lithographic 中文意思是什麼

lithographic 解釋
adj. 形容詞 1. 平版畫的；石印的，平版印刷品的。
2. 平版印刷（術）的。
adv. 動詞 副詞 -ically
  1. The gravity analysis is carried out especially for the synthetic fused silica and calcium fluoride used in 193nm lithographic objective as well as the optical elements with structural sizes of ( 200mm ~ ( 300mm. large numbers of analysis data for surface shape error are obtained by using algor finite element analysis software. then these data are plotted into curves and comparison analysis will be carried out, finally the measures and schemes for reducing gravity deformation are proposed

    因此，本論文重點對大口徑光學系統在高精度光學鏡頭裝校中，因重力變形進行了詳細的分析研究，特別針對193nm光刻物鏡系統所使用的材料sytheticfusedsilica和caleiumfluoride以及用到的結構尺寸200mm ~ 300mm光學零件進行了重力變形分析，使用algor有限元分析軟體獲得了大量的面形誤差分析數據，然後將這些數據繪成曲線進行對比分析，最後提出了減小重力變形的措施與方案，並進行了實驗，驗證了分析結果是正確的，減小重力變形的方法是有效的。
  2. Among the subjects covered are intaglio printmaking, lithographic printmaking, weaving and art in hong kong

    題目包括凹凸版畫平印版畫紡織藝術及香港藝術。
  3. Lithographic inks - part 1 : testing methods

    平版印刷油墨.第1部分:試驗方法
  4. Glossary of terms used in offset lithographic printing

    膠版印刷術語詞匯
  5. Lithographic printing 25 mins, putonghua

    平版畫25分鐘普通話
  6. The offset lithographic prints for decorating

    平版裝潢印製品
  7. Thickness of metal lithographic plates

    金屬印刷平版的厚度
  8. Small sheet - fed lithographic press

    小型平版印刷機
  9. Four colour lithographic of set press

    四色平印機
  10. 2 limited edition lithographic reproduction by david mack 3 collectible.

    改編自流行漫畫，一部由真人上陣演繹的電影。
  11. Lithographic drawing ink

    石印製油墨
  12. Lithographic inks - part 2 : colour and transparency of ink sets for four - colour - printing

    平版印刷油墨.第2部分:四色印刷用油墨配套料的顏色和透明度
  13. Graphic technology - process control for the production of half - tone colour separations, proof and production prints - offset lithographic processes

    印刷技術.網目調分色片樣張及印刷成品的加工過程式控制制.膠印
  14. Graphic technology - process control for the manufacture of half - tone colour separations, proof and production prints - part 2 : offset lithographic processes

    制圖技術.半色調分色校樣和印刷品的生產的過程式控制制.第2部分:膠版金屬板印刷工藝
  15. The basics of lithography process, as well as the basic structure of lithographic system and the basic theory of partially coherent imaging are introduced in this paper. a bi - linear model of optical imaging is also presented. based on these theories, the simulation process of csplat is particularly analyzed, especially the computation of tccs ( transmission cross coefficient ) under different illuminations and the processing of primary lens aberrations inside tcc computation process

    本文從光刻基本過程入手，介紹了光刻機光學系統的基本組成、部分相干光透射成像的基本原理，提出了光學系統的雙線性模型，並在此基礎上詳細分析了模擬軟體splat的模擬過程，其中著重分析了光學系統的傳輸交叉系數tcc的計算，包括不同照明系統下tcc的計算以及tcc計算中像差的處理。
  16. Graphic technology - colour and transparency of ink sets for four - colour - printing - sheet - fed and heat - set web offset lithographic printing

    印刷技術.四色印刷用油墨調配的顏色和透明度.進紙和熱定形卷箔紙補償式平版印刷
  17. Test methods for water pickup of lithographic printing inks and vehicles in a laboratory mixer

    試驗攪拌器中石印印刷油墨和載色劑的水粘附性的試驗方法
  18. Due to its supper - resolution imaging ability and its unique three - dimensional microfabrication ability. it has been widely used in life science, 3d - optical data storage, and lithographic microfabrication. the imaging principles of confocal microscopy have been discussed extensively by many authors, but all of those theories did n ' t account for the nonlinear effect of two - photon excitation

    近十多年來，其理論研究和應用研究都取得很大進展，特別是雙光子共焦顯微鏡，由於具有極高的空間解析度和特有的三維處理能力，因而在生物醫學研究、三維高密度存儲以及三維微細加工等領域具有變革性的應用潛力，取得了許多突破性進展，已成為光學及其交叉學科中最誘人、最活躍的研究領域之一。
  19. Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. the laser direct writing system is the kind of tool that exposes the precision patterns by the micro - spot on the photosensitive material

    所謂激光直寫，就是利用聚焦的激光光束，由計算機控制聲光調制器的通斷以及平臺的移動，在光刻膠上進行曝光，經過顯影后得到所需要的圖形。
  20. An interferometric lithographic experimental system with maskless and multi - beam exposure is built. an experimental system with wavefront divided by a trapezoidal prism and with selectable diaphragms for kinds of multi - beam, multiple - exposure interferometric lithography research is proposed. the experimental study on interferometric lithography is carried out

    建立了無掩模多光束多曝光干涉光刻實驗系統，提出了一種採用梯形棱鏡進行波前分割和利用可選擇光闌進行多種多光束多曝光干涉光刻研究的實驗系統，進行了干涉光刻實驗研究，對模擬和實驗結果進行了分析。
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