蝕刻術 的英文怎麼說

中文拼音 [shíkèshù]
蝕刻術 英文
etching
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 術 : 術名詞1. （技藝; 技術; 學術） art; skill; technique 2. （方法; 策略） method; tactics 3. （姓氏） a surname
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. Mary is very keen on etching.

    瑪麗很喜愛蝕刻藝術。
  2. Three potentials pertinent to various etching techniques are labeled in fig. 10.

    與各種蝕刻技術有關的三個電勢標出在圖10中。
  3. " the hksar e - passports and e - d is will contain digital data including the holder s personal data and facial image which will be stored in the contactless chip embedded in the back cover of the travel documents, " mr peh said, " the holder s personal particulars and photograph will be inscribed onto the polycarbonate bio - data page of an e - passport or e - d i by laser engraving technology.

    白韞六先生續稱：特區電子護照及電子簽證身份書的封底內，皆藏有非接觸式晶片。晶片內儲存了數碼資料，包括證件持有人的個人資料及容貌影像。而這些個人資料及相片，將會以激光刻蝕技術刻印在特區電子護照及電子簽證身份書上。
  4. Various technical improvements have made it possible to push the limits of photolithography

    各種技術若能改進，便可推進光蝕刻法的極限。
  5. Ibm says its researchers optimized the sram cell design and circuit layout to improve stability and developed several novel fabrication processes in order to make the new sram cell possible

    為了在減小內存單元的同時確保產品的安全性，該公司研究人員開發出了將電子束與光學刻蝕技術相結合的製造技術。
  6. Provide a whole set technology solution of " directly etching method of chemically forming veined and granular

    表面化學紋理直接蝕刻的方法"技術服務
  7. In the section of fabricating technology, i first discuss the ion beam technology. through the analysis of the effects of each parameter on the surface smoothness, profile fidelity and linewidth resolution in the process of ion etching, the suitable angle of incident ion beam, ion energy, density of ion beam and time of etching are selected combining the actual status of the mask

    在製作工藝的研究方面，首先研究了離子束刻蝕技術，通過對離子束刻蝕過程中各個參數對刻蝕元件的表面光潔度、輪廓保真度和線寬分辨的影響分析，結合掩膜的實際情況選擇出了合適的離子束入射角、離子能量、束流密度和刻蝕時間等參數。
  8. Directly etching method of chemically forming veined and granular aluminum alloys surface " which is the latest invention patent application number : 00117311. 1. the innovative and simple process is absolutely

    現在所提供的"鋁合金表面化學紋理直接蝕刻的方法"發明專利申請: 00117311 . 1是最新發明專利技術，創新而簡易的蝕刻工序在"鋁件表面處理"量產時對比于傳統的機械噴沙絕對是
  9. Generic specification of ion beam etching system

    離子束蝕刻機通用技術條件
  10. The artist must have spent hours etching the image on the glass

    這位美術家一定花了好幾小時把這畫像蝕刻在玻璃上。
  11. Heidelberg instruments mikrotechnik gmbh offers you pertinent information by telephone for the ranges micro technology, laser lithography and lithography in addition to semiconductor technology. contact heidelberg instruments mikrotechnik gmbh

    Heidelberg instruments mikrotechnik gmbh是一家誠信的、高效能的生產商和服務商，該公司提供新型的、專門的產品，例如顯微鏡檢查技術、顯微鏡標本製作技術，激光平版印刷、激光光刻技術，平版印刷、蝕刻技術、光刻技術，半導體技術。
  12. Nuclear particle track - etched anti - counterfeit marking is a new weapon against fake products. the mark is manufactured by intricate high technology in state - controlled sensitive nuclear facilities which ensures that the mark can not be copied. the pattern of the mark is characterized by its permeability, and can be distinguished from fakes by using a transparent liquid ( e. g. water ), colored pen or chemical reagent. the technique has passed the official health safety examination and poses no danger of nuclear irradiation

    用核粒子照射塑料薄膜形成徑跡，再經化學試劑蝕刻和成像技術，得到由微米級微孔組成的圖案.這種圖案具有物質透過特性.用這種方法生產的核徑跡防偽標志，具備核尖端技術不易擴散，製作設備不易得到，產品用其他方法難以偽造，防偽識別簡單、快速、可靠等特點.此種標志已經通過放射性安全檢測，可以用於各種商品（包括食品）的包裝
  13. The theory of ion - beam etching and ion sources are reviewed. the classification of ion - beam etching are introduced. according to the mechanism that ion sputtering leads to faceting, trenching, reflection and redeposition, some relative solutions are put forward

    綜合敘述了離子束刻蝕技術和離子源的工作原理，簡單介紹了離子束刻蝕的分類，闡述了離子束刻蝕的物理濺射效應導致的刻面，開槽，再沉積等現象的產生機理及解決辦法，分析了kaufman離子源進行ribe的可行性及出現的問題。
  14. We had fabricated the variable optical attenuator of mmi structure with ridge wave - guide structure and also studied the reactive iron etching of silicon. at last, we tested the variable optical attenuator and draw some conclusions. after testing, we can draw a conclusion that the technology parameter of the device is ideal

    在分析y分支和多模干涉器型（ mmi ）的光學衰減器結構的基礎上，採用脊形波導結構製作了mmi結構的可變光學衰減器，並對硅的刻蝕技術進行了研究和探討，最後對制得的器件進行了測試研究。
  15. Basically, etching technology and sand blasting

    蝕刻技術的加工效果取決于
  16. Problems can be solved easily when they apply our etching technology

    蝕刻技術即可迎刁而解
  17. New etching technology simplifies the existing aluminum surfacing processes into

    鋁紋理蝕刻技術將
  18. On the trend of thinner and more shape - complicated aluminum sheet, etching technology can

    在鋁片越來越簿形狀多變的趨勢下，蝕刻技術將可
  19. Cost and defectiveness is unavoidable increased due to parts handling through physical process to chemical process

    蝕刻技術屬前處理的工序，但其優勢是與
  20. Aluminum can be surfaced with multi - granular, high class and soft result that can satisfy consumers high request

    在現今消費者對產品外觀要求越來越高的市場，蝕刻技術能以低的成本
分享友人
分享到 Line

分享到臉書