sputtering of metal 中文意思是什麼

sputtering of metal 解釋
金屬噴鍍
  • sputtering : 飛濺
  • of : OF ＝Old French 古法語。
  • metal : n 1 金屬；金屬製品；金屬合金。2 【化學】金屬元素；（opp alloy）；金屬性。3 【徽章】金色；銀色。4 ...
  1. The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc

    干鍍是一種在真空下在聚合物表面沉積金屬的方法，包括濺射、氣相沉積、真空沉積等。
  2. Upon comprehensively reviews of the predecessors ? results, using the experience of other countries for reference, and implementing thin film technology, the author have developed the microsensor in this thesis by sputtering metal material on a silex substrate

    本文在綜合評述前人工作成果的基礎上，借鑒國外的製作和研究經驗，利用薄膜技術，在石英基片上濺射銅、鎳和二氧化硅薄膜，形成薄膜熱流計。
  3. In this paper, we reported the structural and luminescent properties of si - based oxide films containing semiconductor si, ge or metal al powders prepared by a dual - ion - beam co - sputtering method ( si - sio2 films and al - si - sio2 films ) or rf magnetron sputtering technique ( ge - sio2 films ), and analyze the pl and el mechanism. 1. the composite films of si - sio2 films were prepared by dual ion beam co - sputtering method from a composite target in argon atmosphere

    我們利用雙離子束共濺射和射頻磁控共濺射技術制備了一系列含有半導體si 、 ge顆粒及金屬顆粒al的薄膜，即si - sio _ 2薄膜、 ge - sio _ 2薄膜和al - si - sio _ 2薄膜，分別對它們的結構、光吸收以及發光性質進行了研究。
  4. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件，本論文設計並試驗了器件的製作的全部工藝，包括波導薄膜的沉積，掩模的設計製作，光刻，濺射金屬薄膜，剝離法製作金屬掩模，干法深刻蝕，矽片切割，端面磨拋，波導對準和性能測試。
  5. Magnetron sputtering is common method for preparating metal film resistor. by this method, the target is very important for the performance of the resistor

    在金屬膜電阻器的生產過程中，靶材是非常關鍵的，它制約著金屬膜電阻器的精度、可靠性、電阻溫度系數等性能。
  6. Water steam was used as oxidant, and the optimum water steam partial pressure is between 1 10 - 4 and 5. 5 10 - 4 pa. under the optimum growth parameters, a ceo _ 2 seed layer with highly textured degree was successfully prepared. beside the one step process was experimented in this dissertation, the two step process was proposed and studied to further improve the quality of ceo _ 2 seed layer. in the two step process, about 15 nm thick of ce metal layer was deposited on metallic substrate at the first step, then water steam was introduced in the chamber, and the ceo _ 2 thin films were subsequently deposited with reactive sputtering in the

    總結出沉積ceo _ 2薄膜的優化工藝條件，當沉積溫度為720 - 850 、水蒸汽分壓介於1 10 - 4 - 5 . 5 10 - 4pa之間、退火時間40min時，獲得了織構程度良好的ceo _ 2種子層薄膜; 3 .由於一步法制備ceo _ 2種子層中水分壓范圍狹窄，工藝條件難以控制，並且退火延長了薄膜的制備時間，因此，本論文又採用了兩步生長法沉積ceo _ 2種子層，即:先在ni - w基帶上沉積一層約15nm的金屬ce薄膜，再通入氧化氣氛（水蒸汽） ，繼續進行薄膜沉積。
  7. 1 、 the activated process of the metal halide lights is analyzed. the processes mainly include four - discharged stage : breakdown ? glow discharge sputtering ? the glow transition to the arc - - arc discharge sputtering

