掩模法 的英文怎麼說

中文拼音 [yǎnmófǎ]
掩模法 英文
mask means
  • 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
  • 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
  • 法 : Ⅰ名詞1 （由國家制定或認可的行為規則的總稱） law 2 （方法; 方式） way; method; mode; means 3 （標...
  1. The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division

    摘要無掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
  2. Test method for calibration verification of laser diffraction particle sizing instruments using photomask reticles

    用光掩模原版校準檢驗激光繞射粒子定尺寸儀器的試驗方法
  3. At first, double random phase encoding techniques are looked back and its improved methods are introduced in detail. in connection with characteristics of spherical wave gene and function of phase mask, one random phase encoding techniques are proposed with spherical wave based on 4f system

    本文首先對雙隨機相位加密技術進行了回顧，並對它的一些改進方案的特點作了詳細介紹，並在此基礎上，根據球面波相位因子的特點和相位掩模在加解密中作用，提出了一種利用球面波照射4f系統的單隨機相位編碼加密的新方法。
  4. We have contrasted several methods on fabrication of passive matrix oled, then we mainly discuss two fabricating methods, one is the precise mask method, the other is the barrier wall method. we find that the barrier wall method to fabricate the passive matrix oled ( pmoled ) has the advantages of high resolution, simple process and no crosstalking problem, so the barrier wall method is the good one to fabricate pmoled. in this paper we adopt the both methods, and we have successfully fabricated the pmoled

    分析和對比了實現無源矩陣有機電致發光顯示器件的幾種方法，著重介紹了採用精密掩模技術和障壁技術等技術方案，來製作和設計無源矩陣有機電致發光顯示器件，其中採用障壁技術方案製作的器件具有解析度高、工藝簡單容易實現、器件的交叉效應少、成本低等許多優點，是一種可行的製作無源矩陣有機電致發光顯示器件的方案。
  5. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件，本論文設計並試驗了器件的製作的全部工藝，包括波導薄膜的沉積，掩模的設計製作，光刻，濺射金屬薄膜，剝離法製作金屬掩模，干法深刻蝕，矽片切割，端面磨拋，波導對準和性能測試。
  6. The second is about verification of alternating psm manufacturability and this part introduces a new method based on standard cells to resolve the phase conflicts, including for dark field and for clear field. the method has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestion for modification

    第二部分針對由傳統方法設計出的版圖不能滿足交替移相掩模要求的問題，介紹了一種基於標準單元的交替移相掩模可製造性驗證與設計的演算法，包括針對暗場和亮場兩種不同環境版圖的演算法。
  7. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out

    對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究，設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統，進行了實驗研究。
  8. Test methods of mask alignment and exposure system

    掩模對準曝光機測試方法
  9. ( 3 ) fabrication methods of planar, y - branches, and channel waveguides employing structure lights formed by cylindrical lenses and optical binary masks are investigated experimentally in detail

    對利用柱透鏡和光學二元掩模板形成的結構光在光折變晶體中寫入平面光波導、 y型光波導以及通道光波導的方法進行了詳細的實驗研究。
  10. The main parts are as follows : 1 ) at the base of the fabrication methods, the photosensitivity of optical fiber and the uv laser sources are introduced simply, the diffraction characteristics of phase mask are analyzed to get the distribution of refractive index in fiber grating, referent the paper [ 4 ] ( delivered )

    全文概括如下： 1 ）從常用的製作方法出發，簡單介紹了光纖光敏性和成柵光源，重點分析掩模板的衍射場，從而獲得理想情況下光纖光柵的折射率分佈函數，參考已投論文[ 4 ] 。
  11. Before more advanced lithography tool is produced, in order to use current tools to manufacture vdsm ic, reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry

    在波長更小的光刻系統出現前，為了能利用現有設備解決集成電路的可製造性問題，工業界提出了對掩模作預失真（光學鄰近校正）和在掩模上加相位轉移模（移相掩模）等的掩模校正方法。
  12. The paper is for verification and design of manufacturability of opc and psm as these two ways have become the most important correction ways

    由於光學鄰近校正和交替移相掩模已經成為最主要的掩模校正方法，因此本文主要針對這兩種方法進行可製造性的驗證和設計。
  13. A soft - ware implementing this method is presented as well, which has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestions for modification

    基於此方法的軟體工具能夠檢查標準單元版圖，找出不符合交替移相掩模設計要求的圖形，並給出相關的修改建議。
  14. However, in current design flow, designers do not consider whether designs are friendly to opc before they are sent to foundries. in fact, a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments. so even though such designs are corrected, many lithographic errors still exist

    然而，由於在當前的集成電路設計流中，在設計出的版圖送到製造廠商前，電路的設計者並沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題，這使得版圖中的一些圖形由於周圍條件的限制，如無法充分進行光學鄰近校正，無法進行交替移相掩模的處理等，從而使得版圖設計即使進行了校正處理，還存在大量光刻故障的可能性。
  15. This work analyses the means of micro - fabrication and the facts that effecting the result of micro - fabrication nowadays, gives out a solution to reduce the gradient and improve the depth of the micro - hole

    本文通過分析影響微孔加工質量的因素，提出減小微孔錐度和增加微孔深寬比的掩模旋轉鉆孔加工方法。
  16. The dissertation focuses on the yb3 + - doped double clad fiber laser. the research works in detail are shown as follows : 1. with the phase - mask method, we make a fiber bragg grating in a few - mode fiber whose cut wavelength is greater than 1060nm

    本論文圍繞著摻yb3 +雙包層光纖激光器進行研究工作，報告了得到的科研成果，包括以下的內容: 1 .在截止波長高於1060nm的少量模光纖中用相位掩模法寫入布拉格光纖光柵，製作的布拉格光柵具有幾個透射峰。
  17. The methods and systems ( including amplitude division double - beam interference system, three - beam interference system, liquid immersion type deep uv interference system and full automatic interference photolithographic system ) for amplitude division maskless laser interference photolithography are studied and compared

    研究和比較了振幅分割無掩模激光干涉光刻方法和系統，包括振幅分割雙光束干涉系統、三光束干涉系統、液浸式深紫外干涉系統及全自動干涉光刻系統。
  18. The basic principle, theory, main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution, deep sub - micron and nanometer patterns in large field of view are deeply investigated

    深入研究了無掩模激光干涉光刻技術用於高分辨、大視場、深亞微米和納米圖形生成的基本原理、理論、主要類型和實現方法。
  19. The author also makes a comparison between lifting scheme and tst and find that lifting produces a complete new multiwavelet and uses no matrix division or singular matrixes and generally produces shorter new masks than the tst algotithm. so we choose lifting as our method to improve the multiwavelet ’ s property

    我們研究了提升和兩尺度相似變換，發現通過提升可以構造全新的多小波而且不需要矩陣分解和求逆，產生的掩模通常比tst演算法更短，因而選擇提升作為改進多小波性質的方法。
  20. The foregoing states the sole and exclusive liability of the parties hereto for infringement of patents, copyrights, mask works, trade secrets trademarks, and other proprietary rights, whether direct or contributory, and is in lieu of all warranties, express, implied or statutory, in regard thereto, including, without limitation, the warranty against infringement specified in the uniform commercial code

    上文規定了本合同雙方就專利、版權、掩模、商業秘密、商標以及其他專有權利的侵權（無論是直接的還是協從的）所承擔的唯一責任，並且取代就其所做出的所有保證（明示的、暗示的或法定的） ，包括（但不限於）中規定的不侵權保證。
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