yield.
蒸發層和濺射層的選擇刻蝕是保證成品的關鍵步驟。 -
According to the working principle of thermo - electrode, we demonstrate the structure of enlarged reflection area and the structure of step broaden waveguide to improve the switch ' s performance and bring down the driving power. according to the fabricating condition of our lab, we proposed simple wet - etching method to fabricate the oversized waveguides and peeling - off method to fabricate the electrode
針對全內反射和熱電極的作用特點，在全內反射型熱光開關的設計中提出了擴大反射區結構和漸變展寬結構，理論模擬和實驗結果表明該方法能有效地提高了開關性能，降低了驅動功率。 -
This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide, after that, using eb - lithography and dry etching to fabricate photonic crystal holes, so can reduce the fabrication cost by a big range ; designed the moulding board, which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully, then an successful eb - lithography is realized on the structure, the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment, which grounded etching sacrificial layer by photonic crystal holes in next step
提出採用紫外光刻工藝製作傳統波導結構之後，通過電子束曝光和干法刻蝕製作光子晶體小孔的工藝方案，大幅度減低了製作成本；設計出可形成空氣橋結構、並且適用於電子束曝光位置識別的光刻模板，在soi材料上成功製作出帶有空氣橋刻蝕預留槽以及接續光波導的結構，在該結構上成功實現了光子晶體帶隙波導的電子束曝光，帶隙波導與接續光波導位置接續良好；最後利用預留槽進行了刻蝕犧牲層的實驗，為下一步利用光子晶體小孔刻蝕犧牲層形成空氣橋結構打下了基礎。 -
So the mirror and mechanical part can be fabricated in a one - level mask step by bulk micromachning of ( 100 ) with koh etching. we can on off the light path and switch the light exchange by controlling the movement of mirror
本論文使用傳統的koh腐蝕液，利用硅材料的各向異性的特點，加工出了垂直於襯底表面的微鏡結構，利用這種微鏡結構可以完成光線的切換，實現光路的開關功能。 -
A different approach, named " two step growth approach " has been applied to fabricate an 8x8 photodiode array in the first time. the micro - processing procedures of this photodiode array including standard photolithography, a number of metallisation, wet - chemical etching and sic2 deposition for insulation were developed in this study
首次採用「兩步法」制備出了新穎的8 8zns肖特基光電二極體陣列，詳細研究並確定了制備該器件的標準光刻、金屬沉積、濕化學腐蝕、 sio _ 2絕緣層沉積等一系列微電子處理工藝。 -
As an important step of microelectronic process, etching technology has gained much attention. it will play an important role in microfabrication such as new - made microeletronics mechanism ( mems ) and photoelectrics integration system
刻蝕工藝不僅作為微電子工藝中的關鍵技術一直受到人們的關注，而且在新興的微機電系統，光電集成系統等微細加工中也將得到重要應用。 -
We discuss a low cost fabrication method of a diffractive microlens with high performance for both blue and red dvd objective lenses, which consists of single - step photolithography and a wet etching process
摘要採用單步光刻和濕法腐蝕工藝，低成本快速製作面向高性能藍光和紅光dvd光學頭物鏡的衍射微透鏡。
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