optical exposure 中文意思是什麼

optical exposure 解釋
光學曝光
  • optical : adj 眼的；視覺的；視力的；幫助視力的；光學（上）的。 optical activity 【物理學】旋光性。 an optic...
  • exposure : n. 1. 曝露；曝曬；揭發。2. 【攝影】曝光；膠卷[軟片]張數；曝光時間。3. （房屋的）朝向，方位。4. 商品的陳列。5. 【歷史】（嬰兒的）曝棄。
  1. Since the dichromated gelatin has a higher diffraction efficiency in all holographic recording materials, the aim of this research is to use dichromated gelatin as the recording material and to make use of the principle of holography to design holographic optical components, especially in fabrication procedure of dichromated gelatin film and in experimental technique to form a high diffraction efficiency using different angular exposure method

    為了產生優質的聚焦能力與效率，本研究採用目前具有最高繞射效率（ 80 ~ 90 % ）的重鉻酸明膠材料作為感光劑，除了自行調制藥劑比例成分，並依嚴格的製作步製成重鉻酸明膠全像片外，並採用不同角度重覆曝光方式改良干涉式波帶板無法自動追蹤的缺點，經過多次試驗與改進，藉以形成具備高繞射效率和自動追蹤功能的全像光學波帶板。
  2. Methods of testing plastics - optical and colour properties, weathering - methods of exposure to laboratory light sources - open flame carbon - arc lamps

    塑料試驗方法.第5部分:風化條件下光學和顏色特性.方法540g :實驗室燈光曝露法.有焰碳弧燈源
  3. Standard test method for measuring optical angular deviation of transparent parts using the double - exposure method

    用雙重曝光法測量透明部件的光學角偏差的標準試驗方法
  4. Konica minolta s dry micro - toning system, optical technology and electronic automatic exposure control system combine to ensure superior image quality print after print

    結合柯尼卡美能達的乾性微細碳粉系統、光學技術以及電子自動曝光控制系統，即使經過重復列印的影像亦具有相當高的質素。
  5. Al - doped zno ( azo ) thin films are emerging as an alternative potential candidate for ito ( sn - doped in2o3 ) films recently not only because of their comparable optical and electrical properties ( high optical transparency in the visible range, infrared reflectance and low d. c. resistivity ) to ito films, but also because of their higher thermal and chemical stability under the exposure to hydrogen plasma than ito

    Al摻雜的zno薄膜，由於具有與ito （ in _ 2o _ 3中適量摻雜sn ）薄膜相比擬的對可見光的高透過率和高電導，又因其在氫等離子體中的高穩定性等優點，已成為替代ito透明導電薄膜的研究熱點。
  6. In recent years, al - doped zno ( azo ) thin films has become a hot issue of transparent conductive thin films field and preferred materials instead of ito films not only because of their comparable optical and electrical properties ( high optical transparency in the visible range, low electrical resistivity ) to ito films, but also because of their lower price and higher thermal and chemical stability under the exposure to hydrogen plasma than ito

    近年來，由於al摻雜的zno薄膜（ azo ）具有與ito薄膜相比擬的光電性能（可見光區高透射率和低電阻率） ，又因其價格較低以及在氫等離子體中的高穩定性等優點，已經成為替代昂貴的ito薄膜的首選材料和當前透明導電薄膜領域的研究熱點之一。
  7. Intensity distribution in photoresist is analyzed during ldw exposure process in terms of the improved theoretical model and the method of selecting the optimal exposure is described. results of ray - tracing using zemax that is optical design software agree well with the calculated results of theoretical model and l dw experimental results verify the accuracy of the model. therefore this improved model is important significant for directing ldw research

    本文完善了激光直寫光刻理論，分析了直寫曝光中膠層內光場的分佈，探討了最佳曝光量的選擇方案，利用zemax軟體進行光線追跡的結果和理論模擬十分相近，實驗結果驗證了理論模型的正確性，該理論模型對激光直寫光刻技術研究具有重要指導意義。
  8. Furthermore, the exposure schedule for recording holograms with equalized diffraction efficiency is designed based on the above - mentioned optical erasure time constants

