場發射顯微鏡 的英文怎麼說
中文拼音 [chǎngfāshèxiǎnwéijìng]
場發射顯微鏡
英文
field emission microscope- 場 : 場Ⅰ名詞1 (平坦的空地 多用來翻曬糧食 碾軋穀物) a level open space; threshing ground 2 [方言] (...
- 發 : 名詞(頭發) hair
- 射 : Ⅰ動詞1 (用推力或彈力送出) shoot; fire 2 (液體受到壓力迅速擠出) discharge in a jet 3 (放出) ...
- 顯 : Ⅰ形容詞1 (明顯) apparent; obvious; noticeable; evident 2 (有名聲有權勢的) illustrious and inf...
- 鏡 : Ⅰ名詞1 (鏡子) looking glass; mirror 2 (幫助視力或做光學實驗的器具) lens; glass 3 (姓氏) a s...
- 顯微鏡 : microscope
- 顯微 : microadiography
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The cenosphere particles were characterized with optical microscope, field emission scanning electron microscopy ( fesem ), energy - dispersive spectroscopy ( eds ) and x - ray diffraction ( xrd ) in and after the plating
用光學顯微鏡、場發射掃描電子顯微鏡、能譜儀和x射線衍射儀對其進行了分析表徵。At present, feas have potential for use as an electron source in a wide variety of applications, including microwave power amplifiers ( such as twts, klystron ), flat panel displays, electron microscopy, and electron beam lithography
目前,場致發射陣列陰極的應用領域十分廣泛,主要包括微波器件(應用於twts , klystron等) 、平板顯示器( feds ) 、電子顯微鏡及電子束刻蝕系統等。其中,應用研究的焦點主要集中在平板顯示器和射頻功率放大器。Field ion emission microscope
場離子發射顯微鏡Method of field emission microscope fem
場發射顯微鏡法Method of field emission microscope
場發射顯微鏡法No5 : image processing based on the combination of high - resolution electron microscopy and electron diffraction ( invited paper ), f. h. li, microscopy research and technique, 40 ( 1998 ) 86 - 100
場發射高分辨電子顯微鏡在揭示原子解析度晶體缺陷上的應用(特邀論文) ,李方華,科儀新知, 21 ( 1999 ) 8 - 15No3 : revealing crystal defects at atomic level by field - emmission hrem ( invited lecture ), f. h. li, proceedings 7th asia - pacific electron microscopy conference, singapore, june24 - 30, 2000, pp. 26 - 27
場發射高分辨電子顯微鏡在揭示原子解析度晶體缺陷上的應用(特邀論文) ,李方華,科儀新知, 21 ( 1999 ) 8 - 15It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography
在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造,高分辨、大面積光柵和網格製造,在抗蝕劑性能測試、面形測量和計量等領域,干涉光刻技術都具有廣闊的應用前景。Field emission scanning electron microscope
場發射掃描電子顯微鏡Field emission microscope
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