x-ray apparatus 中文意思是什麼

x-ray apparatus 解釋
x射線設備
  • x : X2＝ （羅馬數字）10 XX ＝ 20 IX ＝ 9 XV ＝ 15 XL ＝ 40 LX ＝ 60 XC ＝ 90 DXL ＝ 540 MX ＝ 1010 ＝...
  • ray : n 雷〈姓氏，男子名， Raymond 的昵稱〉。n 1 光線，射線，熱線；〈詩〉光輝，閃爍，曙光，一線光明。2 ...
  • apparatus : n （pl apparatus（es））1 器具，裝置，設備，機器，器械，儀器。2 （身體上的）器官。3 政治機構，機...
  1. The types of the detection equipments and apparatus are over 100, such as x - ray detector, r - ray detector, digital ultrasonic flaw detector, eddy current flaw detector, eddy current flaw detector, magnetic memory metal diagnostic instrument, acoustic emission testing an analyzing system, three - dimensional ultrasonic testing system, microcomuterhydraulic pressureniversal testing machine, metalloscope, portable direct - read spectrograph, have achieved the national advanced technology

    擁有各種檢測設備100多套，如射線探傷機、數字式超聲波探傷儀、渦流探傷儀、磁記憶金屬診斷儀、聲發射檢測及分析系統、三維超聲波檢測系統、便攜式直讀光譜儀、微機式液壓萬能試驗機、金相顯微鏡等，達到國內先進水平。
  2. Firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x - ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha - step500. and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate - to - target distance and temperature

    第一、應用穩定的直流磁控濺射設備制備tio2減反射薄膜並通過n & kanalyzer1200薄膜光學分析儀、 x射線衍射分析（ xrd ） 、掃描電子顯微鏡（ sem ） 、 alpha - step500型臺階儀等儀器對薄膜進行表徵，分析氧分壓、總氣壓、工作溫度、靶基距等制備工藝參數對薄膜性能結構的影響。
  3. Discussion on digitalization of traditional gastroenteric x - ray apparatus and relevant matters

    線機數字化相關問題的探討
  4. General requirements for high - voltage generators of medical x - ray apparatus

    醫用x光射線裝置的高壓發電機的一般要求
  5. High voltage cables for x - ray apparatus

    X射線儀用高壓電纜
  6. In this paper, the author study the measurement method and instrument of the euv / x - ray optical component, improve the design of the measuring apparatus - long trace profiler ltp already existing, provide a kind of newly long trace profiler ltp - iii, which is used to measure the slope error

    本文主要是研究euv x - ray光學元件面形誤差的測量方法與測量儀器。對已有的測量儀器長軌面形儀ltp儀器進行了改進設計，提供一種新型的長軌面形儀ltp - ，用於測量光學元件的傾斜度誤差。
  7. In this paper, the definitions of soil macropore and macropore flow, their types, characteristics, generation mechanisms, and experimental methods in laboratory and field were introduced, and the research progress in their determination techniques, including dye tracing, slice up penetration curve, tension infiltration apparatus, x - ray ct scanning, and radar exploration were summarized

    摘要介紹了大孔隙及大孔隙流的定義、多種表現形式及其重要特徵、產生機理和室內外實驗研究概況，以及染色示蹤、切片、穿透曲線、張力入滲儀、 x射線ct掃描攝像和雷達探測等方法的研究進展，揭示這些實驗方法的優點與存在的問題。
  8. Nuclear instrumentation - bore - hole apparatus for x - ray fluorescence analysis

    核儀器. x射線熒光分析法用鉆孔設備
  9. X - ray apparatus for structure analysis

    結構分析用
  10. In this work, the influences of fabrication process on microstructure, dielectric properties, ferroelectric properties and pyroelectric properties of plt films have been studied. plt films were prepared on the pt ( 111 ) / ti / sio2 / si ( 100 ) substrates by radio frequency magnetron sputtering method and then annealed by rapid thermal annealing process ( rta ) or conventional furnace annealing process ( cfa ). with the help of atom force microscopy ( afm ), x - ray diffraction ( xrd ) and some other apparatus, it was found that : lower substrate temperature ( ts ) was helpful for plt films to form better surface morphologies. with the increase of substrate temperature, the dielectric constant of plt films increased

    Afm 、 xrd以及性能測試結果表明:較低的基片溫度有利於形成表面均勻緻密的薄膜，且薄膜的表面粗糙度均方根較小;隨著基片溫度的升高，經過快速退火的plt薄膜的介電常數逐漸增大;相比于傳統退火，快速退火縮短了退火時間，提高了薄膜的介電和鐵電性能;快速退火隨著保溫時間的延長，大部分鈣鈦礦結構的特徵峰的峰強增大，半高寬減小，峰形越來越尖銳，但當保溫時間為80s的時候， （ 100 ）和（ 110 ）峰的強度有所下降，因此保溫時間在60s較為適宜。
  11. Industrial x - ray apparatus for radiographic testing

    放射照相試驗用工業x光射線檢驗裝置
  12. Capacitor discharge x - ray apparatus for chest indirect radiography

    胸部間接照相用電容放電x光射線裝置
  13. Development and application assessment of protective installation attached to philps 3000 x - ray apparatus

    射線機附加防護裝置的研製與應用評價
  14. Measurement of the effective focal spot size for industrial x - ray apparatus

    工業用x光射線儀有效焦點尺寸的測量
  15. Condenser type mobile x - ray apparatus

    電容式流動
  16. X - ray therapy apparatus x

    射線治療機
  17. X - ray deep therapeutic apparatus

    深部治療
  18. The thesis studies the films " structures and properties by means of scanning electron microscope ( sem ), transmission electron microscope ( tem ), x - ray photoelectron spectrometer ( xps ), raman spectrometer, uv - vis spectrometer, thin films analysis apparatus, and target materials. it is the difference of atom ordinal number and sputter area that results in ce prior sputter and ce / ti molar ratio in films is 50 % more than ce / ti molar ratio in practical target design

    利用各種分析測試方法（ sem 、 tem 、 xrd 、 xps 、 raman 、 uv - vis 、薄膜分析儀等）對薄膜的結構與性能進行了全面研究，得出如下結論：靶材的濺射由於ce 、 ti的原子序數不同，濺射閾不同而造成ce的優先濺射，薄膜中的ce ti摩爾比與實際靶材設計的ce ti摩爾比高50左右。
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