stress in thin film 中文意思是什麼

stress in thin film 解釋
薄膜應力
  • stress : n 1 壓力，壓迫，緊迫，緊張。2 【語音】重音；重讀；【詩】揚音；語勢，著重點。3 重要（性），重點，...
  • in : adv 1 朝里，向內，在內。 A coat with a furry side in有皮裡子的外衣。 Come in please 請進來。 The ...
  • thin : adj （thinner; thinnest）1 薄的 （opp thick）; 瘦的 （opp fat stout）; 細小的；【印刷】細體的。2 ...
  • film : n 1 薄層，薄膜；薄霧，輕煙；細絲狀的東西。2 【攝影】感光乳劑，照相軟片，電影膠片；影片。3 〈 pl ...
  1. The tested materials include ( 100 ) silicon wafer, ( 110 ) silicon wafer, poly - silicon thin film, dry oxidized silicon dioxide thin film, wet oxidized silicon dioxide thin film, lto thin film, standard lpcvd silicon nitride film, low stress lpcvd silicon nitride film, alumni nitride film, zinc oxide film etc. in the nanoindentation experiment of the single crystal silicon, two different mechanical phases are observed at different indentation depth

    用納米壓入法對（ 100 ）單晶硅及（ 110 ）單晶硅、多晶硅薄膜、干氧薄膜、濕氧薄膜、 lto薄膜、標準氮化硅薄膜、低應力氮化硅薄膜、氮化鋁薄膜、氧化鋅薄膜等重要材料的楊氏模量和納米硬度進行了系統地測量。報道了單晶硅在壓入過程中觀測到的兩個力學相的變化。
  2. The surface morphologies of thin films were observed by using scan electron microscope ( sem ) and atomic force microscope ( afm ). based on grazing incidence x - ray diffraction ( gixrd ) equipment, we find that residual stress exist in magnetron sputtering plct film, in addition, the ferroelectric properties of plct thin films were measured by radiant premier lc type multifunctional ferroelectric properties test system

    利用廣角x射線衍射技術對不同濺射工藝下plct薄膜的相結構進行了研究;採用掃描電子顯微鏡（ sem ）和原子力顯微鏡（ afm ）分別觀察了薄膜的表面形貌;利用掠入射x射線衍射（ gixrd ）測量了薄膜的殘余應力。
  3. The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage

    利用掠入射x射線分析（ gixa ）技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射（ saxs ）技術測量了薄膜的厚度;採用原子力顯微鏡（ afm ）觀察了薄膜的表面形貌;運用能量損失譜（ eds ）及x射線熒光光譜（ xrf ）對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。
  4. The xrd results show that the sputtered lcmo film grains are grown epitaxially, when the lattice mismatch between film and substrate is small. the lcmo thin films grown on sto substrates show an in - plane tensile stress

    Xrd的研究結果表明，當基片與lcmo薄膜間的晶格失配度較小時，薄膜和基片具有一致的晶格取向，薄膜具有較好的外延結構特徵。
  5. Abstract : a laser damage facilities, which has mm size spot and operates in tem00 mode ， were achieved. in order to know the reasons of laser damage, the laser energy density was controlled near the damage threshold of the oxide thin films. according to the examined near - threshold damage morphology, the damage mechanisms of the optical coatings can be divided into two types. one was caused by melting of the coating materials, another by exploding, induced with the inner stress of the film. the plasma generated was an important reason to expand the damage area

    文摘:採用毫米量級大光斑的近單模的激光器，控制入射薄膜表面的激光能量，獲得了幾種常見單層膜和增透膜的損傷形貌，實驗結果表明，薄膜的損傷可區分為熔化型和應力型兩種，薄膜表面等離子體對損傷斑點的擴大有重要作用。
  6. Discussion the design of the process flow and device structure of comb capacitance mode micro shear stress sensor in details, selecting suitable thin film material. finite element analysis the structure and fluid coupling of comb capacitance device was performed by ansys software

    然後利用有限元分析軟體ansys對梳齒電容式微型剪應力傳感器的質量塊模型進行結構和流體耦合分析，得到梳齒質量塊結構的應力分佈和位移分佈雲圖。
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