曝光不能用的 的英文怎麼說
中文拼音 [pùguāngbùnéngyòngde]
曝光不能用的
英文
lightstruck- 曝 : 動詞[書面語] (曬) expose to the sun
- 光 : Ⅰ名詞1 (照耀在物體上、使人能看見物體的一種物質) light; ray 2 (景物) scenery 3 (光彩; 榮譽) ...
- 不 : 名詞[書面語] (剁物所用的木墩) a block of wood
- 能 : 能名詞(姓氏) a surname
- 用 : Ⅰ動詞1 (使用) use; employ; apply 2 (多用於否定: 需要) need 3 (敬辭: 吃; 喝) eat; drink Ⅱ名...
- 的 : 4次方是 The fourth power of 2 is direction
- 曝光 : exposure
-
Since the dichromated gelatin has a higher diffraction efficiency in all holographic recording materials, the aim of this research is to use dichromated gelatin as the recording material and to make use of the principle of holography to design holographic optical components, especially in fabrication procedure of dichromated gelatin film and in experimental technique to form a high diffraction efficiency using different angular exposure method
為了產生優質的聚焦能力與效率,本研究採用目前具有最高繞射效率( 80 ~ 90 % )的重鉻酸明膠材料作為感光劑,除了自行調制藥劑比例成分,並依嚴格的製作步製成重鉻酸明膠全像片外,並採用不同角度重覆曝光方式改良干涉式波帶板無法自動追蹤的缺點,經過多次試驗與改進,藉以形成具備高繞射效率和自動追蹤功能的全像光學波帶板。They should be kept away form fire, warm air and sunlight. the product storage life is one year. if the products are out of the storage limit, another tests should be done, and then the qualified products still can be used
本產品不宜受潮和受熱,應儲存在乾燥通風的倉庫中,不得靠近火源暖氣片或受陽光的曝曬,儲存期從製造之日起為壹年,超過儲存期,按性能指標要求檢驗合格的仍可繼續使用。In this article we briefly introduce the e - beam lithography techniques, and we describe our experiences in the modification of an sem into an e - beam writer
以電子顯微鏡改裝成的簡易電子束曝光機在性能上雖比不上設計精良的專業化電子束曝光機,但在很多情況下可以符合研發工作的要求,可說是經濟實用的方案。The director might be able to find the precise triplet using far fewer tidbits if he sometimes spreads tidbits to more than four people and is willing to tolerate more than two leaks
當然,如果這位首長願意偶爾透露消息給更多人知道,並取消曝光消息不超出兩次的限制,那他就有可能用更少的消息釣到?密三人幫。Lithograghy and its relative techniques play a very important role in mems fabrication processes, spin coating and baking are an indispensable working procedure before and after the lithography process. oven and hotplate are often employed in order to enhance adhesion between the film and the substrate, stabilize sensitivity of film and improve the abrasion resistance when the film touches a mask in contact exposure
均膠和烘乾是光刻工藝中不可缺少的一道工序,為增加膠層與矽片表面粘附能力,提高在接觸式曝光中膠層與掩模版接觸時的耐磨性能及穩定膠層的感光靈敏度,通常採用烘箱或熱板等加熱設備對光刻膠進行乾燥。分享友人