氧化物薄膜 的英文怎麼說

中文拼音 [yǎnghuàwùbómó]
氧化物薄膜 英文
thin oxide coating
  • 氧 : 名詞[化學] （氣體元素） oxygen （o）
  • 物 : 名詞1 （東西） thing; matter; object 2 （指自己以外的人或與己相對的環境） other people; the outsi...
  • 薄 : 名詞[方言] （浮萍） duckweed
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 氧化物 : oxide; oxyde; oxidizing material; oxidate
  • 氧化 : [化學] oxidize; oxidate; oxide; burning; rust; oxygenize; oxido-; oxy-
  • 薄膜 : thin film; film; diaphragm
  1. The strain effect on physical properties of bilayer manganite thin films

    雙層錳氧化物薄膜中的應力效應
  2. Fachun lai, limei lin, zhigao huang, rongquan gai, yan qu ， effect of thickness on the structure, morphology and optical properties of sputter deposited nb2o5 films, applied surface science 253 ( 4 ), 1801 - 1805 ( 2006 )

    李雪蓉，賴發春，林麗梅，瞿燕，測量條件對摻錫氧化銦薄膜電學測量結果的影響，物理實驗已接受待發表（ 2007 ）
  3. Based on laser molecular beam epitaxy, the strain behavior and the corresponding control technology in oxides heteroepitaxial system, especially in ferroelectric thin films with perovskite structure, was systematically studied by using in situ reflected - high - energy - electron - diffraction ( rheed ). some original and meaningful results were obtained. following aspects were included in this dissertation : the structure of thin films is analyzed by rheed

    本論文基於激光分子束外延的基本原理，以高能電子反射為主要監測工具，對氧化物薄膜特別是鐵電氧化物薄膜異質外延過程中應變行為及其控制方法進行了系統的研究，並取得了一系列有意義的結果，主要包括以下內容:利用反射高能電子衍射（ rheed ）的信息對薄膜結構進行分析。
  4. In this dissertation, high quality ( 002 ) textured zno films were prepared on silicon substrate using electron beam evaporation method. in addition, zno nano - particle material embedded into mgo thin films was prepared by a co - evaporation ( thermal and electron beam evaporation, simultaneously ) method and a following post - annealing process in oxygen ambient

    本文介紹了採用電子束蒸發方法在si襯底表面上制備出了具有c軸擇優取向的高質量氧化鋅薄膜材料，另外，還採用共蒸發（通過電子束蒸發與熱蒸發同時進行）及後退火的簡單方法制備出包埋到介電物質mgo薄膜中的zno量子點材料。
  5. Abstract : based on the ahievement of epitaxial growth in several perovskite oxide films, we discuss the importance of substrate temperature ( ts ) and substrate material in the epitaxial growth of perovskite oxide thin films. influences of ts on growth orientation and epitaxial threshold temperature were observed. the results indicate that during the growth of the oxide films the phase formation and growth dynamics should be taken into consideration. the threshold temperature for epitaxial growth depends on the substrate materials. this demonstrates the influence of substrate material on the initial nucleation and epitaxial growth

    文摘:在成功地外延生長超導、鐵電、鐵磁等多種性質的鈣鈦礦結構氧化物薄膜的基礎上，討論影響氧化物薄膜外延生長的一些因素.考慮到相形成和薄膜生長動力學，在利用脈沖激光淀積法外延生長氧化物薄膜中襯底溫度是十分重要的工藝參數.襯底溫度對成相和生長薄膜的取向都有影響.考慮到薄膜是首先在襯底表面成核、成相併生長.因此襯底材料晶格的影響是不容忽視的.觀察到襯底材料對薄膜外延生長溫度的影響.在適當的工藝條件下，利用低溫三步法工藝制備得到有很強織構的外延薄膜.這突出表明界面層的相互作用對鈣鈦礦結構薄膜的取向有著相當大的影響
  6. Traditional methods of manufacturing oxide films include thermal oxidation, chemical vapor phase deposition, metal - organic chemical vapor phase deposition, sol - gel method and so on

    傳統制備氧化物薄膜的方法包括熱氧化、化學汽相淀積、金屬有機物化學汽相淀積、溶膠凝膠法等等。
  7. In order to find a new way to prepare antibacterial fibers, photocatalytic oxidation of titanium dioxide ( tio2 ) has been used to modify the surface property of polymers in our experiment. tio2 films are deposited on polyethylene terephthalate ( pet ) substrates by means of rf magnetron sputtering using pure ti ( 99. 99 % ) as the target and ar mixed with o2 as reactive gas

    本文利用磁控反應濺射技術，以高純度鈦（ ti ）為靶材，氧氣為活性氣體，在pet基底上反應濺射沉積tio _ 2 ，將納米tio _ 2的光催化氧化特性應用於高聚物表面改性，為進一步開發抗菌織物打下基礎。首次在高分子pet基底上濺射沉積了氧化鈦薄膜。
  8. The main transparent conductive oxide include indium tin oxide ( ito ), al - doped zno ( azo ), tin antimony oxide ( ato ) etc. ito is important material of making the transparent electrode

