photolithographic 中文意思是什麼

photolithographic 解釋
光刻法的
  1. Photolithographic diffusion windows

    光石版印刷擴散窗
  2. The methods and systems ( including amplitude division double - beam interference system, three - beam interference system, liquid immersion type deep uv interference system and full automatic interference photolithographic system ) for amplitude division maskless laser interference photolithography are studied and compared

    研究和比較了振幅分割無掩模激光干涉光刻方法和系統,包括振幅分割雙光束干涉系統、三光束干涉系統、液浸式深紫外干涉系統及全自動干涉光刻系統。
  3. The structure and basic theory of the electrical control system of the precision workbench. it is applied in quasi - molecular laser photolithographic technology

    本文論述了精密工作臺電控系統的結構及工作原理,它主要應用於準分子激光光刻技術中。
  4. An experimental double - beam and double - exposure interference photolithographic system has been established

    建立了雙光束雙曝光干涉光刻實驗系統。
  5. I understand the circuits are etched into the wafer by repeating the photolithographic process of light exposure and chemical treatment

    我知道這些電路是通過照相平板印刷法的曝光和化學處理蝕刻到晶元上的。
  6. As shopping - mall - style chips continue to sprawl outward, for example, it becomes increasingly hard to keep the photolithographic image in focus at the edges

    而且連接到遠處的導線太長,會導致訊號延遲,因而減低了晶片的效能及復雜的功能。
  7. The photolithographic tools that will be used to make chips with features well below 100 nanometers will each cost tens to hundreds of millions of dollars

    要在晶片上做出小於100奈米的圖案細節,所需的光蝕刻工具每件要花上幾千萬到幾億美元。
  8. Back then, chip designers considered it risky to add two or three layers of metal on top of the silicon wafer because each new layer added hills and valleys that made it difficult to keep photolithographic patterns in focus

    當時的晶片設計者認為在矽晶圓上加上兩三層金屬有點冒險,會使晶圓表面凹凸不平,增加光刻過程中聚焦的困難。
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