蝕刻系統 的英文怎麼說

中文拼音 [shítǒng]
蝕刻系統 英文
etching system
  • : Ⅰ動詞1. (損失; 虧耗) lose 2. (腐蝕) erode; corrode Ⅱ名詞(天體現象) eclipse
  • : 系動詞(打結; 扣) tie; fasten; do up; button up
  • : Ⅰ名詞1 (事物間連續的關系) interconnected system 2 (衣服等的筒狀部分) any tube shaped part of ...
  • 蝕刻 : [電學] [冶金學] etch; etching
  • 系統 : 1. (按一定關系組成的同類事物) system 2. (有條理的;有系統的) systematic
  1. Magnetization magneto - microwave plasma etching system

    磁場微波型等離子體蝕刻系統
  2. Magnetron enhanced reactive ion etaching system

    磁控管增強型反應性離子蝕刻系統
  3. Hardware and software design for the inductively coupled plasma etching machine " s system are also presented

    介紹了plc控制等離子體機的硬體和軟體的設計。
  4. At present, feas have potential for use as an electron source in a wide variety of applications, including microwave power amplifiers ( such as twts, klystron ), flat panel displays, electron microscopy, and electron beam lithography

    目前,場致發射陣列陰極的應用領域十分廣泛,主要包括微波器件(應用於twts , klystron等) 、平板顯示器( feds ) 、電子顯微鏡及電子束等。其中,應用研究的焦點主要集中在平板顯示器和射頻功率放大器。
  5. In the present works, a self - consistent model describing the dynamics of radio - frequency ( rf ) sheath was established. the effects of collisions on the rf sheath dynamics, distributions of ion energy and angle incident on the substrate and the etching profiles were investigated numerically

    本文建立了一套自洽的碰撞射頻等離子體鞘層理論模型,地研究了碰撞效應對等離子體鞘層的物理特性、離子入射到基板上的能量分佈和角度分佈以及剖面的影響。
  6. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out

    對全息光的原理、理論、實現方法及傳光掩模?全息掩模?抗劑圖形傳遞機理進行了深入的研究,設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光實驗,進行了實驗研究。
  7. Reactive ion beam etching system ribe system

    反應性離子束蝕刻系統
  8. Overflow cup etching system

    溢流杯蝕刻系統
  9. Narrow gap reactive ion etching system

    狹窄間隙反應性離子蝕刻系統
  10. Parallel plate reactive ionetching system

    平行板反應性離子蝕刻系統
  11. Reactive ion etching system rie system

    反應性離子蝕刻系統
  12. The aim of defocus detection is to achieve high etching quality by providing the defocus error signal for focus - servo system which can make the etching spot focus accurately

    離焦檢測的任務是為聚焦伺服提供聚焦誤差信號,使寫入光斑能夠精確聚焦,從而保證質量。
  13. The accelerometer which has simple fabricated process and high sensitivity and small parasitic capacitance and residual stress is hybrid integrated with the interface circuit using ic nude chip. so the density of the package is increased, and the noise of the sensing system is decreased. these found the base of capacitive accelerometer module using the mcm method

    該傳感器製作工藝簡單,靈敏度高,支撐梁採用u型,減小了后的殘余應力,用玻璃作為襯底,減小了襯底和硅可動質量塊間的寄生電容,且把傳感器晶元和用ic裸片製作的介面電路集成在一起,提高了封裝密度,減小了傳感器的噪聲,為採用mcm技術製作電容式加速度傳感器模塊打下了基礎。
  14. Inductively coupled plasma etching system

    感應耦合型等離子體蝕刻系統
  15. Barrel type plasma etching system

    圓筒型等離子體蝕刻系統
  16. Reactive sputter etching system

    反應性濺鍍蝕刻系統
  17. Photo excited etching system

    光激勵蝕刻系統
  18. Immersion wet etching system

    浸漬式蝕刻系統
  19. Wet etching system

    濕式蝕刻系統
  20. Ion beam etching system

    離子束蝕刻系統
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