靶反射強度 的英文怎麼說
中文拼音 [bǎfǎnshèqiángdù]
靶反射強度
英文
target strength-
In this paper, firstly the macro parameter of the series connection app was comprehensively analyzed, among which the trajectory location of the bullet emission and the terminal velocity of the bullet were mainly analyzed, and the feasibility of the series connection app to cope with explosive reactive armor was demonstrated. and then the macro design about the head of the series connection app was made, among which a particular analyse about the bullet " s launching process was made, from which we concluded the relation between the thickness of the airproof loop and the velocity of the bullet detached from the carrier and the relation between the length of the bullet and the velocity of the bullet detached from the carrier and the relation between the length of the bullet and the burning rate of the powder and the relation between the length of the bullet and the maximum pressure of the emission hole and the relation between the length of the bullet and the emitting time of the bullet, and the reasonable str ucture of the head of the carrier and bullet were designed, then the intensity of the head of the carrier was checked out using of the software of ansys
本文首先對子母式穿甲彈總體參量作了全面的計算分析，其中主要分析了子彈射出的彈道位置和必要的子彈著靶速度，論證了子母式穿甲彈對付爆炸式反應裝甲的可行性，然後對子母式穿甲彈彈頭部進行了總體設計，其中主要對子彈的發射過程進行了詳細的分析，得出了母彈彈頭部發射孔內閉鎖環厚度與子彈飛離母彈速度的關系、子彈長度與子彈飛離母彈速度的關系、子彈長度與火藥燃燒率的關系、子彈長度與母彈彈頭部發射孔內最大壓力的關系以及子彈的長度與子彈發射所需時間的關系，設計出了合理的母彈彈頭部結構和子彈的結構，並利用ansys有限元分析軟體對母彈彈頭部的強度進行了校核。But in the case of fixed target the spectra intensity become weak with the target long exposed to the laser radiation
反之使激光照射于固定靶上的固定點， libs信號的強度逐漸下降，從而影響譜線強度的穩定性。During the inspection by afm and sem, we found that the surfaces morphology of samples was even and smooth, the surface roughness was small. the films were composed of some excellent columnar crystallites. the xps results were found that zn existed only in the oxidized state and the concentration of al was less and the presence of loosely bound oxygen on the surface of azo thin films was reduced after ar + etching
由以上對azo薄膜的組織結構和光電性質的研究，我們得到了用直流反應磁控濺射法制備azo薄膜的最佳工藝條件為:氧氬比0 . 3 / 27 ，襯底溫度200 ，工作壓強5pa ，靶基距7 . 5cm ，功率58w ，退火溫度400 。
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