曝光尺 的英文怎麼說
中文拼音 [pùguāngchǐ]
曝光尺
英文
exposure guide rule-
Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型,有助於開發由成品率驅動的版圖設計工具,自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。Cinematography - 65 mm and 70 mm unexposed motion - picture film - cutting and perforating dimensions
電影技術. 65和70mm未曝光電影膠片.剪切和穿孔尺寸Moreover, automatic aperture size selection ( single frame or double frame ), frame indexing, single corner positioning, and auto exposure control, individual functions that work together to improve productivity and image quality. automatic reduction and focus ensures sharp, correctly sized images every time
另備有自動孔徑尺寸選擇(單菲林格或雙菲林格) 、菲林格索引、單角度定位及自動曝光調校等獨立功能,能同時運作來改進影像質素及生產力。
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