ultraviolet optics 中文意思是什麼

ultraviolet optics 解釋
紫外線光學
  • ultraviolet : adj. 【物理學】紫外的；紫外線的；產生[應用]紫外線的。n. 紫外線輻射。
  • optics : n. 〈作單數用〉光學。
  1. Based on the spectral irradiance measured with the sun - atmosphere ultraviolet spectrum radiometer ( sauvs ) developed by the institute of atmosphere physics and the changchun institute of optics and fine mechanics, chinese academy of sciences, measuring the direct and scatter irradiance spectrum of ultraviolet waveband which arrives in beijing global surface, giving a method of retrieving the aerosol optical depth ( aod ) and put up with primary results that exponential function can fit the retrieval results according to its visibility, putting forth different coefficients and functions on variable visibility, also giving a primary analysis on the aod in dust - storm day and some contrast between sun - day and dust - storm day, analyzing the ratio between scatter and total irradiance, and its relationship with atmosphere mass and total atmosphere optical depth, lastly contrasting with the survey results by aeronet beijing station, the results of retrieval is in reason, this work gives some help in researching the co - effect of aerosol - radiance - climate and makes preparation for further survey on the radiance characteristics of dust

    利用中國科學院大氣物理研究所與長春光學精密機械研究所合作研製的太陽?大氣紫外光譜輻射計（ sauvs ） ，測量到達北京地表的太陽直接和散射紫外光譜輻射，導出了大氣氣溶膠的光學厚度。初步結果表明：北京紫外波段大氣氣溶膠的光學厚度在絕大部分情況下隨波長的增加而單調減小，用指數函數可以較好地擬合反演結果，統計得到了三個水平能見度狀況下擬合函數的系數值和公式表達式；初步分析了揚沙、浮塵、沙塵暴天氣條件下氣溶膠光學厚度的特點，並與一般晴朗天氣條件下的氣溶膠光學厚度特點做了比較分析；分析了太陽紫外譜輻射中散射輻射與大氣質量、大氣總光學厚度的定性關系和定量表達式；最後與全球氣溶膠監測網路（ aeronet ）北京站的資料做比對，表明反演結果基本合理。
  2. We all know that the output of ultraviolet ( uv ) laser mostly depends on the conversion of nonlinear frequency, thus a new kind of excellent nonlinear optics ( nlo ) crystal is very important for the output of new wavelength

    紫外波段激光的輸出主要採用頻率變換技術來實現，因此一種好的非線性光學晶體對于產生新的波長是非常重要的。
  3. Ultraviolet impulse optics

    紫外線脈沖光學
  4. The primary and secondary mirrors of the schwarzschild optics were fabricated in our institute and measured using zygo mark iv interferometer. figure errors were observed in both primary and secondary mirror of 5nm ( rms ). these magnitudes are very small at visible wavelength but sufficient to cause significant degradation in the wave - front quality of the schwarzschild optics in extreme ultraviolet ( euv ) wavelength

    利用zygomark干涉儀檢測的schwarzschild微縮投影物鏡主、次鏡面形精度表明，對可見光工作波段已具有足夠高的面形精度，均為5nm （ rms ） ，但在euv （ extremeultraviolet ）波段，將給schwarzschild微縮投影物鏡帶來嚴重的波面誤差。
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