sputtered film 中文意思是什麼
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The sputtered thin film strain gauge technology provides excellent stability and a high burst pressure rating
濺射薄膜應變測量技術為我們提供了良好的穩定性和很高的破壞額定壓力值。 -
In order to optimize parameters of sputter - depositeing used to manufacture silicon - based tm films in the next step, the dissertation analyses and explains the difference between the two surfaces of sputtered tini film from sputtering factors
為優化濺射工藝參數以用於后續的硅基tini薄膜制備，本文從工藝因素入手，對玻璃基濺射薄膜兩個表面的質量差異進行了分析，並給出合理解釋。 -
Determined by dsc. whereafter, the surface micro - morphology of both sides of tini sma thin film deposited on glass was investigated by atomic force microscope ( afm ), and the difference of morphology between the two sides is observed. it has been shown that, in the growing surface of sputtered tini film, the trend of grain to accumulating along the normal direction like a column is clearly observed, and the grain is very loose which resulted in more microcavities, but in the surface facing to glass substrate, grain is so compact that there are hardly microcavities
通過濺射法，在玻璃襯底上淀積了tini薄膜，並在600進行了真空退火， dsc法測得其馬氏體逆相變峰值溫度為75 ，利用原子力顯微鏡，對玻璃基tini形狀記憶合金薄膜的襯底面與生長面進行了表面微觀形貌分析，發現：生長面晶粒呈現出沿薄膜法線方向柱狀堆積的趨勢，晶粒緻密性差，微孔洞多；而襯底面晶粒緻密，幾乎沒有微孔洞存在。 -
The main purpose of this article - is to simulate the whole process of the generation and transportation of the vapor phase particles of the film in rf magnetron sputtering, which contains transportation of ions in rf glow discharge, sputtering of target and transportation of sputtered atoms, via models that are established on the basis of the physics of sheath theory for the rf magnetron glow discharge, sputtering theory and transportation theory
本論文對射頻磁控濺射中入射離子的產生和輸運、離子對靶材的濺射、濺射原子的輸運過程進行了綜合考慮，根據射頻輝光放電的陰極殼層理論、粒子的輸運理論、離子對靶材的濺射理論建立模型，進行了計算機模擬。 -
The xrd results show that the sputtered lcmo film grains are grown epitaxially, when the lattice mismatch between film and substrate is small. the lcmo thin films grown on sto substrates show an in - plane tensile stress
Xrd的研究結果表明，當基片與lcmo薄膜間的晶格失配度較小時，薄膜和基片具有一致的晶格取向，薄膜具有較好的外延結構特徵。 -
Anti - tarnishing capacity of magnetron sputtered silver film in various gaseous and liquid mediums
磁控濺射鍍銀膜抗變色性研究 -
The tungsten oxide films with catalyst by two methods were characterized by x - diffractometer, tunnel scan - atomic force microscope, ft - ir, double - beam uv - vis - nir spectrophotometer and speediness volt - ampere cycle meter. as results of x - diffractometer, pt / wo3 sputtered film samples are crystal when annealed at 400 with distinct diffractive acuti - apices
本文分別用x衍射儀、隧道-原子力顯微鏡、傅立葉變換紅外光譜儀、雙束紫外可見分光光度計、快速伏安循環法等表徵了用以上兩種方法制備的三氧化鎢摻雜薄膜。 -
Atoms of the film by dc reactive magnetron with pt sputtered tend to plane ordinal structure. molecules of the the film by sol - gel with pt sputtered tend to be surface center structure as wo6. as results of ft - ir, the characteristic oscillation of the tungsten oxide sol - gel film with pdcl2 catalyst is more distinct with the higher temperature at the wave band
這兩種方法結合制備的三氧化鎢摻雜薄膜中溶膠摻鉑樣品綜合了溶膠凝膠法與直流磁控濺射法的優點，其薄膜疏鬆多孔，充分快速響應了鉑催化劑離化的氫，具有良好的氫敏性能，是制備氫氣傳感器薄膜的首選方法。 -
A detailed measurement showed apparent thickness gradient in the film plane, which is interpreted as the result of the motion of particles sputtered from the target in the special - distributed magnetic field
通過細致的測量還發現，薄膜在膜面內存在明顯的厚度梯度，這應當是沉積粒子受梯度磁場作用的結果。 -
Preparation and mechanical properties of magnetron sputtered b4c thin film
薄膜的微結構及力學性能
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