dense coating 中文意思是什麼

dense coating 解釋
緻密塗層
  • dense : adj. 1. 密集的,(物質等)密度大的,(人口等)稠密的。2. (煙、霧等)濃密的,濃厚的。3. 愚鈍的。4. 【攝影】〈頁片〉高密度的。adv. -ly ,-ness n.
  • coating : n. 1. 被覆,表皮,塗層;包覆物;(食品上的)面衣,糖衣;塗料。2. 上衣料;細呢,花呢。
  1. Current density and electroplating velocity has line relation, but the increscent multiple of electroplating velocity is smaller than that of current density. which indicate that current efficiency decreases with the increase of current density at alcb + lialh4 system. at l - 5a / dm aluminum coating is dense and uniform, especially at 2. 5a / dm

    電流密度與電鍍速度兩者近似成直線關系,但電鍍速度增大的倍數比電流密度增大的倍數要小,說明在alcl _ 3 + lialh _ 4體系中隨著電流密度的提高,電流效率逐漸降低。
  2. Pdmaema can be cross - linked by quaternization to develop a positively charged dense network structure. according this mechanism, pdmaema / psf positively charged nanofiltration membrane was developed by interfacial polymerization using psf plate macrofiltration membrane as support layer, pre - polymer of pdmaema water solution as coating solution, p - xylylene dichloride / heptane as cross - linking agent

    根據這一機理,以psf平板微孔膜為基膜, pdmaema預聚物水溶液為塗層液,以對二氯芐正庚烷溶液為交聯劑,採用界面聚合法制備了pdmaema psf荷正電復合納濾膜。
  3. Seen from the experiment result, it is clear that the deposited coating obtained with the trivalent chromium electrodepositing method we use is smooth, homogeneous, dense, and has good unti - erosive ability, high stiffness. the color ol ihe deposited coaling ol irivalent chromium is similar with that of hexavalent chromium. further more, this process has a good ability of homogeneous and deep depositing with simple facility, high current efficiency, and wide working current flow and even more it avoids environmental pollution

    實驗結果表明,本文採用的三價鉻鍍鉻方法能電鍍出鍍層光滑、均勻、緻密、抗蝕性好、硬度高的鍍層,而且解決了鍍層顏色的問題,使三價鉻鍍層不僅具有現行六價鉻鍍層的天藍色光澤,同時還具有電流效率高、均鍍能力與深鍍能力好、工作電流密度寬、設備簡單、無環境污染等特點。
  4. Moreover, the two - step heat treatment method was utilized in the preparation of the films, the films prepared by the first coating with 550 ? heat - treatment and the second coating with of with 500 ? heat - treatment ( b type films ) were highly c - axis oriented with smooth, dense and uniform surface morphology

    此外,結合高溫和低溫熱處理方法優點的兩步熱處理法得到的b型薄膜同時具有較好的c軸擇優取向性和更為平整均勻的表面形貌。另外,在硅基板上也制備出了良好的c軸擇優取向性的摻雜氧化鋅薄膜。
  5. Prepared technical parameters were optimized by l9 ( 34 ) experiment analysis. a unique method for cleaning and drying of substrate - cleaning used by scour, drying used by infrared light was fished out by large numbers of experiment. chemical mechnism of zno thin film prepared by sol - gel technique was discussed by dta for the first time. by the measurements of sem, xrd and uvs, the thin film was analysed. the result proved that the thin film with strongly preferred orientation of c - axis perpendicular to the substrate surface which surface was homogenous, dense and crackfree was the crystalline phase of hexagonal wurtzite. the thin film was composed of plentiful asteroidal crystal which crystal dimension approximately 10 30nm. the average transmittance of thin film in visible region was above 90 %. the results of measurements else also proved that the thickness of single dip - coating was 75 240nm, this films resistivity was found to be 3. 105 102 3. 96 105 ? cm. the thickness and resistivity of thin film influenced by dope - content, withdrawal speed, pre - heat - treatment, anealing were reseached respectively

    利用xrd 、 sem以及uvs光譜儀等分析方法對薄膜進行了研究,結果顯示,所制備的薄膜為六方纖鋅礦型結構,具有高c軸擇優取向性;表面均勻、緻密,薄膜材料由許多星狀晶粒組成,晶粒尺寸大約為10 - 30nm左右;薄膜可見光透過率平均可達90 % ;對薄膜厚度以及電學性能進行了測定后發現:單次鍍膜厚度約為75 - 240nm , al ~ ( 3 + )離子摻雜型氧化鋅薄膜的電阻率在3 . 015 102 - 3 . 96 103 ? cm范圍內;分別研究了摻雜濃度、提拉速度、預燒溫度、退火溫度等工藝參數對薄膜厚度和電阻率的影響。
  6. It is with complete cell packing structure, good glass sealing, flat end face internal leads, and dense gloss of coating

    管殼結構完整、玻璃封裝良好,內引線端面平整,鍍層光澤緻密。
  7. It can be concluded that the performance differences between the plate membrane and the hollow fiber membrane can be attribute to difference of the stresses in the membranes when they were under pressure and the difference of the strain caused in the membrane, besides the possible reason that the surface curvature difference between a plate substrate and a hollow fiber one may cause structure difference in the dense functional layer when coating. the stresses in a hollow fiber composite membrane under an outside pressure are quite different from that in a plate one in that they exert on the hollow fiber in both the radial and circular directions, and the compress strain of the hollow fiber is thus much more complex, which may cause the top layer crinkle and a decreased salt rejection

    分析認為造成平板復合膜( )和中空纖維復合膜( )性能差異的主要原因,除了平板基膜與中空纖維基膜因表面曲率不同可能引起在塗覆時形成的緻密功能層結構上的差異之外,由於中空纖維膜受外壓時,膜內部承受的應力形式與平板膜不同,會同時在徑向(膜厚度方向)和環向(膜面內方向)兩個方向產生壓應力,因此,所發生的形變也較為復雜,可能造成表面復合層的起皺或脫落,引起脫鹽率下降。
  8. Thin films with thickness of 0. 31m and 0. 36m respectively on si substrate, have been successfully prepared by a sol - gel spin coating method. cubic nanocrystals can be obtained at relatively low sintering temperature with an average grain size of about 47 nm and 51 nm respectively. the aluminia - doped scsz thins film are the same dense as the scsz thin films. however, there are a small amount of pinholes found in the microstructure of the titania - doped scsz films

    0 . 70固體電解質納米晶薄膜。燒結實驗結果表明,兩種薄膜均在650以上開始晶化,溫度越高,晶化越完全,在800可完全晶化所得納米晶顆粒呈純的螢石結構立方相鋁和鈦摻雜的納米晶顆粒的平均大小分別為47和51nm 。
  9. 3, when 3vol % n - sic particle were added, the composite coating is quite dense, with low porosity, and the hardness was greatly increased, exhibiting relatively higher wear resistance than other composite coating with other n - sic particle contents

    當n - sic粒子含量為3vol時,復合塗層結構緻密,氣孔率低,塗層硬度有較大提高,並且摩擦磨損性能優于其它n - sic粒子含量復相塗層。
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