拋光液 的英文怎麼說

中文拼音 [pāoguāngyè]
拋光液 英文
liquid polishing agent
  • 拋 : 動詞1. （扔; 投擲） throw; toss; fling 2. （丟下; 拋棄） leave behind; cast aside; abandon
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 液 : 名詞（液體） liquid; fluid; juice
  • 拋光 : [機械工程] polishing; burnishing; buffing; chasing
  1. Corrosive effect of slurry inhibitor on copper wafer

    拋光液中緩蝕劑對銅矽片的影響
  2. Seal the assistant who clears up machine being that one kind of new model is good be used for the stainless steel project, equipment, what be come into being black solders road, handles a simplicity when it can help your relaxed treatment argon arc soldering machine flow welding stainless steel, grab the head as long as using this machine to control touch choose clear up liquid saying that the surface is light in soldering clean, the black welding bead is immediately disappear, bright if new, hurt bright stainless steel surface face by no means, clear up the queen using wet fabric to clean again, outside, stainless steel not getting rusty, not being suffused with yellow, be quick, more beautiful, more economical than using acid - washing method speed such as cream and polishing

    焊縫清理機是做不銹鋼工程、設備的又一種新型好幫手，它可以幫助您輕松處理氬弧焊接機燒焊不銹鋼時所產生的黑色焊道，操作簡單，只要用本機操縱搶頭沾取清理液在焊道表面輕輕擦拭，黑色焊道即刻消失，光亮如新，決不傷害不銹鋼表面亮面，清理后再用濕布擦拭，不銹鋼表面不生銹、不泛黃，比用酸洗膏和拋光等方法速度更快、更美觀、更經濟。
  3. The company has wide range of business scope including chemical assistant agents, mechanical manufacture and production of stainless steel bolus with seven series products as follows : stainless steel bolus, brightener, abrading agents, abrading material, chipping liquid, polishing cleaning up machine, abrading machine and more than one hundred kinds of products that provide economical and reliable methods for the cleaning up, polishing, consolidating, burr elimination, rust removing, brightening, edge rounding - off, cleaning, maintenance and anti - rusting, base course electroplating and abrading

    本公司集化工助劑、機械製造、不銹鋼丸生產於一體，現有產品有不銹鋼丸、光亮劑、磨液、磨料、切削液、拋丸清理機、研磨機、等七大系列100多個品種，為零件清理、亞光、強化、去毛刺、除銹、光亮拋光、邊緣倒圓、清洗、防護防蝕、電鍍基底和研磨加工等提供經濟和可靠的方法。
  4. Apical shapes were formed through electropolishing in the 1 - m naoh water solution at 2 volts with reciprocating the electrode array

    尖端的形狀通過電解拋光法構成， 2伏的電壓在電極陣列和1m氫氧化鈉溶液之間互換。
  5. To find out the effective slurry with suitable type of oxidizer and concentration, chemical etching experiment was applied to the litao3 wafer. the chemical etching effects were analysed by measuring etching rate and x - ray spectrum

    採用化學腐蝕實驗方法研究拋光液中氧化劑種類和濃度以及拋光液ph值對鉭酸鋰晶片化學去除的影響。
  6. Protecting the glossiness of workpiece surface, suitable used as immersion liquid after polishing

    保護工件表面的光澤.適于作拋光后的沉浸液
  7. Corrosion and passivation of copper in the cmp slurry of ch3nh2 - k3 fe

    鐵氰化鉀化學機械拋光液中的腐蝕與鈍化
  8. Study on the mechanism about formation of passive film on copper in ch3 nh2 - k3 fe

    鐵氰化鉀拋光液中銅鈍化成膜的機理研究
  9. Standard test method for nonvolatile matter total solids in water - emulsion floor polishes, solvent - based floor polishes, and polymer - emulsion floor polishes

    水乳液地板拋光劑溶劑基地板拋光劑和聚合物乳液地板拋光劑中的不揮發物
  10. 1 ) in the solutions with high hno3 concentration, the etching is similar to chemical polishing which produces flat surface. 9. 3 % surface reflectance is obtained through stopping etching when the blue color is appearing on the surface, which is lower than 15. 7 % reflectance of sio2 layer arc

