電蝕刻 的英文怎麼說

中文拼音 [diànshíkè]
電蝕刻 英文
electroetching
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave

    摘要採用微波電子迴旋共振等離子體反應離子刻蝕（ ecr - rie ）裝置對氂牛毛纖維進行表面改性，從而改善氂牛毛的可紡性。
  2. The silicon plates are formed reverse four wimble array in koh solution by wet - etching technology. then the electrochemical etching experiments are done in three poles electrobath. and some technology questions such as heat oxygenation, light etching, wet etching and electrochemical etching have been analyzed. at the same time sample appearances are analyzed by scanning electron microscope. according to current burst model theory, the electrochemical deep holes etching mechanism are analyzed

    在三極電解槽中，進行了電化學深刻蝕的探索性實驗。對氧化、光刻、濕法刻蝕和電化學刻蝕中的工藝問題進行了初步的理論和實驗研究，同時，採用sem對實驗樣品進行了形貌分析，並採用電流突破模型對電化學深孔刻蝕機理進行了理論分析。
  3. Three potentials pertinent to various etching techniques are labeled in fig. 10.

    與各種蝕刻技術有關的三個電勢標出在圖10中。
  4. In early ic fabrication practice, etch bias was usually dealt with by introducing an appropriate amount of compensation in the masking layer.

    在早期的集成電路製作實踐中，刻蝕偏差通常是通過在掩膜層上引入一個適量的修正來處理的。
  5. Electron-beam lithography with a novel multilevel resist structure defines the pattern.

    採用新型的多層抗蝕劑結構的電子束光刻來形成圖形。
  6. The design of manganin film and copper film were etched by the first time

    首次採用以半導體光刻的方法來刻蝕錳銅敏感薄膜和銅電極薄膜的圖形。
  7. " the hksar e - passports and e - d is will contain digital data including the holder s personal data and facial image which will be stored in the contactless chip embedded in the back cover of the travel documents, " mr peh said, " the holder s personal particulars and photograph will be inscribed onto the polycarbonate bio - data page of an e - passport or e - d i by laser engraving technology.

    白韞六先生續稱：特區電子護照及電子簽證身份書的封底內，皆藏有非接觸式晶片。晶片內儲存了數碼資料，包括證件持有人的個人資料及容貌影像。而這些個人資料及相片，將會以激光刻蝕技術刻印在特區電子護照及電子簽證身份書上。
  8. Ibm says its researchers optimized the sram cell design and circuit layout to improve stability and developed several novel fabrication processes in order to make the new sram cell possible

    為了在減小內存單元的同時確保產品的安全性，該公司研究人員開發出了將電子束與光學刻蝕技術相結合的製造技術。
  9. At present, feas have potential for use as an electron source in a wide variety of applications, including microwave power amplifiers ( such as twts, klystron ), flat panel displays, electron microscopy, and electron beam lithography

    目前，場致發射陣列陰極的應用領域十分廣泛，主要包括微波器件（應用於twts ， klystron等） 、平板顯示器（ feds ） 、電子顯微鏡及電子束刻蝕系統等。其中，應用研究的焦點主要集中在平板顯示器和射頻功率放大器。
  10. Award - winning production company offering voice - over, narration and creative media services including concept, sigs, logos and original music

    -提供廣告招牌橫額燈箱名牌水牌電腦割字蝕刻銅鋼金屬字絲印電腦噴畫建築圍板畫等廣告製作服務。
  11. A large number of attempt and painstaking experiment have been done in this paper according to existing project. we also do lots of chemical and electrochemical etching research in material of lab6, and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen, wet process etching and electrochemical etching. through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode, molybdenum field emitting cold cathode, tungsten field emitting cold cathode, tungsten rhenium field emitting cold cathode, molybdenum covered with lab6 film field emitting cold cathode

