離子濺鍍 的英文怎麼說

中文拼音 [zijiàn]
離子濺鍍 英文
ion sputtering
  • : Ⅰ動詞1 (離開) leave; part from; be away from; separate 2 (背離) go against 3 (缺少) dispens...
  • : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
  • : 動詞(液體受沖擊向四外射出) splash; spatter
  • : 動詞(用電解或其他化學方法使一種金屬附著到別的金屬或物體表面上) plate
  • 離子 : [物理學] ion
  1. J. r. stevens et al., “ electrochromism of wo3 - based films in contact with a solid li - doped siloxane elastomer electrolyte, ” applied optics, 26, pp. 3489 - 3490, 1987

    鄭耀爵, 「以法制備氧化銦錫薄膜之光學、電學及可靠性質之研究, 」國立成功大學,碩士論文, 2003 。
  2. Ion sputtering coator

    膜臺
  3. A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper. the basic principle of ibs coating machine is discussed. this paper also gives the scheme of hardware and sofeware

    本文介紹了膜機膜厚控制的一種實用的系統,文中論述了膜機的工作原理及膜厚度控制系統的硬、軟體的實現方案。
  4. Ion beam sputtering system

    系統
  5. Closed field unbalanced magnetron sputter iron plating technique and it ' s application to cutting tools

    閉合場非平衡磁控技術在切削刀具上的應用
  6. Application of multiple plasma arc discharge vacuum magnetron sputtering coating plant in ceramic surface decoration

    磁控等多弧真空膜機在陶瓷表面裝飾的應用
  7. Our experiments emphasized the correlation between micro structures and some properties of the coatings and tried to obtain the protective coatings with the comprehensively good properties, in which auger electron spectroscopy ( aes ), scanning electron microscope ( sem ), and x - ray diffraction ( xrd ) were employed to investigate the composition, microstructure and crystal phase of the coatings respectively, and the properties test was primarily considered with the wear resistance and corrosion resistance of the coatings

    本論文主要採用pvd技術中的磁控膜( ms或rms )及部分用等噴塗( ps )和熱氧化( to )表面處理技術研究了鈾的具有代表性的三種防腐保護層,即單質al 、氧化物al _ 2o _ 3和合金al - zn層。實驗力圖在制備技術、工藝參數及層的微結構和性能之間找到一些內在的聯系,探索綜合性能較好的防腐蝕層。
  8. With the development of thin film science and technology, various thin film preparation techniques developed rapidly, as a result, conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques, such as ion plating, sputtering, laser deposition, cvd, pecvd, mocvd, mbe, liquid growth, microwave and mtwecr, etc., of which vacuum evaporation is the common technology for thin film preparation, because it has the distinct advantage of high quality of film deposition, good control - ability of deposition rate and high versatility

    隨著薄膜科學與技術的發展,各種薄膜制備方法得到了迅速發展,傳統的所謂膜,已從單一的真空蒸發發展到包括蒸膜、化學氣相沉積( cvd ) 、 pecvd 、 mocvd 、分束外延( mbe ) 、液相生長、微波法及微波電共旋( mwecr )等在內的成膜技術。其中電束蒸發技術是一種常用的薄膜制備技術,它具有成膜質量高,速率可控性好,通用性強等優點。
  9. Keywords : gims, ion source, anode layer, sputtering, tin, ion plating , medium frequency, pulsed dc

    中文關鍵詞:氣射、源、陽極層流、射、氮化鈦、膜、中頻、脈沖直流。
  10. Coating metal such as cu, ni, ti, mo, w or compound coating on diamond grain ( dg ) surface by coating ( chemical, electronic plating ) and vacuum plating method ( evaporating, sputtering, ionization ) was studied

    摘要採用濕法(化學、電)或真空(蒸發)方法,在金剛石表面覆一層銅、鎳、鈦、鉬、鎢等金屬,或者它們的復合層。
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