掩模對準 的英文怎麼說

中文拼音 [yǎnmóduìzhǔn]
掩模對準 英文
mask alignment
  • 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
  • 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
  • 對 : Ⅰ動詞1 （回答） answer; reply 2 （對待; 對付） treat; cope with; counter 3 （朝; 向; 面對） be tr...
  • 準 : Ⅰ名詞1 （標準） standard; guideline; criterion; norm 2 （目標） aim; target Ⅱ動詞1 （依據; 依照）...
  1. Through the research on the development character of overthrust fault, we analyzed its sealing mechanism. we also established evaluation standard and method of fault sealing ability through the following two simulation experiment : experiment on the quantitative relationship between property of fracture zone filler and fault sealing ability ; experiment on the deformation character of cream shale. based on these work, we evaluated sealing ability of overthrust faults on several typical structure in kuche depression

    本文通過逆掩斷層發育特徵研究，分析了逆掩斷層封閉機理，在斷裂帶填充物性質與斷層封閉性定量關系模擬實驗和膏泥巖變形特徵模擬實驗基礎上建立了斷層封閉性評價標準及評價方法，以此對庫車坳陷幾個典型構造上逆掩斷層垂向封閉性進行了評價，結果表明現今斷層多是封閉的，這是庫車塌陷天然氣和異常孔隙流體壓力得以保存的主要條件。
  2. Act of moving a mask or reticle to match up alignment marks

    對準，調整掩模和晶片之間的位置。
  3. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件，本論文設計並試驗了器件的製作的全部工藝，包括波導薄膜的沉積，掩模的設計製作，光刻，濺射金屬薄膜，剝離法製作金屬掩模，干法深刻蝕，矽片切割，端面磨拋，波導對準和性能測試。
  4. The second is about verification of alternating psm manufacturability and this part introduces a new method based on standard cells to resolve the phase conflicts, including for dark field and for clear field. the method has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestion for modification

    第二部分針對由傳統方法設計出的版圖不能滿足交替移相掩模要求的問題，介紹了一種基於標準單元的交替移相掩模可製造性驗證與設計的演算法，包括針對暗場和亮場兩種不同環境版圖的演算法。
  5. Test methods of mask alignment and exposure system

    掩模對準曝光機測試方法
  6. Specification for registration marks for photomasks

    光掩模對準標記規范
  7. Nevertheless, it ' s not very precise to locate the skin color region only in this way. so the texture model is introduced into the system. consequently, we get the skin region by the combination of skin color model and texture color model

    然而，單純地使用膚色模型並不能準確的找出皮膚區域，觀察發現皮膚區域多為光滑的連通區域，因此在上一步工作的基礎上作者引入了紋理模型對原圖像進一步的處理產生標注皮膚區域的掩碼圖像。
  8. In the third part, the essences of steganography and disadvanges of common visual perception evaluation, such as psnr and wpsnr are studied. based on analysis local error that is introduced by embedding information, combining hvs, three objective perception evaluation method for steganography performance are proposed, which are based on human visual systems and local statistic error distribution respectively. in the steganalysis part, a steganography security statistic attack model and methods for some steganography methods are presented

    在信息隱藏的性能評價方面，研究了常用的峰值信噪比，加權峰值信噪比等前人提出的感知性能評價準則，指出針對信息隱藏的性能評價不能單純從視覺特性出發，提出從信息隱藏的數據特性和感知特性出發，結合局部特性來考察失真誤差的變化的思想，並據此提出基於局部區域誤差統計分佈和視覺掩模方法評價信息隱藏性能的方法。
分享友人
分享到 Line

分享到臉書