靶電壓 的英文怎麼說

中文拼音 [diàn]
靶電壓 英文
target voltage
  • : 1. (射擊的目標) target 2. (轡革; 韁繩) bridle; halter; reins
  • : Ⅰ名詞1 (有電荷存在和電荷變化的現象) electricity 2 (電報) telegram; cable Ⅱ動詞1 (觸電) give...
  • : 壓構詞成分。
  • 電壓 : voltage; electric tension; electric voltage
  1. Firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x - ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha - step500. and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate - to - target distance and temperature

    第一、應用穩定的直流磁控濺射設備制備tio2減反射薄膜並通過n & kanalyzer1200薄膜光學分析儀、 x射線衍射分析( xrd ) 、掃描子顯微鏡( sem ) 、 alpha - step500型臺階儀等儀器對薄膜進行表徵,分析氧分、總氣、工作溫度、基距等制備工藝參數對薄膜性能結構的影響。
  2. The results of simulations are : i ) energies of the incident ions to the target are determined mainly by the voltage across the cathode sheath, with a majority of ions " energy vary around the sheath voltage ; ions nearly normally bombard the target ; ions mainly locate above the sputtering holes because of the influence of the magnetic field, and the incident ions mainly come from the region ; the ions undergo several collisions during transportation, but that do n ' t matter much

    主要模擬結果有: ? )入射離子到達面時的能量主要受到了射頻輝光放中陰極殼層西北工業大學碩士學位論文李陽平的影響,大部分離子的入射能量在陰極殼層值附近,離子濺射時接近於垂直入射;射頻輝光放受到陰極磁場的影響,等離子體中的離子主要集中在面濺射坑的上方,且入射離子主要來自這個區域;入射離子在輸運過程中和背景氣體分子有少量的碰撞,但影響不太大。
  3. Many measures were adopted to decrease bombard in order to improve the solar cells propertivity, such as decreasing target voltage, increasing target distance, accelerating the movement of the substrate. by optimizing the experimental conditions, short - circuit current was increased by 3. 7ma / cm2, the conversion efficiency was increased by 2 %, the stability was improved

    在硅薄膜池的zno : al al背反射極應用方面,通過減小靶電壓、適當增加距和基片的運行速度來減小對池的轟擊,改善池性能,通過優化實驗條件,使池的短路流提升了3 . 7ma cm ~ 2 ,效率增加了2 ,穩定性得到改善。
  4. For the electronic proving ground reality, the advantages and shortcomings of several evaluation criteria are synthetically compared through studing jamming and antijamming effects between oppressive jamming and the target search radar. according to the ultimate effectiveness criterion, the method of using the tactics and technology indices to evaluate the radar jamming and antijamming effects in quantity is discussed. the quantitative grade judgement on jamming and antijamming effects are presented

    子裝備試驗場的實際出發,通過研究制性干擾對目標搜索雷達的干擾,以及後者對前者的抗干擾效果,綜合比較了幾種評估準則的優劣,依據最終效果準則,分別論述了用技術指標和戰術指標定量評估雷達干擾抗干擾效果的方法,提出了干擾抗干擾效果的定量等級評判,並通過信干比、抗干擾改善因子,將戰術、技術指標評估統一起來,二者在實質上是等效的。
  5. Such variations are found that due to applied magnetic field from the substrate. the aspect and brightness of the glow and the self - bias voltage for the target changes significantly

    實驗中觀察到,在外加磁場的作用下,等離子體放的輝光的明亮程度及外貌和面自偏發生了明顯變化。
  6. In the way based the scientific and tecdrical talks on i presided at and panicipated in, the graduation theis included a p1entful thets in recent years wtll be divided into three parts for depiction conxteniently and clearly, according to the content as fo1lowsf ( l ) the study of shock compression properties with the drixtiir - liquid co and n, experimentally ( 2 ) the study of the phenomenon of excess heat produced by deuteriurn atoms entering into the lattice of titaluxn experimentally ( 3 ) the calcujation for the electronic structure and energy of hydrogen atoms cluster ffi. the mainstream in the first part of the paper is to exposure some experimental tecndques in high pressure and high temperatur shock compression physics, including by using a cryo - target cooled down circulating steaxned n, to condense the well - proportioned mixed liquid sample from pure gas co and n = with equal molar voiurne

