mask pattern 中文意思是什麼

mask pattern 解釋
掩模圖案
  • mask : n 1 假面具,偽裝,掩蔽物;面罩;防毒面具(= gas mask);【物理學】掩模;(劈劍,棒球等用)護面;...
  • pattern : n 1 模範,榜樣;典範。2 型,模型;模式;雛型;【冶金】原型。3 花樣;式樣;(服裝裁剪的)紙樣;圖...
  1. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件,本論文設計並試驗了器件的製作的全部工藝,包括波導薄膜的沉積,掩模的設計製作,光刻,濺射金屬薄膜,剝離法製作金屬掩模,干法深刻蝕,矽片切割,端面磨拋,波導對準和性能測試。
  2. When the two layers of sio2 with different refractive index are finished, the designed mask pattern is printed on the film by photolithography. after that, icp is performed for dry etching, then, the waveguide structures are obtained. at present, the rudimental graph of edg has been obtained

    兩層不同折射率的sio _ 2薄膜制備好之後,經過光刻、等離子體刻蝕( icp )的工藝步驟之後,形成了波導結構,初步製作出了器件的圖形。
  3. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out

    對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究,設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統,進行了實驗研究。
  4. Based on the picture processing technology, the vision technology, and the pattern recognition technology, this program helps detect unqualified foamed mask packaging products made of aluminum - plastics, like those with omission assemblage, fragments, and foreign bodies

    以圖像處理技術為基礎,結合視覺技術、模式識別技術來檢測出漏裝、碎片、異物等不合格鋁塑泡罩包裝產品。
  5. The pattern design pays more attention to the culture contain, and coutinuously released tang poetry series, baifu and flower series, peking opera mask series, good luck and interest series, divine culture series, twelve chinese zodiac sign series, festival culture series, famous scenery spot series and the person affair series. pictures and texts adopt chinese against english, and then engraving and painting

    圖案設計注重文化含量,陸續推出了商銘系列十二生肖系列十二星座系列卡通情侶系列京劇臉譜系列唐詩系列玄神文化鎮宅寶系列百「福」字「花」系列吉祥情趣系列節慶文化系列風景名勝系列和人物事件系列。
  6. Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage

    極紫外投影光刻( extremeultravioletlithography簡稱euvl )最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術,近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。
  7. As the motor turns, the mask rotates, causing the striped pattern to alternately block and transmit the light beam

    馬達轉動時光罩跟著旋轉,其上的條紋圖形交替遮斷光束及讓光束通過。
  8. To make a mask for a part of a computer chip, a manufacturer first designs the circuitry pattern on a conveniently large scale and converts it into a pattern of opaque metallic film ( usually chromium ) on a transparent plate ( usually glass or silica )

    要做出電腦晶片一部份的光罩,製造者首先在方便操作的大尺度上設計線路,然後把它轉錄到一片透明板(通常是玻璃或矽石)上不透光的金屬薄膜(通常是鉻) 。
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