輔催化劑 的英文怎麼說
中文拼音 [fǔcuīhuàjì]
輔催化劑
英文
cocatalyst-
This paper describes several latest industrial microbial technologies in detail, which are the synthesis of the chiral diols by epoxide hydrolase from microbie, cofactors regeneration for redox with fdh, production of nano / micro wire by the phage display, metabolic network rebuilding for conventional fermentation and the application of the organic solvent tolerance and the metagenomics technology
本文綜述了幾項最新的工業微生物技術，主要包括：微生物環氧化水解酶催化合成手性二醇、微生物甲酸脫氫酶用於再生氧化還原反應的輔因子、通過噬菌體展示技術得到納米級金屬絲、代謝網路改造和重建用於傳統發酵生產以及有機溶劑耐受菌和宏基因組技術的應用。Article 14. the raw materials, fuel, spare parts, component parts, fittings, complementary materials, packing materials imported so as to fulfill the contract on products ' export by foreign - invested enterprises and those including reasonable quantities of medium, catalyst, abrasive stuff, and fuel etc. ( unless otherwise stipulated by the state ) directly used up during the production course of export commodities, shall be exempted from tariff, import link tax
十四、外商投資企業為履行產品出口合同所需進口的原材料、燃料、散件、零部件、元器件、配套件、輔料和包裝材料，以及直接用於加工出口產品而生產過程消耗掉的數量合理的觸媒劑、催化劑、磨料、燃料等（除國家另有規定外） ，免徵關稅和進口環節稅。The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate
採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。In this paper, the recent developments of microwave - assisted combinatorial synthesis are reviewed including solid phase synthesis, application of polymer - supported catalyst to combinatorial synthesis, liquid phase combinatorial synthesis, fluorous phase combinatorial synthesis and combinatorial parallel synthesis
主要就近年來微波輔助組合合成技術的研究進展情況進行介紹，內容包括固相組合合成、基於聚合物支載的催化劑的組合合成、液相組合合成、氟相組合合成以及組合平行合成等。分享友人