argon gas 中文意思是什麼

argon gas 解釋
氬氣
  • argon : n. 【化學】氬〈元素名，符號為 A〉。
  • gas : n （pl gases ）1 氣，氣體，氣態 〈cf fluid; solid〉 2 可燃氣，煤氣，沼氣；【礦物】瓦斯。3 【軍事...
  1. The argos is ideally suited for applications such as district regulator and monitor regulator stations, and industrial process gas applications, such as air, nitrogen and argon

    它很適合使用於如天然氣輸送與配氣系統上的區域調壓及監控調壓站；然而它亦可被使用於其它許多任務業的氣體如：空氣、氮氣與氬氣的製程中。
  2. He termed this gas argon.

    他把這種氣體叫做氬氣。
  3. Argon is a monatomic gas.

    氬是單原子氣體。
  4. The tube is blanketed in an inert gas such as nitrogen or argon.

    管子被整個地漫浸在流動的氮或氬等惰性氣體中。
  5. An inert gas such as argon is introduced to reduce evaporation of the filament.

    將諸如氬那樣的惰性氣體充入燈泡中，以減少燈絲的蒸發。
  6. This paper described that the working theory and characteristics by high frequency argon discharge gas chromatograph, application of analysis cum in high purity argon product

    摘要本文敘述了高頻氬放電離子氣相色譜的工作原理、特點；以及在高純氬氣產品分析中的應用。
  7. Specifically for the iron and steel industry during the past 15 years, thermo electron has installed over 100 mass spectrometers for gas analysis applications involving the following plants : coke ovens, blast furnace ( bf ), direct reduction iron ( dri ), basic oxygen furnace ( bof ), electric arc furnace ( eaf ), argon oxygen decarburization ( aod ) furnace, vacuum oxygen decarburization vod furnace and ruhrstahl - hausen ( rh ) furnace

    尤其在過去15年的鋼鐵行業中，超過100臺過程質譜儀用於氣體分析，包含：焦爐，高爐，直接還原煉鐵爐，氧氣頂吹轉爐，電弧爐，氬氧脫碳轉爐，真空氧氣脫碳爐和循環法真空脫碳爐。
  8. Determination of trace argon, nitrogen and krypton inoxygen. gas chromatographic method

    氧氣中微量氬氮和氪含量的測定氣相色譜法
  9. Firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x - ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha - step500. and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate - to - target distance and temperature

    第一、應用穩定的直流磁控濺射設備制備tio2減反射薄膜並通過n & kanalyzer1200薄膜光學分析儀、 x射線衍射分析（ xrd ） 、掃描電子顯微鏡（ sem ） 、 alpha - step500型臺階儀等儀器對薄膜進行表徵，分析氧分壓、總氣壓、工作溫度、靶基距等制備工藝參數對薄膜性能結構的影響。
  10. Target material was hexagonal boron nitride ( hbn ) and working gas was pure argon

    用射頻濺射法在si襯底上制備立方氮化硼，靶材為hbn ， 。工作氣體為氬氣。
  11. Boron nitride ( bn ) thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system, with hexagonal boron nitride ( hbn ) target and working gas of argon ( or mixture of nitrogen and argon )

    使用射頻濺射（ rf ）系統，靶材為燒結的六角氮化硼（ hbn ） ，工作氣體為氬氣（或氬氣和氮氣的混合氣） ，在硅襯底上沉積氮化硼薄膜。
  12. The result shows that argon gas can not only promote the excitation of plasma at low pressure, but also improve discharge state, increase the density and activation of reaction radical and improve the quality of diamond films. on the other side, argon can cool the plasma and maintain low temperature of substrate due to its big ionization section and high collision probability with gas molecules

    結果表明，氣體系統中引入氬氣一方面不僅有利於維持低壓放電，而且改善放電狀態，提高反應活性基濃度和活性，提高低溫沉積金剛石膜的質量；另一方面，由於其大的電離截面使其和電子碰撞的幾率大大提高，對等離子體進行冷卻，有利於基片溫度的降低。
  13. Huizhou jiuce industrial gases co., ltd. ( " jcig " ) lying at lilin town huizhou guangdong is a hi - tech enterprise of producing and selling chemical gases ( acetylene : c2h2 ) and air products ( oxygen, nitrogen and argon gas ), with an area approximating 50000 ?

    惠州市久策工業氣體有限公司（簡稱「久策氣體」 ）位於廣東省惠州市瀝林鎮，佔地面積近50000 ? ，是一家以化工氣體產品（乙炔c2h2 ）和空氣產品（氧、氮、氬）生產及銷售的高新技術企業。
  14. The results indicate that it has an excellent surface. aln thin film was prepared from an aluminum target by dc and af reactive magnetron sputtering in nitrogen gas mixed with argon gas

    氮化鋁薄膜樣品是利用高純鋁靶，在氮氣加氬氣氣氛下用直流和射頻反應磁控濺射法制備的。
  15. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films owing to its high deposition rate and good uniformity etc. in my experiment, zao films were prepared by dc magnetron sputtering in pure argon gas atmosphere using zno target mixed with al2o3 ( lwt %, 2wt %, 3wt %, 4wt % respectively ) and the films were figured by xrd, sem, xps, afm and ftir, uv photometer

    本研究課題以氧化鋅鋁靶為靶材，採用直流磁控濺射工藝在純氬氣氣氛中沉積zao薄膜。靶材中al _ 2o _ 3的摻雜比例分別為1 、 2 、 3 、 4 。用xrd 、 sem 、 xps 、 afm和紅外、紫外分光光度計等測試手段對沉積的薄膜進行了表徵。
  16. The stainless steel and carbon steel can be excellently bonded under lower pressure by using silver intermediate sandwich materials and the oxide film on stainless steel can be destroyed effectively by argon gas shielding in the heating process

    結果表明，採用自製的銀基中間夾層材料可以使兩種母材在較低的壓力下實現良好的復合；加熱過程中採用氫氣保護能夠有效地去除不銹鋼表面緻密的氧化膜。
  17. Check to confirm the argon gas flow is on and with ample flow

    檢查氬氣流量是否開啟，並具有足夠的流量。
  18. The case will be flooded with inert argon gas to prevent deterioration when it goes on public display december 13

    展箱中將充進惰性的氬氣以防止地圖在12月13日開始展出時變質。
  19. Protection measures against the occupational hazard of enclosed space work were discussed in the light of an argon gas suffocation accident happened in a special steel company in shanghai as well as several other similar suffocation accidents in china

    摘要通過對上海某特鋼有限公司發生的一起氬氣窒息事故，以及國內其他幾起同類事故的比較分析，闡述了避免密閉空間氬氣作業環境職業病危害的防護措施。
  20. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films, owing to its high deposition rate and good uniformity etc. ito films were prepared by rf and dc magnetron sputtering in pure argon gas atmosphere, using in2o3 and in target mixed with sno2 ( 10wt % ) and sn ( 7wt % ) respectively

    其中磁控濺射工藝具有沉積速率高均勻性好等優點而成為一種廣泛應用的成膜方法。本研究課題分別以氧化銦錫靶和銦錫合金靶為靶材，採用射頻磁控濺射和直流反應磁控濺射工藝在氬氣氣氛中沉積ito薄膜。靶材中sno _ 2和sn的摻雜重量比例分別為10和7 。
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