    目前應用廣泛的透明導電氧化物薄膜主要有氧化銦錫薄膜（ ito ） 、氧化鋅鋁膜（ azo ） 、摻銻氧化錫（ ato ）等。銦錫氧化物（ ito ）是製造透明電極的重要材料。
  9. The theoretical calculation and explanation of strain behavior during heteroepitaxy of oxides thin films : when the lattice mismatch is relative small ( for example, batio _ 3 / srtio _ 3 with a lattice mismatch of 2. 18 % ), the growth mode of thin films is layer - by - layer, and the critical thickness and strain relaxation can be calculated or estimated by matthews - blakeslee expressions ; when the lattice mismatch is large ( for example mgo / srtio _ 3 with lattice mismatch of 8 % ), the strain relaxation process can be explained by theory of coherent strained islands

    氧化物薄膜異質外延應變行為的理論預測和解釋。對于晶格失配較小的外延體系（如batio3 / srtio _ 3 2 . 18 % ） ，薄膜以層狀方式進行生長，臨界厚度和應變釋放過程可以用經典的matthews - blakeslee公式進行預測;對于晶格失配較大的體系（如mgo / srtio _ 3 8 % ） ，薄膜以島狀方式進行生長，應變釋放過程可以由彈性應變島的理論體系進行解釋。
  10. Much attention has been paid on pure or doped zirconia thin films because of their high melting point, low heat conductivity, high ionic conductivity and chemical durability. in the case of metal - oxide - semiconductor ( mos ) devices and high - temperature superconductor ( hts ) wires, zirconia epitaxial thin films are promising buffer layers and have been intensely studied in the past two decades

    純的或摻雜的氧化鋯薄膜因其高熔點、低熱導率、高離子導電能力和高溫化學穩定性而受到相當的重視，而且氧化鋯外延薄膜在金屬氧化物半導體（ mos ） 、高溫超導帶材等領域的應用受到越來越多的關注。
  11. The product can be used in plastics, varnishes, enamel, cosmetics, textiles, printings, etc. the laboratory experiments were made on the hydrolysis of ticl4 solutions and deposition films of titanium hydroxides and oxyhydroxides onto the mica powder. and mainly studied the structure transformation of hydrolysis and deposition of the ticl4 solutions and the dehydrolysis of the titanium hydroxides and oxyhydroxides under the sinter processing. exclude mica powder, the specifically hydrolysis and deposition of some other metal salt such as fecl3 solutions and the dehydrolysis of the metal hydroxides and oxyhydroxides under the hydrothermal processing were also studied

    本實驗採用金屬鹽水解沉澱法，在雲母粉表面鍍覆tio _ 2 、 fe _ 2o _ 3 、 cr _ 2o _ 3 、 co _ 2o _ 3等不同的系列金屬氧化物薄膜，通過實驗室和中間試驗研究了雲母珠光顏料的全部製作過程，並重點研究分析了鍍膜過程中偏鈦酸沉澱物自ticl _ 4溶液中水解析出的結構變化過程以及焙燒過程中氫（羥）氧化鈦縮合脫水生成氧化鈦的結構變化過程。
  12. By using theoretical calculation and rheed monitoring, the strain behavior in heteroepitaxy of ferroelectric oxides thin films was designed and controlled experimentally

    通過理論預測和rheed的檢測，控制氧化物薄膜生長，特別是控制鐵電氧化物薄膜生長中的應變行為。
  13. Due to their versatile function, oxide thin films can be widely applied in the fields of microelectronics, optoelectronics and microelectronic mechanism systems. thus the fabrication technology and growth control approach have been extensively investigated

    氧化物薄膜由於其豐富的物理性質可廣泛地被應用於微電子學、光電子學和微電子機械繫統等領域，對其制備工藝和生長控制的研究愈加受到重視。
  14. Detail specification for fixed low power non - wirewound insulated resistors - metal oxide film, helically cut - full assessment level

    固定小功率非繞線絕緣電阻器詳細規范.螺旋形切割金屬氧化物薄膜.全面評定級
  15. As one of magnetism properties in the magnetism materials, magnetoresistance ( mr ) effect shows the magnitude about resistivity dependence of the magnetic field. the time when people focus on magnetoresistance effect is the last ten years. after mr effect was discovered from the multilayered films fe / co by baibich et al in 1988, helmolt et al got the same result from la _ ( 2 3 ) ba _ ( 1 3 ) mno _ x films

    人們對磁電阻效應的研究主要在於最近的十年間，繼1988年baibich等人在磁性多層膜fe co中發現了磁電阻效應后， 1993年helmolt等人在la _ （ 2 3 ） ba _ （ 1 3 ） mno _ x等鑭錳氧化物薄膜材料中也發現了磁電阻效應。
  16. A new way of oxide coating - - chemical liquid phase deposition ( cld ) was first pioneered by nagayama et al. in 1988

    一種新的制備氧化物薄膜的方法? ?化學液相淀積（ cld ）於1988年被nagayama等人首次提出。
  17. Transparent conductive oxide ( tco ) film plays an important role in pholoelectron industry

    透明導電氧化物薄膜在光電產業扮演著很重要的角色。
  18. Inorganic oxide films are widely used in modern microelectronics, solid - state electronics, optical engineering

    無機氧化物薄膜在現代微電子學、固體電子學和光學工程中有廣泛的應用。
  19. The fabrication of thin oxide films has become a hot spot of research in physics of condensed matter

    氧化物薄膜的制備已經成為凝聚態物理學的一個研究熱點。
  20. It can make thin oxide films under much simpler experimental conditions and therefore has attracted a lot of interest

    它可以在更為簡單的實驗條件下制備氧化物薄膜，因此引起了人們的極大興趣。
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