    這對于提高太陽電池的效率是極有益的。 （ 2 ）反射特性、形貌和腐蝕液的關系1 ）在高hno _ 3的溶液中，近似化學拋光，制備的樣品表面相對光滑。
  11. The devices based on mrf include shock absorbers, brakes, clutches, polishing devices, hydraulic valves, etc

    磁流變液的快速流變性能使其廣泛用於製造減振阻尼器、制動器、離合器、拋光裝置和液壓閥等。
  12. It elaborates on the function of main parts of the polishing machine and its realization, and design a new type of permanent pressure monitoring system to overcome the limitation of the narrow spacial size which it is impossible that the application of traditional hydraulic control devices to achieve permanent pressure grinding. the model of polishing machine has been completed by pro / engineer

    對拋光機結構、精度及相應的控制系統框架進行了設計;對各個主要部分的功能及其實現等進行了闡述;並設計了一種新型的類恆壓力拋光裝置，克服了空間尺寸狹小、無法應用傳統的液壓控制裝置實現恆壓力磨削的局限性。
  13. The stability, rheology, chain structure and consecutive medium model in magnetorheological fluids are analyzed. according to the contribution of shear stress and normal pressure in polishing zone, the quantificational machining model of mrp is presented. as an example of plane workpiece, the influences of machining parameters on removal rate and surface roughness in mrp are studied

    5 、磁流變拋光（ mrf ）是超光滑光學表面的一種新型加工技術，本文從mrf的磁、力學性質出發，研究了磁流液的穩定性、流變效應、鏈化結構和連續介質模型；根據拋光區內剪應力、正壓力的分佈特徵，提出了mrf的定量加工模型；然後以平面工件的磁流變拋光為例，揭示了工藝參數對材料去除率和表面粗糙度的影響規律。
  14. The cmp experiment was carried out systematically on litao3 wafer. the polished surface foughness and material removal rate in different polishing conditions were measured and the effects of polishing pad material and its condition, pressure, rotating speed of the polishing plate, the type and size of abrasive, and the properties of the polishing slurry on the surface routhness and material removal rate were analysed in details

    通過對鉭酸鋰晶片的化學機械拋光過程的實驗研究，通過測量鉭酸鋰晶片在不同拋光條件下的表面粗糙度和材料去除率，詳細分析了拋光墊材料和狀態、拋光壓力、拋光盤轉速、磨料種類及粒度、拋光液組成等幾個因素對拋光表面質量和材料去除率的影響規律。
  15. Fp : fine polish media. made of high alumina and contains no abrasives. use with burnishing compounds to burnish metal or with compounds for deburring. these pins produce a high luster finish and are suitable for use in all type of finishing equipment

    主要由氧化鋁製成，不含砂粉，可與光亮劑一起使用拋光金屬表面，或與研磨液一起使用達到去毛刺的效果，其中的圓柱可產生非常光澤的拋光效果，適用與各種光飾機中。
  16. The experimental results indicate that for litao3 the oxidizers are naclo and h2o2, the stabilizator is koh and the most suitable ph value is 10

    尋找有效的氧化劑及其合適的濃度，確定合理的穩定劑及拋光液的適當ph值。
  17. The polishing technology of ccos is studied by a series of experiments. the effect of polishing process parameters on the removal efficiency and the stability of the removal function are studied, which include the polishing compound, the density of the polishing fluid, ph of the polishing fluid, the polishing velocity, the polishing pressure and so on. finally, a suit of effective process parameters are given and better experimental result are obtain

    在大量工藝實驗的基礎上，揭示了拋光劑種類、拋光液的供給量、拋光液濃度、拋光液的酸度值（ ph值） 、拋光速度、拋光壓力、拋光模材料、拋光模直徑及膠層厚度等對拋光效率和去除函數穩定性的影響規律;最後，總結了一套拋光工藝，利用該工藝進行的拋光精度收斂性實驗達到了較好的效果。
  18. What does advanced unigrit technology mean and what does it have to do with m86 cut & polish cream

    什麼是先進的無砂粒技術和它為什麼與m86切割&拋光液一起使用
  19. Passivation and abrasion of copper in hac - koh - kcio3 slurry

    3拋光液中銅的鈍化與磨損研究
  20. Based on the orthogonal experiment, the effect of some control factors, such as concentration of individual component, temperature and operation - times on the quality of polished copper and its alloy are discussed

    在此基礎上討論了拋光液各組分濃度、拋光溫度以及拋光次數對拋光效果的影響。
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