激光退火 的英文怎麼說

中文拼音 [guāngtuìhuǒ]
激光退火 英文
laser annealing
  • : Ⅰ動詞1 (水因受到阻礙或震蕩而向上涌) swash; surge; dash 2 (冷水突然刺激身體使得病) fall ill fr...
  • : Ⅰ名詞1 (照耀在物體上、使人能看見物體的一種物質) light; ray 2 (景物) scenery 3 (光彩; 榮譽) ...
  • 退 : 動詞1 (向後移動) retreat; draw back; move back 2 (使向後移動) cause to move back; remove; wit...
  • : fire
  • 激光 : [物理學] laser 激光靶 laser target; 激光報警器 laser avoidance device; 激光玻璃纖維 laser fibre; ...
  • 退火 : [冶金學] anneal; annealing; back-out
  1. We obtained a high quality zno thin film with the pl fwhm of 94 mev at 900. the free exciton binding energy deduced from the temperature - dependent pl spectra is about 59 mev at 900, suggesting that the film quality can be improved by annealing process

    退溫度為900時獲得了高質量的氧化鋅薄膜,致發譜的半高寬為94mev ,通過變溫實驗得到子束縛能為59mev ,表明退過程提高了薄膜的質量。
  2. Influence of laser annealing on electrical properties of hgcdte

    激光退火對碲鎘汞電性能的影響
  3. Films prepared by pulsed laser deposition

    脈沖沉積法原位後退生長mgb
  4. Superconducting thin films ; pulsed laser deposition

    超導薄膜脈沖沉積原位後退
  5. The sims, ir and raman analysis results show that the tritium permeation barrier ( tpb ) is formed when tic and sio2 films are annealed in hydrogen at about 350 ?

    利用二次離子質譜( sims ) 、紅外吸收譜( ir )及喇曼譜( raman )技術,證實了tic和sio2在350左右的氫中退可形成防氚滲透阻擋層。
  6. Laser annealing equipment

    激光退火裝置
  7. The main topic of this thesis is to deposit the lacamno3 films using the pulsed laser deposition ( pld ) technique, and to improve the properties of the films through a serials of processes including the post annealing treatments. at last, the relation between the physical properties and the film making processes of the materials are discussed and some possible applications explored

    本論文的任務就是利用脈沖沉積lacamno _ 3薄膜,並通過退等一系列工藝處理提高薄膜性質,最終製作測輻射熱儀的敏感元件,同時也對材料的物性展開討論,以探尋更多的應用。
  8. Comparing of the ratio of 550nm emission intensity to 525nm in samples annealed at different temperature and times, the results obtained from a fit of the integrated intensity for these two emission indicated the change of radiative transition probability at different energy level are different

    通過比較不同退溫度和時間樣品的兩者發變化的不同,發現兩者的發機理不同。通過比較不同樣品的525nm和550nm發射強度比值隨退條件的變化以及這兩個發的積分強度的變溫擬合結果說明退對不同能級的輻射躍遷幾率的影響不同。
  9. By comparable investigation, two luminescence mechanisms can explain the different variety of pl intensity of origin and annealed samples and are dominant mechanisms separately in unanneal and anneal course

    經過退處理后,在相同波長的發下發強度逐漸增強,峰型逐漸變好,發譜帶的半峰寬也變窄。
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