    而且，目前可借鑒的參考文獻較少，圍繞著前人做過的方案，本文做了大量工作，在已有文獻介紹的基礎上，結合原有的理論和實踐基礎，摸索出了包括高溫氧作用反應離子（ rie ）刻蝕法、濕法腐蝕法和電化學腐蝕法在內的三種制備工藝，運用電化學腐蝕工藝成功制備了單尖的六硼化鑭場發射冷陰極尖錐、鉬場發射冷陰極尖錐、鎢場發射冷陰極尖錐、鎢錸合金場發射冷陰極尖錐以及有六硼化鑭薄膜覆蓋的鉬場發射冷陰極尖錐。
  12. This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide, after that, using eb - lithography and dry etching to fabricate photonic crystal holes, so can reduce the fabrication cost by a big range ; designed the moulding board, which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully, then an successful eb - lithography is realized on the structure, the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment, which grounded etching sacrificial layer by photonic crystal holes in next step

    提出採用紫外光刻工藝製作傳統波導結構之後，通過電子束曝光和干法刻蝕製作光子晶體小孔的工藝方案，大幅度減低了製作成本；設計出可形成空氣橋結構、並且適用於電子束曝光位置識別的光刻模板，在soi材料上成功製作出帶有空氣橋刻蝕預留槽以及接續光波導的結構，在該結構上成功實現了光子晶體帶隙波導的電子束曝光，帶隙波導與接續光波導位置接續良好；最後利用預留槽進行了刻蝕犧牲層的實驗，為下一步利用光子晶體小孔刻蝕犧牲層形成空氣橋結構打下了基礎。
  13. Shake the mirror type laser and hit the marking machine, walk posture laser type person who mark, gush out yards of machine, electricity corrode metal type person who mark, corrode metal play person who mark, laser carve the cutting machine, laser power deeply

    生產與銷售的產品系列有：電腐蝕打標機、激光打標機、噴碼機、氣動打標機，激光雕刻切割機、激光刻章機、電動刻字筆、激光電源等。
  14. By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes

    研究利用常規的硅集成電路工藝技術結合電子束光刻，反應離子刻蝕和剝離等技術制備半導體和金屬納米結構，很好地解決了普通光刻與電子束光刻的匹配問題，提高了加工效率，經過多次的工藝實驗，摸索出一套制備納米結構的工藝方法，首次用電子束光刻，反應離子刻蝕和剝離等技術制備出了多種納米結構（硅量子線、量子點，雙量子點和三叉指狀的金屬柵結構） 。
  15. Xxx current production exhibits minor seeding ( metal deposits ( gold color ) in scribe lines ), which is due to batch processing of plating process due to significantly lower volumes and breaks in ordering

    該公司目前產量小幅增加（蝕刻生產線的金黃色金屬沉澱物） ，由於整理量與斷裂品大減，導致電鍍過程可採用批次加工法。
  16. The most prevalent procedure is to use photolithography or electron - beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer

    最常用的步驟是用光蝕刻或電子束蝕刻法，在矽晶圓表面的光阻層上製作出圖案。
  17. Although the creation of a finely detailed bas - relief master is expensive because it requires electron - beam lithography or other advanced techniques, copying the pattern on pdms stamps is cheap and easy

    雖然得花上大筆金錢，才能以電子束蝕刻或其他高階技術製作出有精密細節的淺浮雕主片，但要復制pdms壓模的圖案卻是便宜又容易。
  18. Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and mems fabs

    射頻等離子體9200是桶式爐脫模體，擁有可控制的高溫系統可去除光阻材料、氮化物蝕刻和半導體與微型機電系統等方面的清洗功能
  19. I understand the circuits are etched into the wafer by repeating the photolithographic process of light exposure and chemical treatment

    我知道這些電路是通過照相平板印刷法的曝光和化學處理蝕刻到晶元上的。
  20. Device processing : etching. surface passivation ; dielectric films

    元件製程：蝕刻，表面鈍化，介電材料薄膜。
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