    根據近幾年所承擔和參加的科研任務,將研究成果總結寫成的論文按以下三個部分敘述: ( 1 )液體co和n _ 2混合物沖擊縮特性的實驗研究(由國防科技重點實驗室基金項目96js75 . 2 . 1 . jw1902資助) ( 2 )重氫原子進入鈦晶格中引起過熱現象的實驗研究(由國家自然科學基金10145002資助) ( 3 )氫原子團簇h _ 9的子結構與能量計算第一部分以高溫高沖擊波物理實驗為主,採用自行研製的低溫循環汽冷冷凝制樣技術由高純co和n _ 2氣體獲取等摩爾體積均勻混合的液體沖擊初態樣品。
  7. In the work, mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells. the best techological condition was obtained by optimizing the preparing conditions, ( var is decided by the deposition rate, target voltage : 265v, gas pressure : 0. 6pa, the high base vacuum is expected

    本文採用中頻脈沖磁控濺射法,通過優化zno : al薄膜的制備工藝,如靶電壓、本底真空度、工作氣、襯底溫度、 o _ 2 ar ,得到可用於硅薄膜太陽能池背極的zno : al薄膜。
  8. As the partial pressure of o2 increases the cathode voltage of the target increases in order to maintain the same current intensity and the sedimentation rate gradually decreases

    氧氣分的增大,維持同樣濺射流強度的陰極增大,薄膜的沉積速率逐漸減小。
  9. A device was constructed, which is made up of a detector, a three demension micromovement device with high precision which can be controlled at long distance, an enough large target chamber, a serial balzers pressure stabilizing system which can measure and adjust the pressure and an electronic acquiring system to measure the ionization distribution

    它包括探測器、可遠距離遙控的高精度三維微動裝置、足夠大的室系統、可對工作氣體的氣進行測量和調節的氣穩定系統以及進行離分佈研究的子學系統。
  10. By measuring pressure induced by dynamiting which located various positions of the circular shell, the localizational effect of impact force on the circular shell is disclosed. also, pvdf piezofilms are used to determine accurate time while projectile contacting target, accurate time while two interfaces of the target contacting at a initial distance of 5, and the contacting pressure between the two interfaces when the projectile is in 500m / s to looom / s. experimental results, which are consonant with computer simulation, supply support to engineering

    通過對化爆模擬加載試驗中柱殼不同角度力的監測,揭示了化爆模擬產生的力局域化效應,為進一步模擬設計提出研究的方向;採用pvdf薄膜來監測彈碰撞的時刻、細小間隙的閉合時間以及由此產生的力變化,通過對pvdf力計測試結果分析以及和數值模擬結果的比較,獲得規律性的認識,為進一步的應用提供了技術支持。
  11. This machine adopts japanese pro - face touch screen and mitsubishi plc control technology. in addition, it is set with automatic gear - shifting vacuum gauge, a three - flow controller, side - installed heating tube, computer pid automatic temperature control, and two sets of flat magnetic controlled target, contra - variant magnetic - controlled power source, and contra - variant bias power with easy operation and top grade film layer. they are widely used in decorative film layer, and compound film layer in plating

    該設備採用日本pro - face觸摸屏和三菱plc集中控制裝有腦自動換檔真空計,三路流量控制器,邊裝式加熱管,腦pid自動控溫,配備兩套邊裝式平面磁控,逆變式磁控源和逆變式偏源,操作簡單,膜層細膩,廣泛適用於鍍制各種裝飾膜層和復合膜層。
  12. Employing the crucial component of the system : a photoelectric phase monitor, the entire sample phase change can be observed instanly, so the reliability of data acqired from shocl copressed experiments are assured

    系統的關鍵-光物相監測裝置可全程實時監控樣品的狀態,從而確保了沖擊縮數據的可靠性。
  13. During the inspection by afm and sem, we found that the surfaces morphology of samples was even and smooth, the surface roughness was small. the films were composed of some excellent columnar crystallites. the xps results were found that zn existed only in the oxidized state and the concentration of al was less and the presence of loosely bound oxygen on the surface of azo thin films was reduced after ar + etching

    由以上對azo薄膜的組織結構和光性質的研究,我們得到了用直流反應磁控濺射法制備azo薄膜的最佳工藝條件為:氧氬比0 . 3 / 27 ,襯底溫度200 ,工作強5pa ,基距7 . 5cm ,功率58w ,退火溫度400 。
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