離子源的 的英文怎麼說

中文拼音 [líziyuánde]
離子源的 英文
ionogenic
  • 離 : Ⅰ動詞1 （離開） leave; part from; be away from; separate 2 （背離） go against 3 （缺少） dispens...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 源 : 名詞1. （水流起頭的地方） source （of a river）; fountainhead 2. （來源） source; cause 3. （姓氏） a surname
  • 的 : 4次方是 The fourth power of 2 is direction
  • 離子 : [物理學] ion
  1. Investigation on coloration of metal - doped sapphire by mevva ion source

    離子源金屬摻雜藍寶石著色的研究
  2. Characteristics of rf ion source electromagnetic field

    型放電離子源的場特性
  3. ( 5 ) glassy oxide film of samples processed by mevva al / piid si covered the surface of sic coating thickly and uniformly, and left few holes as a result of a good ability of sealing, which made weight loss of sic - c / sic smaller in air at1300

    （ 5 ） mevva源注入al再piid （等離子源全方位沉積） si塗層，玻璃氧化層厚而均勻，愈合性能好，孔洞少，對塗層缺陷有最佳的改性效果。復合材料在1300空氣中的氧化失重顯著降低，甚至出現增重。
  4. During ion source operating, alternating axial magnetic field and azimuthal electric field in discharge tube ionize hydrogen gas purified by hot palladium pipe, and form plasma, hi fifties year, research reports studied on rf ion source are numerous however most of them are concerned about application, and research reports relevant to discharge theory or experiment model are unfrequent

    離子源工作時，放電空間交變的軸向磁場和渦漩電場激發放電管中經鈀管純化后通入的氫氣電離，形成等離子體。 50多年來，關于高頻離子源的研究報告很多，但是，這些研究主要都集中在應用研究方面，有關高頻無極環形放電離子源的理論與實驗模型研究不是很多。
  5. Three typical ion source, radio - frequency ion source, duoplasmatron ion source and penning ion source, are usually used in neutron generator

    在通過d - t反應產生中子的低能倍壓加速器中，一般採用三種類型的離子源：高頻離子源（ rf ） 、潘寧離子源（ pig ）和雙等離子體離子源（ dp ） 。
  6. Construction of electrostatic accelerator rf ion source

    用於靜電加速器的高頻離子源的設計和調試
  7. ( 4 ) chapter vi. the theory of ion curren extraction of rf ion source is investigated, the reason of emission surface formation and its effect on ion curren extraction are reasearched emphatically

    （ 4 ）對高頻離子源的束流引出原理作了理論推導和分析，著重研究了發射面的形成及其對引出束流特性的影響。
  8. Finally, the characteristics of ion curren extraction in different conditions are simulationed with magic software, and the parameter of best emission surface is obtained

    最後，採用magic程序對高頻離子源不同引出參數下的束流引出特性進行了數值模擬，得到了獲得最佳的引出離子束所要求的等離子體發射面參數。
  9. Diamond - like carbon gradient film on ti6a14v alloy substrate have been prepared by means of plasma source ion implanted - ion beam enhanced deposition ( psii - ibed ). for potential applications as artificial joint materials and artificial cardiac valve materials, its trobological performance and hemocompatibility has also been evaluated in the present ph. d. thesis

    本研究採用等離子源離子注入?離子束增強沉積技術（ psii - ibed ）制備了鈦合金基類金剛石梯度薄膜材料，對類金剛石梯度薄膜這一新型人工關節材料和人工心臟瓣膜材料的生物摩擦學性能和血液相容性進行了研究和評價，研究了摩擦磨損對材料血液相容性的影響。
  10. Distribution of electromagnet field in the space of h - type rf ion source is worked out derivation from maxwell equations, and three - dimensional vector graphs of e and b in the space of rf ion source are calculated and plotted by mafia software

    並採用mafia軟體進行了三維實體建模，計算了高頻離子源放電擊穿前和穩定工作后的電磁場分佈，得到了高頻離子源放電空間電磁場分佈的直觀圖像。
  11. The testing technique and system of the newly developed, miniaturized sputtering ion pump with low pumping speed has been developed in accordance with the standards formulated by machine industry

    摘要本文介紹了小抽速微型濺射離子泵的性能測試系統和參考機械行業標準確定的測試方法，探討了測量結果誤差來源。
  12. On - line measurement of microwave power in ecr ion source

    離子源中的微波功率在線測量
  13. Studies of microcluster ion source using in tandem accelerator

    用於串列加速器的微團簇離子源研究
  14. In this thesis, we research the characters on the ion beam sputtering system, and prepare tiny films and cnx / tiny multilayers by ion beam sputtering. the best parameters of preparing cnx films are explored. we use the tiny films as template to promote the growth of cnx films

    本文對離子源的濺射特性進行了研究，採用離子束濺射法制備了tin _ y單層薄膜和cn _ x tin _ y多層薄膜，探索該法制備cn _ x薄膜的最佳工藝參數，並利用tin _ y薄膜為襯底以促進cn _ x薄膜的生長。
  15. The theory of ion etching and the parameter of ion source designing are discussed in detail

    並且詳細介紹了離子刻蝕和離子源的原理。
  16. We suggest that optimization of the tip geometry considerably improve the performance of the liquid metal ion source

    從而為液態金屬離子源的設計提供了一個有效的輔助工具。
  17. Various factors, including the apex geometry of the emitter tip, the protrusion length, and the simulated charge distribution, were considered

    因而對其發射系統進行模擬分析，可以很好地指導液態金屬離子源的設計製造。
  18. Electric field of the emission system of a liquid metal ion source was simulated, based on the conventional dynamic protrusion model and the widely used charge simulation method

    摘要發射系統是液態金屬離子源的關鍵部件之一，它的性能的優劣直接影響到整個離子源的工作穩定性和可靠性。
  19. The conclusion that ez is more important during the breakdown of rf ion source is made out by comparing ez and e 6 before breakdown, and then, the breakdown criterion of rf ion source is deduced, and the relation between breakdown voltage and pressure is analyzed too

    通過比較擊穿前高頻電場的軸向和幅向分量，得出了軸向電場在高頻離子源擊穿中起主要作用的結論，並進而推導出了高頻離子源的擊穿判據，得出了氣體擊穿時離子源擊穿電壓和放電管內氣壓的關系。
  20. The theory of ion - beam etching and ion sources are reviewed. the classification of ion - beam etching are introduced. according to the mechanism that ion sputtering leads to faceting, trenching, reflection and redeposition, some relative solutions are put forward

    綜合敘述了離子束刻蝕技術和離子源的工作原理，簡單介紹了離子束刻蝕的分類，闡述了離子束刻蝕的物理濺射效應導致的刻面，開槽，再沉積等現象的產生機理及解決辦法，分析了kaufman離子源進行ribe的可行性及出現的問題。
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