掩模設計 的英文怎麼說

中文拼音 [yǎnmóshèjì]
掩模設計 英文
mask layout
  • 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
  • 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
  • 設 : Ⅰ動詞1 （設立; 布置） set up; establish; found 2 （籌劃） work out : 設計陷害 plot a frame up; fr...
  • 計 : Ⅰ動詞1 （計算） count; compute; calculate; number 2 （設想; 打算） plan; plot Ⅱ名詞1 （測量或計算...
  • 設計 : devise; project; plan; design; excogitation; layout; layout work; styling
  1. To do the investigating and studying work about the achievements of tackling key problem of the quondam exploration of front - zone of mountain, to analyze and study the applicability about the gathering technology used in the seismic exploration of the complicated construction belt of front - zone of mountainous ; 2. combining the quondam achievements, researching the design method of observation system objective of the complicated construction belt based on seismic - geology model, firstly, building the surface level and deep layer seismic - geology model of complicated construction belt and analyzing the forward model, secondly, designing the observation system aiming at the overthrust nappe structure in section and in area ; 3. aiming at the complicated earth ' s surface condition of front - zone of mountain, how to select the exciting method and the parameter, how to optimize the environment of exciting method and reception, how to pledge the normal combination of the datum of different exciting method ; 4

    根據山前帶的地震地質條件特點，本文主要研究了以下幾個方面的內容： 1 、對以往山前帶地震攻關成果開展調研工作，分析研究在山地山前復雜構造帶所採用的地震勘探採集技術的適用性； 2 、研究基於地震地質模型的復雜構造帶觀測系統目標設計方法：如何建立復雜構造帶的表層、深層地震地質模型，利用正演分析目標區的觀測系統；針對逆掩推覆體構造，如何分區分段有針對性設計觀測系統等； 3 、針對復雜地表條件的山地山前帶，如何選擇激發方式、參數，如何優選激發、接收環境，如何保證不同激發方式的資料能正常拼接； 4 、山前帶巨厚礫石區的表層結構調查技術及靜校正方法研究。
  2. Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing

    建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。
  3. This paper focuses on the research of the stress mechanism of the ribbed shell structure in statics, dynamics and under the explosive load on the basis of the engineering practice of cave depot of single aircraft. in this paper, according to the classical shell theories, the basic differential equilibrium of the ribbed shell structure and the finite element analysis of 3d rippled plate are established, in which the function of annular ribs reinforcement bars and 3d ripped steel plates are distributed in the range of the steel, and the functions along the longitude direction of tension, bending, and torsion are neglected ; applied with dynamic analytical theory, the dynamic model of ribbed shell structure and the analytical theory model of elastic - plastic are set up ; the triangle series method is used to solve the displacement and stress under the distributed load and the concentrated load of the ribbed shell structure

    本文以軍用機場地面單機掩蔽庫工程建設為工程背景，首次對內襯三維波紋鋼板混凝土拱型復合結構的受力機理進行了靜力、動力和爆炸荷載的分析研究。根據將橫肋、鋼筋及三維波紋鋼板的作用均勻分佈在殼體范圍內的情況，忽略橫肋、鋼筋及三維波紋鋼板沿殼體母線方向的抗拉、抗彎及其抗扭作用，首次推導出了內襯三維波紋鋼板混凝土殼體的微分平衡方程，建立了有限元計算模型，並採用三角函數法，求解了三維波紋鋼板混凝土拱型復合結構在分佈荷載和集中荷載作用下的位移響應和應力響應，並與普通殼體進行了比較。
  4. We have contrasted several methods on fabrication of passive matrix oled, then we mainly discuss two fabricating methods, one is the precise mask method, the other is the barrier wall method. we find that the barrier wall method to fabricate the passive matrix oled ( pmoled ) has the advantages of high resolution, simple process and no crosstalking problem, so the barrier wall method is the good one to fabricate pmoled. in this paper we adopt the both methods, and we have successfully fabricated the pmoled

    分析和對比了實現無源矩陣有機電致發光顯示器件的幾種方法，著重介紹了採用精密掩模技術和障壁技術等技術方案，來製作和設計無源矩陣有機電致發光顯示器件，其中採用障壁技術方案製作的器件具有解析度高、工藝簡單容易實現、器件的交叉效應少、成本低等許多優點，是一種可行的製作無源矩陣有機電致發光顯示器件的方案。
  5. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件，本論文設計並試驗了器件的製作的全部工藝，包括波導薄膜的沉積，掩模的設計製作，光刻，濺射金屬薄膜，剝離法製作金屬掩模，干法深刻蝕，矽片切割，端面磨拋，波導對準和性能測試。
  6. The second is about verification of alternating psm manufacturability and this part introduces a new method based on standard cells to resolve the phase conflicts, including for dark field and for clear field. the method has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestion for modification

    第二部分針對由傳統方法設計出的版圖不能滿足交替移相掩模要求的問題，介紹了一種基於標準單元的交替移相掩模可製造性驗證與設計的演算法，包括針對暗場和亮場兩種不同環境版圖的演算法。
  7. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out

    對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究，設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統，進行了實驗研究。
  8. The paper is for verification and design of manufacturability of opc and psm as these two ways have become the most important correction ways

    由於光學鄰近校正和交替移相掩模已經成為最主要的掩模校正方法，因此本文主要針對這兩種方法進行可製造性的驗證和設計。
  9. A soft - ware implementing this method is presented as well, which has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestions for modification

