掩模檢查工具 的英文怎麼說
中文拼音 [yǎnmójiǎnzhāgōngjù]
掩模檢查工具
英文
mask inspection tool- 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
- 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
- 檢 : Ⅰ動詞1 （查） check up; inspect; examine 2 （約束; 檢點） restrain oneself; be careful in one s c...
- 查 : 查名詞1. [植物學] （山查） hawthorn; haw2. （姓氏） a surname
- 工 : Ⅰ名詞1 （工人和工人階級） worker; workman; the working class 2 （工作; 生產勞動） work; labour 3 ...
- 檢查 : 1 （用心查看） check up; inspect; examine; censor; survey rummage; review; jerque; docimasia 2 （...
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Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。A phase - compatibility rule checker for standard cell layout designed with alternating psm
一種用於標準單元版圖交替移相掩模相位兼容性規則檢查的工具A soft - ware implementing this method is presented as well, which has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestions for modification
基於此方法的軟體工具能夠檢查標準單元版圖，找出不符合交替移相掩模設計要求的圖形，並給出相關的修改建議。
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