自顯影光刻膠 的英文怎麼說
中文拼音 [zìxiǎnyǐngguāngkèjiāo]
自顯影光刻膠
英文
self developing resist- 自 : Ⅰ代詞(自己) self; oneself; one s own Ⅱ副詞(自然;當然) certainly; of course; naturally; willin...
- 顯 : Ⅰ形容詞1 (明顯) apparent; obvious; noticeable; evident 2 (有名聲有權勢的) illustrious and inf...
- 影 : Ⅰ名詞1 (物體擋住光線后映出的形象) shadow 2 (鏡中、水面等反映出來的物體形象) reflection; image...
- 光 : Ⅰ名詞1 (照耀在物體上、使人能看見物體的一種物質) light; ray 2 (景物) scenery 3 (光彩; 榮譽) ...
- 膠 : Ⅰ名詞1 (某些具有黏性的物質) glue; gum 2 (橡膠) rubber 3 (姓氏) a surname Ⅱ動詞(用膠粘) st...
- 顯影 : [攝影學] develop
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Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型,有助於開發由成品率驅動的版圖設計工具,自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。
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