    1 .分析了金屬鹵化物燈的啟動過程，金屬鹵化物燈的啟動過程主要包括:擊穿? ?輝光放電? ?輝光向弧光的過渡? ?弧光放電四個放電階段。
  8. The applications field of fgm include aerospace, electron, chemistry, biology and medicine fields ; the composition change also from metal / ceramic to metal / metal, metal / alloy, non - metal / non - metal and non - metal / ceramic. moreover, various methods including powder metallurgy, self - propagating high - temperature synthesis ( shs ), chemical and physical vapor deposition ( cvd and pvd ), electrodeposition, laser cladding method, plasma sputtering and sol - gel method have been studed. metal organic chemical vapor deposition ( mocvd ), using chemical vapor deposition of metal organic compounds, is an effective method for acquiring special function materials and membrane

    功能梯度材料是21世紀最有發展前景的新型材料之一，其用途已由原來的宇航工業，擴大到核能源、電子、化學、生物醫學等領域；其組成也由金屬?陶瓷發展成為金屬?金屬、金屬?合金、非金屬?非金屬、非金屬?陶瓷等多種組合；其制備方法主要包括粉末冶金法，自蔓延高溫合成法（ shs ） 、氣相沉積法（ cvd和pvd ） 、電沉積法，激光熔覆法，溶膠?凝膠法（ sol - gel ）等。
  9. The results show that with the doping of some metal ( such as al ), the metal elements will exist by the form of atom clusters by adjusting the sputtering parameters. it should sharply increase the intensity of el and not change the luminescence centers

    結果表明在硅基薄膜中摻入適量的金屬（例如：鋁） ，並使其以團簇的形式均勻彌散在薄膜中，有可能既不改變薄膜的發光中心，又可大大提高其發光效率。
  10. ( 3 ) the simulation results of rare gas ion ( argon is used here ) sputtering metal ( al is used here ) to deposit films, which are in good agreement with the fundamental experimental results

    （ 3 ）運用模擬程序模擬了惰性氣體（ ar ）離子對金屬靶（ al ）濺射成膜的過程，模擬結果符合一般的實驗結果及其規律。
  11. The high - performance heat - reflective coated glass is also called sunlight control coated glass it is made by coating a number of metal or metal compaound films onto the high - quality float glass or other base glass with the vacuum magnetic control sputtering method, which can effectively control the reflection, transmission and absorption of solar energy, that is to say, this glass allows sufficient natural light to come in for daylighting, and can also reflect major part of sunlight irradiation to reduce the collection of indoor heat and lower down the expenses for ventilation and air conditioning ; furthermore, the transmission, reflection ratio and reflection color are ready for the selection by the users

    高性能熱所射鍍膜玻璃也稱為陽光控制鍍膜玻璃，是在優質浮法玻璃或其他基片上用真空磁控濺射的方法鍍多層金屬或金屬化合物薄膜而成，可有效控制玻璃對太陽能的反射、透過和吸收，也就是說允許足夠的自然光進入室內用於採光，還能把大部分太陽光輻射熱反射掉，減少室內熱量的積聚，降低通風及空調的費用，而且可以根據客戶的需求，靈活選擇透過率，反射率及反射顏色。
  12. To study its properties and obtain high quality thin films, a variety of techniques have been used such as molecular beam epitaxy ( mbe ), metal organic chemical vapor deposition ( mocvd ), magnetron sputtering, pulsed laser deposition, to prepare zno thin films

    為了獲得高質量的氧化鋅薄膜材料，人們已採用分子束外延，有機化學汽相沉積，脈沖激光沉積，磁控濺射等各種技術來制備氧化鋅薄膜材料。
  13. Carbon coat electrical film was made and was tested in stability. the process of sputtering micro - wave conduct wave - guide compound metal - carbon film series on columned ferrites which used compound target was studied. micro - wave conducting performance of film was measured, feasibility as the micro - wave conducting compound film series was proved

    本論文用碳化的秸稈為主原料制備了碳靶及復合靶；制備了碳基塗層導電膜，並進行了穩定性試驗；研究了復合靶材在圓柱鐵氧體基體上濺射微波傳輸金屬-碳系復合波導薄膜的工藝，測量了膜層的微波傳輸性能，證實了復合膜系作為微波傳輸波導膜的可行性。
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