    並且依據上述兩種光擦除時間常數，為分批存儲熱固定多重全息圖的等衍射效率記錄設計了曝光時序。
  9. Using computer - aided alignment method, the schwarzschild optics was assembled with wave - front error of 18nm in rms value which is a good match to the simulation wave - front error by introducing figure errors of primary and secondary mirrors using zemax optical software. positive resist of zep520 ( nippon zeon co. ltd ) was employed in exposure experiments

    在集成后的euvl原理裝置上，採用zep520 （ nipponzeonco . ltd ）正性抗蝕劑及掩模調焦方案，初步進行了透射掩模的曝光復制實驗，國內首次獲得了0 . 75 m線寬的euvl復制圖形，完成了euvl的原理性貫通。
  10. Each wavelength of optical radiation has an associated threshold retinal exposure level that must be exceeded in order for retinal damage to be observed - shorter wavelengths are more effective in that less energy is needed

    對應每種波長的光都有一個極限值，超過這個極限值才能使視網膜受到損害.對于較短波長的光幅射，這個極限值的能量強度較低
  11. Safety of laser products - part 9 : compilation of maximum permissible exposure to incoherent optical radiation

    激光產品安全.第9部分:最大允許非相干光輻照的匯集
  12. Methods of testing plastics - optical and colour properties, weathering - determination of changes in colour and variations in properties after exposure to daylight under glass, natural weathering or laboratory light sources

    塑料試驗方法.風化后光學和顏色特性.在透過玻璃的日光自然風化和試驗室光源下暴露后顏色和特性變化的測定
  13. Methods of testing plastics. optical and colour properties, weathering. methods of exposure to laboratory light sources. fluorescent uv lamps

    塑料試驗方法.第5部分：風化條件下的光學和顏色特性. 540f方法：曝露在實驗室光源下的方法.熒光紫外燈
  14. Similarly, the control software of optical probe is separated into several modules, which are serial - port communication module, adjusting the time of camera exposure module, image collection module, extraction of feature points module and adjusting the brightness of feature points module

    光學測棒控制軟體劃分成:串口通信、攝像機曝光時間調節、圖像採集、圖像特徵點提取和光學特徵點亮度調節五個功能模塊。
  15. In addition, from the point of view of practicality, we make a study of experiment and application for double - exposure digital holographic interferometry, namely measuring gradn and grad / i of plane optical flat and measuring phase modulation characteristic of a kind of liquid crystal spatial light modulator ( lc - slm ) - liquid crystal television ( lctv )

    另外，本文還從實用的角度出發對二次曝光數字全息干涉術進行了實驗及應用的研究，具體就是平面平晶gradn和gradh的測量以及液晶空間光調制器（ lc - slm ）中液晶電視（ lctv ）的相位特性的測量。
  16. Standard practice for optical distortion and deviation of transparent parts using the double - exposure method

    用雙曝光法測定透明部件的光學畸變和偏差的標準實施規范
  17. In this paper, we design an optical system for double - exposure digital holographic interferometry. the comparison of the other measured result and experimental result proves the feasibility and validity of double - exposure digital holographic interferometry

    在具體的實驗測量中，本文提出了適合二次曝光數字全息干涉術的光學系統，而其它方法的測量結果對本文測量結果的佐證，則證明了二次曝光數字全息干涉術的可行性和有效性。
  18. In above - mentioned experiment, to study the influence of aero - optical effects on the optical image transmission at different exposure time, and getting the firsthand experiment data of high - speed flow influence on image transmission, transmission images of point targets at different exposure time and of surface targets at steady - state are required

    在上述試驗中，為了研究氣動光學效應對不同曝光時間的光學圖像傳輸的影響，獲得高速流場對圖像傳輸影響的第一手實驗數據，要求得到多幅不同曝光時間的點目標傳輸像和穩態面目標傳輸像。
  19. Procedure for assessing temperature and humidity cycling exposure effect on optical characteristics of optical fiber

    光學纖維光特性受溫度和濕度循環影響的評估方法
  20. Procedure for assessing temperature and humidity cycling exposure effect on mechanical characteristics of optical fiber

    光學纖維機械特性受溫度和濕度循環影響的評估方法
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