apcvd 中文意思是什麼

apcvd 解釋
常壓化學氣相淀集
  1. In this thesis, the history, structure. preparation method and basic properties of nano - composite materials and photoluminescence of nanocrystalline silicon have been summarized. research of the novel antireflecting energy saving coating glass has also been presented. the si / sic composite films are prepared with siht and ? 2 ^ 4 as the source gas by atmosphere pressure chemical vapor deposition ( apcvd )

    本論文全面介紹了納米材料,特別是納米鑲嵌復合材料的發展概況、特性、常用的制備方法、常見的幾種硅系納米材料以及有關納米硅材料的發光,並對新型無光污染節能鍍膜玻璃的研製和發展作了概述。
  2. In this paper, the growth technology is presented for epitaxial silicon carbide films on sapphire with a buffer layer by atmospheric - pressure chemical vapor deposition ( apcvd ) process. the effect of temperature and precursors flow rates on the growth of silicon carbide films by chemical vapor deposition is analyzed. the structural properties of the films grown on sapphire compound substrate are studied by x - ray diffraction ( xrd ), x - ray photospectroscopy ( xps ) and photoluminescence spectroscopy

    本論文提出了在藍寶石上引入一層緩沖層材料形成復合襯底,採用常壓化學氣相淀積( apcvd )方法在其上異質外延生長sic薄膜的技術,分析了cvd法生長sic的物理化學過程,通過實驗提出sic薄膜生長的工藝條件,並通過x射線衍射( xrd ) 、 x射線光電子能譜( xps ) 、光致發光譜( pl譜)和掃描電鏡( sem )對外延薄膜的結構性質進行分析。
  3. The micro structure of the films prepared with sih4 as the source gas by atmosphere pressure chemical vapor deposition ( apcvd ) and its influence on the photoluminescence and optical properties have systematically studied by the means of the measurements of tem hrem xps sem and raman

    對以硅烷為原料氣採用常壓化學氣相沉積制備的薄膜,利用tem 、 hrem 、 xps 、 sem 、 raman等手段系統研究了沉積溫度、退火后處理等制備工藝對薄膜微結構的影響,分析了微結構的成因。
  4. The paper put forward an aim to deposit n - doped titanium dioxide film on glass substrate by the atmospheric pressure chemical vapor deposition ( apcvd ) method. using ticl4 and oa as precursors, titanium dioxide thin films had been deposited by apcvd method. nitrogen had also been doped in the film when n2o gas was added as the dopant

    在實驗室條件下以ticl _ 4和o _ 2為先驅體,採用常壓化學氣相沉積法( apcvd )制備得到具有一定光催化性和親水性的tio _ 2薄膜,並且以n _ 2o作為摻雜劑,對薄膜進行了n的摻雜,在一定程度上提高了薄膜可見光照射下的光催化性和親水性。
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