    基於此方法的軟體工具能夠檢查標準單元版圖，找出不符合交替移相掩模設計要求的圖形，並給出相關的修改建議。
  10. However, in current design flow, designers do not consider whether designs are friendly to opc before they are sent to foundries. in fact, a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments. so even though such designs are corrected, many lithographic errors still exist

    然而，由於在當前的集成電路設計流中，在設計出的版圖送到製造廠商前，電路的設計者並沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題，這使得版圖中的一些圖形由於周圍條件的限制，如無法充分進行光學鄰近校正，無法進行交替移相掩模的處理等，從而使得版圖設計即使進行了校正處理，還存在大量光刻故障的可能性。
  11. But, though considerable process has been made in the last ten years, digital watermarking is still in its infancy, and much interesting work remains to be done this thesis addresses some problems in the gray - scale image digital watermarking that are summarized below : 1 ) whereas the basic theory of digital watermarking is still very poor, a digital watermarking mathematic model based on imperceptibility and robustness is presented by analysising the characteristic of digital watermarking ; 2 ) based on the model constructed above, by defining the measures of capacity and robustness of digital watermarking, an objective method for evaluating the digital watermarking is introduced and used to analysis some algorithms ; 3 ) whereas geometric distortion always influences the restoration of watermark, we advocate to enhance the robustness against geometric distortion by restoring the image which has been distorted by geometric transformation, and a method is designed for estimating the parameters of geometric transformation ; 4 ) based on the conclusion discussed above, and combined with the masking effects of hvs, a novel public meaningful gray - scale image digital watermarking is designed by analysising the characteristics of image gray - scale interpolation and haar wavelet transformation. the experimental results show that the method is indeed powerful ; 5 ) whereas many image digital watermarking schemes, which embed watermark by modifying the values of pixels in spatial domain and transformed domain, are confronted with the conflict between the imperceptibility and robustness, we advocated to use some stable digital characteristics of host image as watermark and a algorithm based on hermite matrix is designed

    本文重點對灰度圖象數字水印技術進行研究，主要工作如下： 1 ）鑒于目前數字水印的理論研究比較薄弱的現狀，本文通過分析數字水印的特點，建立了一個數字水印的數學模型，為進一步研究數字水印打下了基礎； 2 ）根據以上建立的模型，通過引入容量和穩健度的概念為數字水印提供了一個客觀評價方法，並對一些數字水印演算法進行了分析； 3 ）為增強數字水印抵抗幾何攻擊的能力，研究了受幾何攻擊的圖象的復原問題，並給出了一個計算圖象幾何變換參數的方法； 4 ）通過分析圖象灰度插值演算法和haar小波變換的特點，結合hvs的掩蔽效應，設計了一個公開的有意義數字水印演算法，實驗結果表明本演算法具有較強的穩健性； 5 ）目前許多水印演算法都是通過在空域或頻域修改象素值的方法嵌入水印的，這種方法面臨著透明性和穩健性的矛盾，為解決這個矛盾，本文提出以圖象的某些穩定的數字特徵為水印的觀點，並結合hermite矩陣的特點設計了相應的水印演算法，實驗結果表明該演算法具有較好的穩健性。
  12. In this thesis, to increase the aspect ratio of liga process, several important influence factors were discussed, which includes the structure and performance of liga mask, x - ray intensity and x - ray spectrum of beam lines, the characteristic of pmma resin and the micro electroforming parameters. the au - pi mask and the au - si mask were designed by xop and origin software, after the difference between the spectrum of 3w1 and 3b1 beam line had been contrastively analyzed

    本文著眼于liga技術高深寬比方面的研究，以提高本實驗室用liga技術製作微細結構的深寬比為目的，從分析各因素影響深寬比的機理出發，再加以理論設計和實驗工藝的優化和改善，分別研究討論了影響深寬比的幾大重要因素：掩模結構和性能、光源光譜和光強、 pmma光刻膠性能、電鑄工藝參數等。
  13. According to the different require of the phase mask, the holographic recording method for the design of linearly chirped phase mask is studied in this paper. the fringe formed by the interference of two spherical waves, whose density varies linearly with space, is used to record the chirped phase mask. the two design schemes proposed in this paper are analyzed and compared, and the experimental results are given

    根據光纖光柵掩模的不同要求，研究討論了用全息干涉方法製作線性啁啾位相掩模的設計方法，提出用兩球面波干涉產生條紋密度隨空間距離線性變化的干涉條紋記錄啁啾位相光柵，分析比較了文中給出的兩種設計方案，給出了實驗驗證結果，並且製作了線性啁啾光刻膠掩模。
  14. It might preferable, however, to use shperical mirror for the first step studies of euvl in a series investigation of system design, component fabrication, assembly technique and experimental process. along this thought, the author designed a schwarzschild optics using spherical mirrors with 10 : 1 reduction projection optics

    作為研究的第一步，出於進行euvl原理及系統設計、光學元件的制備、系統集成、掩模曝光實驗等相關技術研究目的，採用球面schwarzschild微縮投影物鏡是比較切實可行的技術方案。
  15. Combined with the summarizable analysis of the existing roi detection techniques, an openness roi automatic detection algorithm is proposed. the test results show that the algorithm is efficient. then, based on the analysis of two roi coding algorithms, combined with the characteristic of detection results, a fast roi mask generation algorithm is designed

    結合對現有roi檢測演算法的總結分析，本文提出了一種用於遙感圖象的roi自動檢測演算法，測試結果驗證了該演算法的有效性;然後，在對兩種roi編碼演算法深入研究的基礎上，結合本文檢測結果的特點，設計了一種roi快速掩模產生演算法，該演算法優于jpeg2000的roi掩模產生演算法，極大地減少了roi編碼時間。
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