脈沉實 的英文怎麼說
中文拼音 [màichénshí]
脈沉實
英文
sunken and solid pulse-
The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate
採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。Pt and ybco are the top electrode and the bottom electrode separately. ybco thin film is deposited on the substrate by pulsed laser deposition ( pld ). and pzt thin film is epitaxially deposited on the bottom electrode also by pld
實驗中薄膜樣品的結構為pt pzt ybco lao ， lao為基底材料， pt和ybco分別為pzt薄膜的上電極和下電極， ybc0薄膜用脈沖激光濺射（ pld ）工藝沉積在基底上， pzt薄膜同樣用pld工藝外延生長在下電極ybc0薄膜上。Lacamno3 films were prepared on two different substrates ( srtio3 and laalo3 ) by excimer pulsed laser deposition method using the lacamno3 polycrystalline materials doped with 4wt % ag, which exhibits an excellent properties. a reliable process is obtained through repeated experiments and summaries
我們以優質摻ag4wt的lacamno _ 3多晶為靶材，利用準分子脈沖激光沉積法分別在srtio _ 3和laalo _ 3襯底上制備薄膜，經過摸索和實驗，得到了較為成熟的工藝流程。Now encourage have some senior personnel in zhejiang and jiangsu management group with professional background and good human relation, and according to the many years in chinese company management experience, encourage have been one of the strength company in zhejiang and jiangsu
公司依託江浙管理界幾位資深人士的專業背景和優秀人脈，憑借多年對中國企業管理的體會和沉澱，已成為江浙一帶非常有實力的管理咨詢公司之一。分享友人