場電子顯微鏡 的英文怎麼說

中文拼音 [chǎngdiànzixiǎnwéijìng]
場電子顯微鏡 英文
field electron microscope
  • 場 : 場Ⅰ名詞1 （平坦的空地 多用來翻曬糧食 碾軋穀物） a level open space; threshing ground 2 [方言] （...
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 顯 : Ⅰ形容詞1 （明顯） apparent; obvious; noticeable; evident 2 （有名聲有權勢的） illustrious and inf...
  • 鏡 : Ⅰ名詞1 （鏡子） looking glass; mirror 2 （幫助視力或做光學實驗的器具） lens; glass 3 （姓氏） a s...
  • 電子 : [物理學] [電學] electron
  • 顯微鏡 : microscope
  • 顯微 : microadiography
  1. The chemical composition and microstructures of the insulating thin films prepared by different methods were analyzed by x - ray diffraction ( xrd ) and scanning electron micrograph ( sem ) ; other properties such as electric resistance, the breakdown field strength and dielectric properties were evaluated using high resistance meter, voltage resistance meter and precision impedance analyzer respectively

    採用x射線衍射儀（ xrd ）對表面絕緣薄膜的物相組成進行了分析，掃描電子顯微鏡（ sem ）對表面絕緣薄膜的微觀結構進行了研究，並用絕緣電阻測試儀、耐壓測試儀和精密阻抗分析儀分別對絕緣膜進行絕緣電阻率、擊穿場強和介電性能的測試。
  2. The cenosphere particles were characterized with optical microscope, field emission scanning electron microscopy ( fesem ), energy - dispersive spectroscopy ( eds ) and x - ray diffraction ( xrd ) in and after the plating

    用光學顯微鏡、場發射掃描電子顯微鏡、能譜儀和x射線衍射儀對其進行了分析表徵。
  3. At present, feas have potential for use as an electron source in a wide variety of applications, including microwave power amplifiers ( such as twts, klystron ), flat panel displays, electron microscopy, and electron beam lithography

    目前，場致發射陣列陰極的應用領域十分廣泛，主要包括微波器件（應用於twts ， klystron等） 、平板顯示器（ feds ） 、電子顯微鏡及電子束刻蝕系統等。其中，應用研究的焦點主要集中在平板顯示器和射頻功率放大器。
  4. The microstructure of ceramic tiles undergoing different temperatures in fire scene was analyzed using scanning electron microscope ( sem )

    摘要應用掃描電子顯微鏡對經歷不同火場溫度和冷卻方式的釉面內墻磚的顯微結構進行了觀察和分析。
  5. When the electron is struck by the photon it recoils out of the microscope field.

    當電子被光子擊中時，電子就被擊出了顯微鏡的視場。
  6. In this paper, a high integrated and intelligent digital dsp - spm system is developed based on the nspm6800 spm manufactured by the beijing zhongke mechanical & electrical equipment co. at present, the pc of spm system is burdened with not only sending and receiving data, but also disposing of image, which hinders the enhancement of speed of the system. in addition, as the function of spm is expanding, including tappingmode afm, efm, mfm, scm, etc, one hand, it amplifies the range of the application of spm, on the other hand it also means that the task of autocontrol and data transfer heavier. the advantages offered by the dsp compared to analog systems include considerable flexibility in the choice of the signal processing algorithm and greater ease in managing control parameters by the host computer, which are very important for the improvement of spm

    本課題以北京市中科機電設備公司的nspm - 6800型掃描探針顯微鏡為基礎，重新設計了以dsp為控制核心的控制系統，主要解決原系統存在的以下問題： （ 1 ） pc機既要實時控制數據的採集與發送，又要進行圖像的后處理，整個系統的實時性難以達到要求； （ 2 ）隨著spm功能的擴展，一方面包括輕敲式原子力顯微鏡、電場力、磁場力、掃描容場顯微鏡等技術在內的spm技術擴展了儀器的測試范圍和功能，另一方面也意味著自動控制量的增加和數據處理量的增加； （ 3 ） 16位a d 、 d a都採用的是購買的板卡，也通過isa槽插在pc機內，成本高，不利於擴展； （ 4 ）另外，數字板通過isa槽插在pc機內，易受于擾，而且給安裝帶來不便。
  7. No5 ： image processing based on the combination of high - resolution electron microscopy and electron diffraction ( invited paper ), f. h. li, microscopy research and technique, 40 ( 1998 ) 86 - 100

    場發射高分辨電子顯微鏡在揭示原子解析度晶體缺陷上的應用（特邀論文） ，李方華，科儀新知， 21 （ 1999 ） 8 - 15
  8. No3 : revealing crystal defects at atomic level by field - emmission hrem ( invited lecture ), f. h. li, proceedings 7th asia - pacific electron microscopy conference, singapore, june24 - 30, 2000, pp. 26 - 27

    場發射高分辨電子顯微鏡在揭示原子解析度晶體缺陷上的應用（特邀論文） ，李方華，科儀新知， 21 （ 1999 ） 8 - 15
  9. In part three, the physical and chemical properties of core - shell nanoparticles have been characterized by using transmission electronic microscopy, atomic force microscopy, zetasizer and alternating grade magnetometer

    第三，採用透射電子顯微鏡、原子力顯微鏡、 zeta電位分析儀、交流梯度磁場計等儀器對該類納米顆粒的物理化學性質進行了表徵。
  10. Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system

    該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。
  11. It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography

    在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。
  12. Field emission scanning electron microscope

    場發射掃描電子顯微鏡
  13. To measure the size of ba - ferrite fine magnetic particles, electromagnetic field was employed to drive the fine magnetic particles displace in order, then scanning electron microscope ( sem ) was used to observe and measure the size of ba - ferrite fine magnetic particles

    為了迅速、準確地測定鋇鐵氧體磁粉顆粒的厚度、直徑和厚徑比的統計分佈，採用對磁顆粒施加外加電磁場的方法，使各個磁顆粒的易磁化軸方向趨於一致，並用掃描電子顯微鏡觀察鋇鐵氧體磁粉顆粒。
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